: :.

() , : 1. 2.E 3.

( ) (, - ) ( - , .) ()

: (PVD,CVD,EBE,IBE,LPD) (ECD) (plasma spraying) : () (MOVPE)

PVD :

:

(thin films,coatings)

(multilayered structures)

(carrier gas)

(ion plating)

E

Work-accelerated gun

Self-accelerated gun

:

(Growth modes)

Growth process

Growth parameters

Layer thickness

Strained layers

;

=- + +

: = = =

=0 3-D > Volmer-Weber < Frank van der Merve Stranski - Krastanov

VW ( )

ZnSe /(Zn,Cd)Se

-: , , ,

GaAs

ZeSe GaAs

ZnSe /(Zn,Cd)Se

(10^-12 mbar) / (310 C)

(RD,SEM) (Raman/IR, PR/PL, Ellipsometry) (I-V,C-V,Hall condactivity) (crystal monitor detector,ellipsometry)

Handbook of deposition technologies for films and coatings(Rointan F. Bunshah)Handbook of chemical vapor depositon(Hugh O. Pierson)Thermal analysis of materials(Robert F.Speyer)Science and engineering of materials (Donald R. Askeland)The dynamics of thin film growth:A modeling study (M.A. Gallivan, R.M. Murray, D.G. Goodwin)Internet(Wikipedia)