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[email protected]://nina.ecse.rpi.edu/shur/
GaN Microwave Transistors
Michael S. Shur
Rensselaer Polytechnic Institute
Presented at NJIT on 11/09/05
[email protected]://nina.ecse.rpi.edu/shur/
Research Topics• Wide band gap electronics/photonics
– Deep UV LEDs– SAW acousto optoelectronics– Solid State Lighting– GaN Microwave Transistors
• THz plasma wave electronics• Modeling and simulation
– Unified Charge Control Model– Monte Carlo– 2D Circuit CAD (AIM-Spice)– HEMTs– TFTs– CMOS– HBTs
• Remote Internet Lab
600 500 400 300 200 100
0.00
0.03
0.06
0.09
0.12
0.15
Abs
orba
nce
Wavenumber (cm-1)
TNT
TNT
Si THz 300 K
0.5 1.0 1.5 2.00.00.20.40.60.81.0
0.0 0.3 0.6 0.9 1.0.00.10.20.30.40.50.60.70.80.91.0
120 GHz 3 THz
Phot
ores
pons
e (a
rb. u
nits
)
Vg (V)
x 60
Lg=30 nm
Vg(V)
Pho
tore
spon
se(a
.u.)
6 THz30 nm
[email protected]://nina.ecse.rpi.edu/shur/
GaN-based Microwave and MM Wave Field Effect Transistors
Rensselaer Polytechnic InstituteTroy, NY 12180, USA
Michael S. Shur
1970 1975 1980 1985 1990 1995 20000
100
200
300
400500
600700
800900
10001100
1200 INSPEC search query:Gallium Nitride
or Indium Nitrideor Aluminum Nitride
Num
ber o
f Pub
licat
ions
Year
[email protected]://nina.ecse.rpi.edu/shur/
Motivation: silicon is becoming a commodity
$0
$1,000
$2,000
$3,000
$4,000
$5,000
$6,000
Annual salary Value added Profit
ChinaIndiaBangladesh
Data for 2001 textile industry from Time, December 13 (2004). Page A16
[email protected]://nina.ecse.rpi.edu/shur/
Outline
• New physics of GaN-based FETs• Problems and solutions
– Gate lag and current collapse– 2D modeling– Field plates– MEMOCVD– MOSHFETs, MISHFETs, MISDHFETs
• High power and microwave switches• GaN FETs at THz frequencies• Conclusions
[email protected]://nina.ecse.rpi.edu/shur/
Nitride Advantages
•High mobility•High saturation velocity•High sheet carrier concentration•High breakdown field•Decent thermal conductivity•Growth on SiC substrate
•Chemical inertness•Good ohmic contacts•No micropipes
High power
Heat handling capability
Reliability should be possible
Properties Advantages
•SiO2/AlGaN and SiO2/GaN good quality interfaces Insulated
Gate
[email protected]://nina.ecse.rpi.edu/shur/
Figure of Meritfor high frequency/high power
CFOM =χε oµvsEB
2
χε oµvs EB2( )silicon
χ is thermal conductivityEB is breakdown fieldµ is low field mobilityvs is saturation velocity
εo is dielectric constant
0
200
400
Si GaAs 6H-SiC
4H-SiC GaN
Com
bine
d Fi
gure
of M
erit
[email protected]://nina.ecse.rpi.edu/shur/
Nitride DisadvantagesBlue emitters:NONE
UV emitters – low efficiency
Electronics:Reproducibility, ReliabilityYieldHence $130 M DARPA program
[email protected]://nina.ecse.rpi.edu/shur/
GaN Device History• 1932 – Roosevelt wins Presidential Election.
