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Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 1/32
Electron RF Linacs Electron RF Linacs
for Industrial Applicationsfor Industrial Applications**
S. H. KimS. H. Kim1)#1)#, H. R. Yang, H. R. Yang1)1), M. H. Cho, M. H. Cho1,2)1,2), W. Namkung, W. Namkung1,2)1,2), , Y. G. SonY. G. Son2)2), S. D. Jang, S. D. Jang2)2), S. J. Kwon, S. J. Kwon2)2), S. J. Park, S. J. Park2)2), ,
J. S. OhJ. S. Oh3)3), K. O. Lee, K. O. Lee4)4), and K. H. Chung, and K. H. Chung4)4)
1) Department of Physics, POSTECH2) Pohang Accelerator Laboratory, POSTECH3) National Fusion Research Institute4) Korea Accelerator and Plasma Research Association
The 15th International Conference on Accelerator and Beam UtilizThe 15th International Conference on Accelerator and Beam Utilization ation (ICABU(ICABU’’11)11)
2011. 9. 30.
Gyeongju TEMF Hotel, Gyeongju, Korea
* Work partly supported by MKE, Korea and POSTECH BK21 Program# [email protected]
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 2/32
ContentsContents
• Introduction– Industrial applications of electron RF linacs
• Development of L-band electron linac– High power linac for e-beam processing
– Design details
– Commissioning status
• Development of C-band electron linac– Compact linac for industrial X-ray sources
– Design details
– Commissioning status
• Summary
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 3/32
Electron Beam Processing
Applications of e-beam processing(E-BEAM Service, Inc.)
Irradiation processing office(LEONI Studer Hard)
IntroductionIntroduction
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 4/32
Re-locatable vehicle inspection and images by dual energy e-beam
(Smiths Detection)
Cargo inspection with 9-MeV e-beam(Rapiscan Systems)
Mobile vehicle inspection with 2.5 MeV e-beam(Tsinghua Tongfang)
Cargo Inspection
IntroductionIntroduction
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 5/32
Varian Clinac (S-band) Mitsubishi IGRT (C-band)
Accuray Cyberknife (X-band)
Radiotherapy
IntroductionIntroduction
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 6/32
Application Fields with RF Frequencies
IntroductionIntroduction
Radiotherapy(6 – 9 MeV, < 1 kW)
E-beam Processing- Sterilization- Polymer Reforming(< 10 MeV, > 10 kW)
Cargo Inspection(3 – 9 MeV, ~ 1 kW)
Higher Beam Power
More Compact
L-band
S-band
C-band
X-band
FavorableRF Frequency
Industrial Applicationsof Electron Linac
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 7/32
L-band Accelerator System
LL--band: Overviewband: Overview
10-MeV, 30-kW e-beam accelerator
E-beam scanner
L-band 1.3-GHz, 25-MW pk, 60-kW avg.
Klystron with pulse tank
70-MW pk, 210-kW avg. inverter PS & pulse modulator
Installed at ACEP/KAPRA, Cheorwon
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 8/32
Depth-Dose Curve for Electron Beam
0.0
0.5
1.0
1.5
2.0
2.5
0 1 2 3 4 5 6
Areal Density (g/cm2)
Re
lati
ve
Do
se
Single Double
10 MeV5 MeV2 MeV
1 MeV
0.5 MeV
PAL/POSTECH2007/3/23
Limited by neutron production
LL--band: Overviewband: Overview
Depth-dose Curve of Electron Beam
