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SEJONG UNIVERSITY 1 CHAP04. PLASMA DISPLAY PANEL

CHAP04. PLASMA DISPLAY PANEL - …121C771E4C273B84482… · PLASMA DISPLAY PANEL ... ¾역학적: 전자기력의발생[MHD 발전, plasma propulsion] ¾화학적: ... PDP의효율의개선방향

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  • SEJONG UNIVERSITY

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    CHAP04. PLASMA DISPLAY PANEL

    PDP

    PDP

    3

    PDP

    ADS(Address & Display Separation)

    Reset period + Address period + Sustain(Display) period

    Sub-field Method (Grey scale)

    PDP

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    What is PDP?

    Definition: Plasma Display PanelPDP is the display device using the light emissioncharacteristics of glow discharge.(like a fluorescent lamp)

    Array of few millions of micro florescent lamp

    HgHgHg+Hg+ UV

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    PDP

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    What is Plasma?

    Plasma is a quasi-neutral gas of charged and neutral particles which exhibits collective behavior

    4 () () () ( )

    1 eV = 11600K

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    Plasma

    :

    : [(electrial arc welding), plasma torch,(electrical arc furnace), ,(thermionic conversion)

    : [MHD , plasma propulsion]

    : , (, , CVD)

    :

    FUSIONFUSION

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    ()

    Metastable levelResonance level

    3.8

    4.4

    10.2

    20.7

    0.56

    (nsec)

    12.163P28.31478.45Xe

    14.053P2~19.91249.98Kr

    15.843P2~1.311.510711.6Ar

    21.633P270.816.674.416.5Ne

    24.623S121S0

    62X10-4

    19.820.6

    58.421.2He

    Level

    (sec)

    (eV)

    (nm)

    (eV)

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    Collision

    +

    (, , )

    (, , )

    ()

    ()

    &

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    or

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    Gas Discharge Reactions

    Cathode Surface ReactionCathode Surface ReactionGas Volume ReactionGas Volume Reaction

    NeNe, Xe, XeNe, XeNe, Xe

    Ne, XeNe, Xe

    UVUV

    Ne, Xe + hNe, Xe + hNeNemm, , XeXemm

    Gas volume reactions

    Cathode surface reactions- Secondary electron emission- Sputtering

    NeNeXeXe++

    Ne*, Xe*Ne*, Xe*NeNemm, , XeXemm

    IoniIoni

    Ioni

    Exci

    Relx

    NeNe++XeXe++++ Reco Ne, XeNe, Xe

    NeNeXeXe++

    Excitation

    Ne*, Ne*, NeNemm

    NeNe

    Ne + hNe + h (light)(light)

    XeXe

    Ne + XeNe + Xe++

    Penningionization

    Relaxation

    NeNe

    NeNe

    Ionization

    NeNe

    RecombinationC A

    Sheath

    21.6eV

    16.6eV16.7eV18.7eV

    .

    .

    .Sheath

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    Ne Xe

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    BombardingIonized Gas

    Neutralized Gas

    Sputtered Atom

    Cathode Surface

    Sputtered Atom

    Gas

    Implantation, Sputtering, Secondary electron emission

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    & process

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    Self-Sustaining Discharge

    1 (N+1)

    N

    N

    (2 )

    :

    N 1

    cathode anode

    cell

    Collisions

    electron- neutral

    ion- neutral

    recombination

    chemistry

    Plasma-Field interaction

    Diffusion

    Criterion of self sustain discharge : (ed-1)1

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    )1ln(

    )1ln()(

    1min

    1min

    +=

    +=

    ABeV

    AePd

    Paschens minimum law

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    P D PP D P

    AC-PDPAC-PDP AC/DC HybridAC/DC Hybrid DC-PDPDC-PDP

    RefreshRefresh MemoryMemory RefreshRefresh MemoryMemoryTriggerTrigger

    MatrixMatrix Reflective3-electrodes

    surface discahrge(Coplanar)

    Reflective3-electrodes

    surface discahrge(Coplanar)

    AC : &

    PDP

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    DC PDP AC PDP

    AC & DC PDP

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    PDP(stripe & rectangular barrier type)