First GaN crystal synthesized (W. C. Johnson et al)• 1961 – Yuri Gagarin becomes the first man in space. First
p-type GaN (A. G. Fischer) • 1969 – First Moon walk by Armstrong and Aldrin. First
monograph on nonmetallic nitrides (G. V. Samsonov)• 1971- Bangladesh Independence. First GaN LED(J. I. Pankove and Paul Maruska)
• 1987- Dow Jones plunges 508 points (22.6%) on October 19 p-type activation via e-beam irradiation (Obyden S.K et al) RPI FRESHMEN conceived
(from Paul Maruska, A Brief History Of GaN Blue Light-Emitting Diodes, http://www.onr.navy.mil/sci_tech/information/312_electronics/ncsr/materials/gan/maruskastory.asp)
[email protected]://nina.ecse.rpi.edu/shur/
Potential and Existing Applications of Nitride Devices
• Blue, green, white light, and UV emitters– Traffic lights– Displays– Water, food, air sterilization and detection of biological
agents– Solid state lighting
• Visible-blind and solar-blind photodetectors• High power microwave sources• High power and microwave switches• Wireless communications• High temperature electronics• SAW and acousto-optoelectronics• Pyroelectric sensors• Terahertz electronics• Non volatile memories• Bioelectronics
Applications of U of V/RPI/SET quadrichromatic
Versatile Solid-State Lamp: Phototherapy of seasonal affective disorder at Psychiatric
Clinic of Vilnius University
[email protected]://nina.ecse.rpi.edu/shur/
Nitrides: New Symmetry, Hence New Physics
Zinc Blende Structure (GaAs)Diamond Structure (Si, Ge) Wurtzite Structure (SiC, GaN)
GaAs bouleSi boule AlN boule (Courtesy Crystal IS)
[email protected]://nina.ecse.rpi.edu/shur/
Nitride Heterostructures: Polarization Induced Electron and Hole 2D Gases
From A. Bykhovski, B. Gelmont, and M. S. Shur, J. Appl. Phys.74, p. 6734-6739 (1993)
AlGaN on GaN
From O. Ambacher et alJAP 87, 334 (2000)
46vC mcP 36
[email protected]://nina.ecse.rpi.edu/shur/
Strain from the lattice mismatch
• uxx = (aGaN -aAlGaN)/aGaN
• Ppe = 2 uxx (e31-e33 C13/C33)
How Piezoelectric constants are determined?
•Electromechanical coefficients (difficult)•Optical experiments (indirect)•Estimate from transport measurements (very indirect)
[email protected]://nina.ecse.rpi.edu/shur/
Spontaneous polarization
For comparison, in BaTiO3, Ps = 0.25 C/m2 (1.93x1015cm-2)Carrier density in AlGaAs/GaAs is ~ 1012 cm-2
-0.0453.47 1014
-0.0574.39 1014
-0.0322.46 1014
-0.0292.23 1014
-0.0816.24 1014
Spontaneous polarization(C/m2)(cm-2)
BeOZnOInNGaNAlNAfter F. Bernardini et al. Phys Rev. 56, 10024(1997)
[email protected]://nina.ecse.rpi.edu/shur/
Both Spontaneous and Piezo Polarizations are Important
GaN
GaN
GaN
AlGaN
AlGaN
AlGaN
Relaxed
Relaxed
TensileStrain
CompressiveStrain
Relaxed
Relaxed
GaN
GaN
GaN
AlGaN
AlGaN
AlGaN
Psp
Psp
Psp
Psp
Ppe
Ppe
Psp
Psp
Ppe
Ppe
Psp
Psp
PspPsp
+σ
+σ
-σ +σ
-σ
-σ
[0001] [0001]
Ga face N face
After O. Ambacher et al. J.Appl. Phys. 85, 3222 (1999)
2D electrons
2D holes
2D holes
2D electrons
[email protected]://nina.ecse.rpi.edu/shur/
Polarization Doping in AlGaN/GaN Heterostructures
A l M o la r F r a c t io n
0
1
2
3
4
5
6
0 0 .2 0 .4 0 .6 0 .8 1
From M. S. Shur, A. D. Bykhovski, R. Gaska, and A. Khan, GaN-based Pyroelectronicsand Piezoelectronics, in Handbook of Thin Film Devices, Volume 1: Hetero-structures for High Performance Devices, Edited by Colin E.C. Wood, pp. 299-339,
Academic Press, San Diego, 2000
• •
•
•
•0
0.2
0.4
0.6
0.8
1
1.2
0 20 40 60 80 100 120Thickness, nm
abrupt interface
graded interface
R. Gaska, A. D. Bykhovski, M. S. Shur, Piezoelectric Doping and Elastic Strain Relaxation in AlGaN/GaN HFETs, pp. 435-458, Appl. Phys. Lett. Vol. 73, No. 24, 3577 (1998)
[email protected]://nina.ecse.rpi.edu/shur/
Effect of Strain on Dislocation-Free Growth
• Critical thickness as a function of Al mole fraction in AlxGa1-xN/GaN: superlattice (solid line), SIS structure (dashed line).