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 9/32
Schematic Diagram of Accelerator System
PB: Pre-buncher IP: Ion PumpPGV: Pneumatic Gate Valve PS: Phase ShifterATT: Attenuator BEM: Beam Energy MonitorBCM: Beam Current Monitor
Accelerating Column
ATT
Solenoid Magnet PS
Load
Modulator
PS
E-Gun
PGV
BEM
PB BCM
IP
IPIP
PGV
IP Controller
E-gun Heater PS
E-gun HV Pulser RF WindowRF Window
Klystron
Vacuum GaugeController
Cooling WaterDistributor
TemperatureController
RF Driver
Master Trigger
Vacuum GaugeController
Steering Coil Controller
IP Controller
Beam Diagnostics System
Cooling Stand
Inverter
Beam Scanner
LL--band: Overviewband: Overview
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 10/32
Accelerator Parameter
RF System Parameter
Operating Frequency 1.3 GHz
Pulsed RF Power 25 MW
Pulse Length 7 μs
Repetition Rate 350 Hz
Average RF Power 60 kW
E-gun Parameter
High Voltage - 80 kV
Pulsed Beam Current 1.6 A
Pulse Length 6 μs
Beam Parameter
Beam Energy 10 MeV
Pulsed Beam Current 1.45 A
Beam Transmission Rate 90%
Average Beam Power 30 kW
Accelerating Structure Parameter
Type of StructureConstant-
impedance
Shape of Cell Disk-loaded
Operating Mode 2π/3 mode
RF Filling Time 0.8 μs
Operating Temperature 40°C ± 1°C
Average Accelerating Gradients 4.2 MV/m
Beam Loading Factor - 4.7 MeV/A
Temperature Shift Factor - 2.3 MeV/°C
LL--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 11/32
0-mode
π/3-mode
2π/3-mode
π-mode
Accelerating Column and Prototype Test
LL--band: Designband: Design
Cell Parameters
CavityPhase
velocity/ cGroup
velocity/ cAttenuation
coefficient (Neper/m)
1st buncher 0.65 0.0170 0.0538
2nd buncher 0.75 0.0167 0.0489
3rd buncher 0.88 0.0165 0.0442
4th buncher 0.92 0.0164 0.0431
5th buncher 0.98 0.0163 0.0415
Normal 1.00 0.0089 0.0756
Normal section (26 cells)Bunching section
(5 cells)
RF input coupler
RF output coupler
2.3 m
)( 2/2 pwz
)( 3/22 pwz
)(2 mz w
)(1 wz
)( 2/pwj
)( 3/2pwj
)( mwj
Shorting bar
Tapered W/G
W/G to Coax adapter Network analyzer
(Agilent E8362B)
1 2
Buncher and Normal cells
Coupler cells
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 12/32
Low Power Test of Actual Accelerating Column
Fig 3. PAL2# Accelerating Structure Phase Shift Measurement
-5.00
-4.00
-3.00
-2.00
-1.00
0.00
1.00
2.00
3.00
4.00
5.00
0 5 10 15 20 25 30 35
Input Cavity Cell Number Output
RF
Ph
ase
dev
iati
on
[d
egre
es]
Phase shift for cavity cell Cumulative phase shift for per cell relative to No.0
Measurement of phase advance per cell
RF Reflection
RF Transmission
LL--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 13/32
Beam Dynamics Simulation
0 50 100 150 200 250 3000
2
4
6
8
10
12
Longitudinal Distance (cm)
Av
erag
e B
eam
En
erg
y (
MeV
)
0 50 100 150 200 250 300-8
-4
0
4
8
12
Ele
ctri
c F
ield
(M
V/m
)
Longitudinal Distance (cm)
0 100 200 300 400 5000
5
10
15
20
25
30
Beam Envelope
Tan
sver
se C
oo
rdin
ate
(mm
)
Longitudinal Distance (cm)
Aperture Limitation
Focusing Magnetic Fields
Beam Envelope
Longitudinal E-field on the Axis
Beam Energy Distribution
0 50 100 150 200 250 3000
250
500
