SiAlBP

Na Ca

Na Ca

TEL FAX

Cleaning Technology of Glass

Kaoru Owada, Teruo TsunodaBunka Womens University

Top Bottom

Top Bottom

Bottom

Top

SiOH

Top Bottom

Bottom

Bottom

XPS

SIMS

XPS SIMS

TopBottom SiOH

Top

Bottom

Top a Bottomb

bottomfacetop face

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NaCaMg

Na Ca

Na Ca

SEMAES IR

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SIMS

XPS

Na

CaSiC

Sip

eVNaseVCapeV

CseVn

XPS

Top Bottom

Topd Bottoma

bc eVeV

eV

eV

Bottom

n

TOFSIMS

TOFSIMS

amuatomic mass

unit

amuSiCH amu

SiCHOSiCH amu SiCH

OSiCHOSiCH

Top Bottom CIS

abc : Bottom d : Top

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UV/O

Top Bot-

tom

SiOH

RbKNaHg

In mN

mmNm

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NEW GLASS VolNo

m

m

CMP

TFT

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pH

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SP SP

SP

SP

pHORP

SP

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SP

SP

KB

KKHz

s Km/hr

W/cm

m

mK

f

=C/f C

cm/sec

K mmf M mmKKHz

IJ/m

fHzAm kg/m

IfA AmfMHzkg/m

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I IKcal/m

HOH

cm H

OH

Kcal/molH

H

OH

HO

HO O

Ocm

N

NH

N

OH

OeV

KHzMHz

m

UVO

nmnm

CC

KJ/molCHKJ

/molCOKJ/mol

E E=hC/hCnm

KJ/

mol

nm

OOOOOO

Onm

O

OOOOOO

OO

nm

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Clnm

ClCl + Cl

M

MClx MClx

Al Fe

HF Si

Si

COLD JETCFOLD

JET INC

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HFE

C

TFTLCD

No

No

No

No

DAOlsenATOsterass : JphysChem

STakadaMFukawaYHayashiKMatsu-

moto : Thin Solid Films

JSSieger : JNonCrystSolids

KFEWilliamsMFThomasCEJohonson

BPTilleyJGreengrassJAJonson : Found

Glass SciTechnolp

JCeramic SocJapan

No

JPRyndAKRastogi : Surface Science

CGPantanoJrDBDoveGYOnoda

JrJ : NonCrystSolids

No

DEClarkELYenBower : SurfSci

HASchaefferJMechaJSteinmann : JAm

CeramSoc

No

DouglasAOlsenAJeanOsteraas:JphysChem

No

ECO INDUSTRYNo

ECO INDUSTRYNo

TOsakaTHattori : IEEE TransSemiconductor

manufacturing

NO

p

TECNOFRONTIER

L

NEW GLASS VolNo

TECHNOp

TECNOFRONTIER

L

No

KMitsumori : Proceeding of ECSFall Meet-

ing

LSI/PDP

p

p

JICC

No

p

No

No

p

No

p

p

p

TECNOFRONTIER

L

NEW GLASS

No

NEW GLASS VolNo