From A. D. Bykhovski, B. L. Gelmont, and M. S. Shur, J. Appl. Phys. 81 (9), 6332-6338 (1997)
0
10
20
30
40
50
60
0 0.2 0.4 0.6 0.8 1
Al Mole Fraction
Thickness, nm
100 200 300 400 500 600
1,000
2,000
3,000
300K
77K
Hal
l Mob
ility
(cm
2 /Vs)
AlGaN Thickness (A)
Effect of Critical Thickness on Electron Mobility
[email protected]://nina.ecse.rpi.edu/shur/
New physics of electron/hole transport
•Large polar optical phonon energy (x 3 GaAs) - Quasi-elastic polar optical scattering
•Ultra dense 2D gas (x 20)
•Electron “runaway” dominant
•Strange holes/ strange acceptors
After V.T. Masselink, Applied Physics Letters, vol. 67(6), 801-805, 1995
EEC2 EC3
Vdr
VC3
VC2 3D
2D
EEC2 EC3
Vdr
VC3
VC2 3D
2D
[email protected]://nina.ecse.rpi.edu/shur/
New physics of electron transport
•Large polar optical phonon energy (x 3 GaAs) - Quasi-elastic polar optical scattering•Ultra dense 2D gas (x 20)•Electron “runaway” dominant
After V.T. Masselink, Applied Physics Letters, vol. 67(6), 801-805, 1995
EEC2 EC3
Vdr
VC3
VC2 3D
2D
EEC2 EC3
Vdr
VC3
VC2 3D
2D
From A. Dmitriev, V. Kachorovskii, M. S. Shur, and M. Stroscio, Electron Drift Velocity of Two Dimensional Electron Gas in Compound SemiconductorsInternational Journal of High Speed Electronics and Systems, Invited, Volume 10, No 1, pp. 103-110, March 2000
21
2
1 am∝δ
22
2
2 am∝δ
m1 << m2 ⇒δ1 >> δ 2
2
1
[email protected]://nina.ecse.rpi.edu/shur/
Consequence of high polar optical energy: two step optical polar scattering process
Active region
Passive region
From B. Gelmont, K. S. Kim, and M. S. Shur, J. Appl. Phys. 74, 1818 (1993)
ω0
K = 0.6
K = 0K = 0.3
mob
ility
(cm
2 /V
s )
0
100
1,000
1017 1018 1019
Doping (cm-3)
[email protected]://nina.ecse.rpi.edu/shur/
Comparison of Runaway in 2D and 3D Systems
3D Case•Deformation scattering on acoustic and optical phonons does not lead to runaway•Polar optical scattering (forward!) leads to runaway
2D Case•Even deformation scattering leads to runaway
[email protected]://nina.ecse.rpi.edu/shur/
High Drift Velocity and high mobility
.