750
1000
1250
1500
Lo
ng
itu
din
al M
agn
etic
Fie
ld (
G)
Longitudinal Distance (cm)
LL--band: Designband: Design
* Calculated by the PARMELA code with RF profiles from the SUPERFISH code
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 14/32
Installation of Accelerating Column
E-gunPGV
Pre-buncher
Steering coil
Focusing solenoids
Accelerating column
BCM
RF windowVacuum system
Waterload
PGV
Solednoidslens
LL--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 15/32
Klystron and Modulator System
LL--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 16/32
Circuit Diagram of Klystron and Modulator
Peak forward voltage 50 kV max
Peak forward current 15 kA max
Average anode current 15 A max
Peak Charging Rate 33 kJ/sec
Output Voltage 45 kV
Average Output Power 30 kW
Number of Units 8 units
Thyratron
HVInverterPowerSupply
ZPFN, 15 Stage
1:13 Pulse TR
DINV DTAIL
RTAIL
RSNUB
CSNUB
REOLC
RINVRcharging
50 nF
2.2 μH
KlystronHeater P.S.168 V / 4.2 A
Cathode
Heater
6:1 Heater TR
LL--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 17/32
Klystron Diode Test
247.72 kV
Klystron beam voltage
Klystron beam current246.4 A
Load Impedance 1 kΩ
Load Voltage 247.72 kV
Load Current 246.4 A
Charging Voltage 42 kV
Pulse Width (70 %) 9.3 μs
Diode test with 220-Hz repetition rates
PFN voltage
LL--band: Commissioningband: Commissioning
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 18/32
Beam Acceleration
Input RF power
Output RF power
Output beam current
Input beam current
LL--band: Commissioningband: Commissioning
Depth-dose distribution of e-beam
0
0.2
0.4
0.6
0.8
1
1.2
0 1 2 3 4 5 6 7 8
Areal density (g/cm̂2)
Deposit
dose
(A.U
.)
`
Dose distribution in scanning direction
0
1
2
3
4
5
0 10 20 30 40
Distance (cm)
Abso
rbed
dose
(kG
y)
`
Dose distribution in scanning direction
Dose distribution through penetrating depth (Al)
18.5 MW
1.5 A1.3 A
6 µs
RF and beam pulsed waveform
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 19/32
Commissioning Status
Parameters 1st Machine 2nd Machine
RF frequency 1.3 GHz 1.3 GHz
Input RF power 12 MW 12 MW
Pulse length 8 μs/ 7 μs 7 μs/ 6 μs
Repetition rate 183 Hz 350 Hz
E-gun HV 75 kV 66 kV
Pulsed beam current 1.1 A 1.1 A
Beam energy ~ 9 MeV ~ 9 MeV
Beam power 13 kW 21 kW
E-gun pressure < 3×10-8 Torr < 3×10-8 Torr
ACC pressure < 10-7 Torr < 10-7 Torr
LL--band: Commissioningband: Commissioning
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.40
2
4
6
8
10
12
Beam power
Pea
k po
wer
(M
W)
Beam current (A)
Transmitted RF power
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.40
2
4
6
8
10
12
14
16
Bea
m e
nerg
y (M
eV)
Beam current (A)
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11
Advanced Center for E-beam Processing/KPARA, Cheorwon
(http://www.ebeam.or.kr)
20/32
10 MeV e-beam accelerator
2 MeV e-beam accelerator
165 keV e-beam accelerator
Seoul
Cheorwon
Pohang
Busan
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 21/32
Schematic Diagram of Accelerator System
X-ray Target
RF Window
Magnetron
Cooling WaterDistributor
TemperatureControllerPeak 1.5 MW,
Average 1.2 kW max.