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    ( 3AC PDP)

    Glass

    ITO:

    Bus electrode:

    MgO: 2

    Address electrode: Dielectric layer:

    Barrier rib:

    Phosphor: UV

    Transparent dielectric layer: &

    Visible emission

    layer : 1) 2)()

    XY

    A

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    Glass 2.8

    1 14

    2 28

    ITO 260 100 60

    B/S 60B/S 340

    MgO 7000

    ITO 1500

    B/S 4

    Bus 7

    1080

    42Wide PDP Cell

    130

    12

    Glass 2.8

    80

    15

    Address 100 260 360 120

    42Wide PDP Cell

    1080

    Dimensions

    B/S

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    = +

    +

    ++

    ++

    +

    Matrix

    Sub-field method

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    Time

    SF1 SF2 SF3 SF4 SF5 SF6 SF7 SF8

    1

    .....2

    480

    128T64T32T16T8T4T2T1T

    1TV field (time)

    scan

    line address

    sustain

    sub-field

    Gray scale : Controlling width of sustain period in each sub-field

    PDP TV

    ADS Driving (Grey scale: )

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    C = C = 00 rr(A/d(A/d); ); CC11 >> C>> C00C = QVC = QV1/C1/Ctottot 2/C2/C111/C1/C00CCtottot CC11CC00/(2 C/(2 C00CC11))VV11/2/2 VV00

    C0C1 C1

    VV11/2/2

    2.

    ee

    ee

    VV00 VVCC11/(2C/(2C0 0 CC11) )

    VV11 VV2C2C00/(2C/(2C0 0 CC11) )

    1.

    VV00

    VV11/2/2

    VV00 VVCC11/(2C/(2C0 0 CC11))VV11 VV2C2C00/(2C/(2C0 0 CC11))

    VV11/2/2

    3.

    VV00 VsVsVV11 V V VsVs

    VV11/2/2

    VV00

    VV11/2/2

    AC -

    Dielectric layer

    Gas

    eeee

    ee

    eeee

    :matrix

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    AC ( 1usec )

    -> -> ( ) ->

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    : 1) (+)= 50V, (-)=-50V, 2) = 500V

    3) = 400V

    A

    BAddress Sustain

    Resetby low voltage(weak discharge)

    Operation Principle

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    20 21 20+21

    22 20+22 21+22

    20+ 21

    + 220 20

    1 2 3

    4 5 6

    7 0 1

    2020

    2020

    21

    212121

    22 22 22 22

    Gray Scale() Subfield method

    8(Gray scale) 3 (lines) X 3 (lines)

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    Sub-field

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    Discharges in AC PDP cell

    Reset discharge: capacitor (AX & AY )Eliminating wall charge for address ( )

    Weak discharge(by low voltage, narrow, exponential pulse)Between X(Common electrode) & Y(Scan electrode)

    Strong discharge(by Self erasing discharge)Between X(Common electrode) & Y(Scan electrode)

    Providing priming particles for addressing ( seed )

    Address discharge: capacitor (AY )Between Y(Scan electrode) & A(address electrode)

    Generating wall charge for sustain discharge ( ON/OFF )

    Sustain discharge: capacitor (XY)Between X(Common electrode) & Y(Scan electrode) electrode

    Light output for display ( )

    Determined by previous state (Memory function)

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    PDP (Ramp reset)

    X

    Y

    A

    reset address sustain

    Ve=160V

    Vset

    Vsc=-90V

    2nd reset

    Vs=190V

    1st sub-field 2nd sub-fieldReset : Address

    Address : ON/OFF (ON)

    Sustain :

    Sub-field -> (Grey scale)

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    PDP Module

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    Fabrication Process of AC PDP

    () ()()

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    PDP()

    + + + Set

    E-beam

    Sputter

    Ion plating

    MgOMgO

    coater ()

    paste

    ()Black stripe

    paste

    Sputter/Photoetching

    AgCr/Cu(Al)/Cr

    Bus

    Sputter/Photoetching

    CVD/lift-off

    ITOSnO2

    paste

    Dispenser

    (R, G, B)