0
1
2
3
0 100 200 300Electric Field (kV/cm)
2
GaN
Vel
ocity
(100
,000
m/s
)
GaAs
SiC
Si
> 2,000 cm2/V-s (300 K)see R. Gaska, J. W. Yang, A. Osinsky, Q. Chen,M. Asif Khan, A. O. Orlov, G. L. Snider, M. S. Shur, Appl. Phys. Lett., 72, 707, 1998
3
2
1
0
300 K500 K1,000 K
0.1 0.2 0.3
Electric field (MV/cm)
GaN 3
2
1
0 5 10 15 20
300 K500 K1,000 K
GaAs
Electric field (kV/cm)
(a) (b)
Fig. 1 a is from U. V. Bhapkar, and M. S. Shur, Monte Carlo Simulation of Electron Transport in Wurtzite GaN, J. Appl. Phys., 82 (4), pp. 1649-1655,August 15 (1997)
0
2
4
6
8
10
0 0.1 0.2 0.3
Distance [micron]
Velo
city
[107 c
m/s
]
75 kV/cm
600 kV/cm
200 kV/cm
150 kV/cm
After B. E. Foutz, S. K. O'Leary, M. S. Shur,and L. F. Eastman. Appl. Phys., vol. 85, . 7727 (1999)
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Velocity-Field Curves for Nitride Family
InN is the fastest nitride material
From B. E. Foutz, S. K. O'Leary, M. S. Shur, and L. F. Eastman, J. Appl. Phys. 85, 7727 (1999)
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Electron mobility (over 2,000 cm2/V-s)
0 1 2 3 4
600
900
1,200
1,500
1,800
2,100
2D Electron Density (x 101 3 cm-2)
Hal
l Mob
ility
(cm
2 /V-s
)Al0 .2Ga0.8N-GaN
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Overshoot in GaN
Below 150 kV/cm little or no overshoot occursAt 200 kV/cm modest overshoot occurs over 0.3 micronAt 600 kV/cm high velocity occurs below 0.1 micron
0
2
4
6
8
10
0 0.1 0.2 0.3
Distance [micron]
Velo
city
[107 c
m/s
]
75 kV/cm
600 kV/cm
200 kV/cm
150 kV/cm
After B. E. Foutz, S. K. O'Leary, M. S. Shur, and L. F. Eastman, Transient Electron Transport in Gallium Nitride, Indium Nitride, and Aluminum NitrideJ. Appl. Phys., vol. 85, No. 11, pp. 7727-7734 (1999)
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Higher Breakdown Field in Heterostructures?
Breakdown field might be determined by cladding layers(see M. Dyakonov and M. S. Shur, Consequences of Space
Dependence of Effective Mass in Heterostructures, J. Appl. Phys. Vol. 84, No. 7, pp. 3726-3730, October 1 (1998)
AlGaN
AlGaNGaN Quantum WellWavefunction
Large current carrying capabilities are combine with large voltage blocking capabilities
[email protected]://nina.ecse.rpi.edu/shur/
Thermal Conductivity versus Temperature
Si data after Glassbrenner and Slack (1964)
GaN data after Sichel and Pankove (1977)
Thick red line - theoretical expectations for pureGaN based on Pankove data and anharmonicity mechanism
10 100 1000
1
10
100
0.1Ther
mal
Co n
duc t
ivity
( W c
m-1
K-1
)
Temperature (K)
GaN
Si
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Nitride-based FETs – promises and problems
Promises• 30 W/mm at 10 GHz versus 1.5 W/mm for GaAs• 150 W – 240 W per chip• Highest cutoff frequency so far 152 GHz Problems• Gate leakage• Gate lag and current collapse• Reliability• YieldSolutions• Strain energy band engineering• MEMOCVDtm
• Insulated gate designs• Gate edge engineering
M. A. Khan, M. S. Shur, Q. C. Chen, and J. N. Kuznia, Current-Voltage Characteristic Collapse in AlGaN/GaN Heterostructure Insulated Gate Field Effect Transistors at High Drain Bias, Electronics Letters, Vol. 30, No. 25, p. 2175-2176, Dec. 8, 1994
[email protected]://nina.ecse.rpi.edu/shur/
High Electron Sheet Density Allows for a New Approach: AlGaN/GaN MISFET