IP: Ion PumpBCM: Beam Current Monitor
E-Gun
E-gun Heater PS
Circulatorw/ Matched Load
Trigger
40 kV, 50 A
20 kV, 150 mA
Accelerating Column
Pulse Modulatorwith Transformer
IP Controller
Vacuum GaugeController
CollimatorBCM
Ion Pump
CC--band: Overviewband: Overview
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 22/32
C-band Accelerator System
Accelerating column
RF window
Ion pump with vacuum gauge
Inverter/ Modulator/ Control rack
Magnetron
Pulse tank
Circulator
CC--band: Overviewband: Overview
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 23/32
Accelerator Parameter
CC--band: Designband: Design
Beam Parameters
Species Electron
Pulsed Output Current 50 mA
Output Energy 4 MeV @ 50 mA
Loss Beam Power Ratio 6 %
Accelerating Structure Parameters
Type of StructureBi-periodic
On-axis Coupled
Operating Mode SW π/2 mode
Number of Cells 10
Size 7.4 cm × 30.7 cm
Beam Aperture Diameter 10 mm
Accelerating Gradients 13.3 MV/m
Q-factor 11000
Effective Shunt Impedance 90 MΩ/m
Inter-cell Coupling Constant 6 %
RF System Parameters
Operating Frequency 5 GHz (C-band)
Pulsed RF Power 1.5 MW
Pulse Length 4 μs
Repetition Rate Max. 200 Hz
E-gun Parameters
High Voltage 20 kV
Pulsed Input Beam Current 150 mA
Beam Diameter (at the waist)
4 mm
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 24/32
Accelerating Structure
• Type: Biperiodic,On-axis-coupled, π/2-mode SW structure
• Number of cells: 10
• Length: 306 mm
• Inner diameter: ~48 mm
• Beam aperture diameter: 10 mm
Bunching cells3 cells × 21 mmβph ph = 0.7
Tapered W/G
RF input couplerIntercell magnetic
coupling slot
Normal cells6 cells × 30 mmβph ph = 1
CC--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 25/32
Accelerating Cavity
0.0 0.2 0.4 0.6 0.8 1.0
4800
4850
4900
4950
5000
5050
5100
5150
5200
5250
Normal Cell Bunching Cell
Fre
que
ncy
(M
Hz)
Phase advance /π
Measured dispersion relation
Network analyzer(Agilent E8362B)Network analyzer(Agilent E8362B)
CC--band: Designband: Design
Simulation of accelerating cavity
Prototype test
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 26/32
Low Power Test of Actual Accelerating Column
Step motor Cavity Tuning jig
Networkanalyzer
Reflection coefficient
Bead test and cavity tuning
In Smith Chart
Field flatness
CC--band: Designband: Design
Resonant frequency
• After brazing: 4998.86 MHz (20℃)• After tuning: 4999.46 MHz (20℃)
(*in air with humidity of 25%)
• Under vacuum: 4999.17 MHz (40℃)
Field errors in normal cells: 0.65%
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 27/32
Circuit Diagram of Magnetron & Modulator
Dong-A 403
5GHz, 1.5MW Magnetron & Pulse Modulator SystemC-Band1.5MW Magnetron
Pulse Modulator
High VoltageSwitched ModePower Supply
Tyratron
Dr iver Circuit
Tyra tronHe ater Power
Supply
MagnetronHe ater
Power Supply
Magnetron Beam Voltage Monitor
Magnetron Beam Current Monitor
EOLC
Protection Diode
ThyratronE2V
CX1191D
Tail Clipper
SurgeDes piker
Pulse Transformer
1:4
ResistorDivider
Dong-A 403Output Voltage 25 kVCharging Rate Peak 5 kJ/s Average 4.0 kJ/s
High VoltageCoaxialCable
MagnetronPulse Transformer
Tank
SON. Yoongyu, '2003. November . 19
Frequency 5100 MHzOutput Power 1.5 MWRepetiton Rate 200 ppsEffic ieccy 52 %Beam Voltage 39 kVBeam Current 83 ARF Pulse Width 4.0 ms
Peak Power 3.6 MWCharging Voltage 22.5 kVPFN Output Voltage 11.25 kVPFN Output Current 382 AHV Pulse Width (70% Voltage) 4.0 msRepetition Rate 200 pps
Pulse Modulator 7 Stage PFN
PFN impedance 29.37 WTotal Capacitance 68.26 nFTotal Inductance 51.6 mHSingle Capacitance 10 nF
50 W
30 W
50 W
G2
G1
10 mH
6.3 V
12. 5 A
CPI SFD369