    Sand blast

    paste

    Additive

    +

    Barrier rib

    coater

    Sheet laminator

    ()

    paste

    Sputter/Photoetching

    Lift-off

    Ag

    Cr/Cu(Al)/Cr

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    Fabrication Techniques

    Coating techniquesThick film printing method (Screen printing)

    Thin film deposition method (PVD, CVD)E-beam, Sputtering, PECVD

    Dispense/ Green sheet/ Ink-jet printing/ Spin coating

    Patterning techniquesPrinting method with stencil mask

    Sand blast method

    Lift-off (Additive) method

    Photo process(FODEL) method

    Chemical etch method (Wet etching, Dry etching)

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    Film Formation Techniques

    Screen PrintingScreen Printing

    Address line, etc.

    Photo PastePhoto PasteThin film depositionThin film deposition

    Al

    DCAlAlAl

    Al

    Ar+

    Al

    Ar+

    TARGET

    SPUTTERING

    ITO

    MgO

    Photo PastePhoto Paste

    UV

    Photo PastePhoto Paste

    Bus electrode

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    Film Formation Technologies

    SandblastingSandblasting

    Barrier rib

    Lift offLift off

    SnO2, Barrier rib

    Chemical EtchingChemical Etching

    ITO

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    Coating techniques

    GlassPaste

    Screen

    X-Y- Table

    Squeegee

    Scraper

    V

    P

    (Target

    Thickness)Table

    Slit Die

    Paste Tank

    Paste

    Pump

    PDP

    V

    Table

    Applicator RollComma Roll

    Coating Roll

    PDP

    (Target

    Thickness)

    Paste

    Nozzle

    Syringe

    Syringe

    NozzleNozzle

    Paste

    Paste

    Glass Glass

    Laser

    Laser

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    Screen printing machine

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    Screen Printing vs. Photo Paste

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    ITO

    Load/Unload

    Magnet

    Baking Plate

    Shutter

    C/R

    Target

    Dark Shield

    ITO

    ITO ()

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    DFR Laminating

    ITO () ()

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    Sand blast process

    (1) (2) DFR Laminating (3)

    (6) & (4) (5) Sand Blasting

    NozzleSand

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    PDP- ALIS & Waffle Rib

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    PDP- Deep waffle & Meander Rib

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    PDP- CCF &

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    AnodeCathode

    VISIBLE LIGHTIN PDP CELLPHOSPHOREXCITATION

    ELECTRICINPUT POWER

    DISCHARGE

    VUV RADIATION

    DISPLAY LIGHT

    TOTALSTEP

    70%

    15%

    50%

    25%

    70%

    LOSS

    100

    70

    10.5

    5.3

    1.33

    1

    Circuit Loss

    Visible & IR RadiationGas Heating

    Self-Absorption &Absorption by MgO

    Internal Loss of Phosphors

    Absorption by Wall & Bottom

    Absorption by ITO& Dielectrics

    PDP

    LAMP90%

    65%

    95%

    70%

    100%40

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    Effic

    ienc

    y(lm

    /W)

    1990 19911988 1989 1993 1994 20031992 1995 1996 1997 1998

    2

    3

    4

    DC PDP

    Reflection type

    Electrode optimize

    AC PDP

    1

    PDP

    - High Xe gas mixture- Deep Waffle structure

    - New discharge mode(Long gap structure etc.)- Material improvement

    (Phosphor etc.)

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    PDP

    PDP(2 lm/W) (80 lm/W)

    - Positive column -

    Positive columnNegative glow

    - -

    Large-dischargeMicro-discharge

    - -

    253, 354nm147, 174nm

    PDP

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    PDP

    1.5-inch(35mm) 50 ultrathin PDP ()

    (High contrast ratio) 50-inch PDP - (Crystal Emission Layer)

    Pioneer()

    32 PDP LG

    50" Single scan FHD PDP SDI

    150 4K2K PDP 24.7mm-thick 50 FHD PDP / 42 FHD PDP - Contrast ratio(30000:1), (5 lm/Watt)

    ()

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    Flexible PDP (Shinoda Plasma)

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