M. A. Khan, M. S. Shur, Q. C. Chen, and J. N. Kuznia, Current-Voltage Characteristic Collapse in AlGaN/GaN Heterostructure Insulated Gate Field Effect Transistors at High Drain Bias, Electronics Letters, Vol. 30, No. 25, p. 2175-2176, Dec. 8, 1994
[email protected]://nina.ecse.rpi.edu/shur/
MOSHFET (SiO2 )
I-SiC
Pd/Ag/AuGaN AlN
Pd/Ag/AuAlInGaN
S G D
SiO2
AlGaN/ InGaN GaN DHFET
I-SiC
Pd/Ag/AuGaN AlN
InGaN AlInGaN
S G D
Si3N4 /SiO2
I-SiC
Pd/Ag/AuGaN AlN
InGaN AlInGaN
S G D
MISDHFET
MISHFET Si3N4 I-SiC
Pd/Ag/AuGaN AlN
Pd/Ag/AuAlInGaN
S G D
Si3N4Reducing the gate leakage current (104 - 106 times)
Reducing current collapse, Improving carrier confinement
Combining the advantages
Resolving the issues: AlGaInN, gate dielectrics, InGaN channel
[email protected]://nina.ecse.rpi.edu/shur/
Unified charge control model (UCCM) and Real Space Transfer
V V a n n V nnGT F s th
s− = − +⎛⎝⎜
⎞⎠⎟α η( ) ln0
0MOSFETs and HFETs
www.aimspice.com
From S. Saygi, A. Koudymov, S. Rai, V. Adivarahan, J. Yang, G. Simin, M. Asif Khan, J. Deng, M.S. Shur, and R. Gaska, Real Space Electron Transfer in III-Nitride Metal-Oxide-Semiconductor-Heterojunction (MOSH) Structures, Appl. Phys. Lett., accepted for publication
[email protected]://nina.ecse.rpi.edu/shur/
Real Space Transfer in MOSHFETs
From S. Saygi, A. Koudymov, S. Rai, V. Adivarahan, J. Yang, G. Simin, M. Asif Khan, J. Deng, M.S. Shur, and R. Gaska, Real Space Electron Transfer in III-Nitride Metal-Oxide-Semiconductor-Heterojunction (MOSH) Structures, Appl. Phys. Lett., accepted for publication
[email protected]://nina.ecse.rpi.edu/shur/
MOSHFET Gate Leakage
1. E- 08
1. E- 07
1. E- 06
1. E- 05
1. E- 04
1. E- 03
1. E- 02
1. E- 01
- 10 - 5 0 5Voltage ( V )
Gat
e Cu
rrent
Den
sity
(A/c
m^2
)
25oC
50oC
75oC100oC
150oC
Traps and leakage:Complexities of highly non-ideal systems
From F. W. Clarke, Fat Duen Ho, M. A. Khan, G. Simin, J. Yang, R. Gaska, M. S. Shur, J. Deng, S. Karmalkar, Gate Current Modeling for Insulating Gate III-N Heterostructure Field-Effect Transistors, Mat. Res. Symp. Proc. Vol. 743, L 9.10 (2003)
[email protected]://nina.ecse.rpi.edu/shur/
Trapping in Nitrides:Reverse Gate Leakage Modeling
Direct tunneling and trap-assisted tunnelingFrom S. Karmalkar, D. Mahaveer Sathaiya, M. S. Shur, Mechanism of the Reverse Gate Leakage in AlGaN / GaNHEMTs, Appl. Phys. Lett. 82, 3976-3978 (2003)
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Comparison with Experiment
From S. Karmalkar, D. Mahaveer Sathaiya, M. S. Shur, Mechanism of the Reverse Gate Leakage in AlGaN / GaNHEMTs, Appl. Phys. Lett. 82, 3976-3978 (2003)
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Doped channel GaN/AlGaN HFETs for Higher Power
. 2
-20 20 40
0
Ener
gy (e
V)
Distance (nm)
Undoped
Nd = 5x1017 cm-3 1
After M. S. Shur, GaN and related materials for high power applications, Mat. Res. Soc. Proc. Vol. 483, pp. 15-26 (1998)
[email protected]://nina.ecse.rpi.edu/shur/
MOSHFET Switch
0 100 200 300 400 500 6000
5
10
15
20
- 6 V
- 3 V
0 V
+ 3 V
Vg = + 6 V
PON/OFF = 7.5 kW/mm2
R ON = 75 mOhm-mm2
Cur
rent
, A/m
m2
Drain Voltage, V