1 nF
25 W
P1
P2
M2
M1M3
M4
E1
E2
E3
E2-1 E4 E4-1CT-2
Electron GUN
He aterPowe r Supply
ElectronGUN
ResistorDivider
Gun Beam Voltage Monitor
Gun Beam Current Monitor
50 W
CT-1
BNC-1 BNC-2 BNC-3 BNC-4
Heater voltage : 6.3 +/_ 0.5 V(Max :6.8 V), 12.5 A
Heater v oltage : 5 V +/_ 1 V(Max: 6 V), 28 A
He ater voltage : 9 V+/_ 1 V(Max: 10 V), 1 0 A
FilterPCB
2 MW
Dump SW
8.6 mH
1 0 nF
DS2124
DS21 24
RF-Output
CathodeVane
Anode
Strap
HV Probe
CC--band: Designband: Design
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 28/32
Magnetron Test
CC--band: Commissioningband: Commissioning
Modulator Pulse TR & RF Source System
PLC
CCPS
PFN
Mag. Input V (32 kV)
E-gun Input V (11.8 kV)
PFN Output V (8.4 kV)
HeaterP.S
24 26 28 30 32 34 36 38 400
10
20
30
40
50
60
70
80
90
RF output*50
Efficiency
Magnetron Current
RF
Out
put
(MW
), E
ffic
ienc
y (%
)
Mag
net
ron
Cur
rent
(A
)
Magnetron Voltage (kV)
24 26 28 30 32 34 36 38 40
24 26 28 30 32 34 36 38 40
0
10
20
30
40
50
60
70
80
90
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 29/32
High Power RF Conditioning
Avg. 1480 kWPeak 1570 kW
Avg. 93 kWPeak 123 kW
RF Fwd
RF Ref
Forward RF power
Reflected RF power
0
150
300
450
600
750
900
1050
1200
1350
1500
0 5 10 15 20 25 30 35 40 45 50
RF Conditioning Time (hour)
Inpur
RF
Pow
er (
kW
)
.
Pulse waveform
RF aging history
CC--band: Commissioningband: Commissioning
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 30/32
Beam Acceleration
CC--band: Commissioningband: Commissioning
0
5
10
15
0 10 20 30 40 50 60 70 80Longitudinal Position (cm)
Bea
m R
ad
ius
(mm
)
Operating Frequency 5 GHz
Pulsed RF Power 1.5 MW
Pulse Length 4 μs
Beam Energy 3.5 ~ 4.0 MeV
Pulsed Beam Current 50 mA / 150 mA
Beam Spot Size
(measured at 40 cm after the
end of accelerating column)
13 ~ 14 mm
4 μs
Beam Parameters
Beam size measured position
End of acc. column
Longitudinal Position (cm)
Rea
m S
ize
(mm
)
RF and beam pulsed waveform
Magnetronvoltage
Input RF power
Beam current
Beam measurement
Beam envelop calculated by PARMELA code
BCT
Gate valve
Beam profile measurement chamber
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 31/32
Characteristics of X-ray Attenuation
(Courtesy of Prof. C. Tang, ICABU’10)
CC--band: Designband: Design
Dual energy inspection→ Discrimination of materials
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 32/32
0
0.2
0.4
0.6
0.8
1
0 5 10 15 20 25 30 35 40 45 50Longitudinal Position (cm)
Bea
m R
adiu
s (c
m)
Beam envelop
Position of the cell
Design of New Accelerating Column
Parameters Previous New
Operating Frequency 5 GHz 5 GHz
Input RF Power (peak) 1.5 MW 1.5 MW
E-gun Voltage 20 kV 20 kV
Number of Cells 10 17
Length of Accelerating Column 30 cm 48 cm
Input Beam Current (pulsed) 150 mA 150 mA
Output Beam Energy 4 MeV 6 MeV
Output Beam Current (pulsed) 50 mA 80 mA
Iris Diameter 10 mm 8 mm
Average Accelerating Gradient 13.3 MV/m 13.8 MV/m
Beam Spot Size 5 mm 1.3 mm
CC--band: Designband: Design
Beam dynamics simulation for
new accelerating column(by PARMELA code)
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 33/32
Summary
• PAL/POSTECH developed electron RF linacs for industrial applications.
• L-band accelerator was installed at ACEP/KAPRA and now serves electron beams to processing users. The beam power reaches to almost 20 kW.
• C-band accelerator was commissioned for X-ray imaging sources. In order to increase the beam energy, new accelerating column is being designed adopting RF focusing scheme.
Electron Linacs for Industrial Applications, S. H. Kim, Sept. 30, 2011, ICABU’11 34/32
Thank you for your attention!