15 µm source-drain spacingAfter G. Simin, X. Hu, N. Ilinskaya, A. Kumar, A. Koudymov, J. Zhang, M. Asif Khan, R. Gaska and M. S. ShurA 7.5 kW/mm2 current switch using AlGaN/GaN Metal-Oxide-Semiconductor Heterostructure Field Effect Transistors on SiC Substrates, Electronics Letters. Vol. 36 Issue: 24, pp. 2043 –2044, Nov. 2000
• 75 mOhm×mm2
• 2 - 3 times less than that reported for buried channel SiC FETs
• 25-100 times less than that for SiC induced channel MOSFETs
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MOSHFET Technology for Power Electronics
Switching speeds1,000 times higher than for Si IGBTs can be achieved (up to GHz range
Commensurate decrease in power supply weight, cost and reliability due to dramatic decrease in size and weight of reactive components
Big improvement in power qualityEnergy markets: “future energy”
102 103 10410-8
10-6
10-4
10-2
100
102
Breakdown Voltage (V)
GaN
Si
SiC
re
GBONsp
EVR
εµ
5.72310725.8 −−×=
R ON
sp (Ω
2 )
From J.L Hudgins, G.S. SiminE. Santi, and M.A. Khan, IEEE Transactions on Power Electronics, vol. 18, no. 3, May 2003
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Applications
10 100 10, 0001,0 0010 -2
10 0
10 2
10 3
10 1
10 -1D is p layd ri ve s
T e le c o m m u -ni c a tio ns
F a c to ryA u to m at io n
Mo to rCo n t ro l
L a m pB a l la s t
T ra c t io nHD V C
B lo c k in g vo l ta g e ( V )
PowerSupplies
Automotive
GaNregion
Cur
ren t
(A)
GaN-UF
SiC-ABBGaN-UF
SiC-Purdue
GaN-UF
SiC-NCSU
SiC-RPI
GaN-Caltech
6H-SiC
4H-SiC
GaN
AlGaN-UF
AlGaN
B r e a k d o w n V o l ta g e (V )
Sp
eci
fic
Re
sist
an
ce (
oh
m-c
m2
)
101 102 103 10410-4
10-3
10-2
10-1
100
MG-MOSHFET
Data from B. J. Baliga, IEEE Trans., ED-43, p. 1717 (1996)
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Design Example
MOSHFET Switch, x10 voltage x3 currentDramatic improvement in yield and reliability
After G. Simin and M. Asif Khan, M. S. Shur, R. Gaska, High-power switching using III-Nitride Metal-Oxide Semiconductor Heterostructures, International Journal of High Speed Electronics and Systems, Vol. XX, No. X 1-14 (2005)
+
+
-
-
-
-
+
+
L G1
G2 G3
G4
[email protected]://nina.ecse.rpi.edu/shur/
Field Plate
From S. Karmalkar, M. S. Shur, and R. Gaska, GaN-based power high electron mobility transistors, in 'Wide Energy Bandgap Electronic Devices”, pp. 173-216, Fan Ren and John Zolper, Editors, World Scientific (2003), ISBN 981-238-246-1
n-AlGaN 1 x 1016 / cm3 0.02 µm
n-GaN 1 x 1015 / cm3 0.03 µm
0.5 µm 1 µm Vg Ldg
Silicon nitride, 0.3 µm
Vd
2-DEG, 1x1013 / cm2 p-GaN, 1.5 x 1016 / cm3
2 µm 2 µm
1 x 1018 / cm3 0.05 µm tp
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No Field Plate, One Field PlateTwo Field Plates
0 2 4 6 8 100
1
2
3 Drain FPGate FP
B
C
A
Elec
tric
Fiel
d (M
V / c
m)
Distance from Source (µm)
0 200 400 600 800 1000 12000
1
2
3
Dra
in C
urre
nt (
mA/
mm
)
Drain Bias ( V )
0
10
20
30B
C
A
From S. Karmalkar, M. S. Shur, and R. Gaska, GaN-based power high electron mobility transistors, in 'Wide Energy Bandgap Electronic Devices”, pp. 173-216, Fan Ren and John Zolper, Editors, World Scientific (2003), ISBN 981-238-246-1
[email protected]://nina.ecse.rpi.edu/shur/
RESURF Effect
0 2 4 6 8 10 120
200
400
600
800
1000
1200
Grounded substrate
Field plates andp-n junction
Ideal
Floatingsubstrate
Field plates only
Bre
akdo
wn
volta
ge, V
br (V
)
Drain to gate separation, Ldg (µm)
From S. Karmalkar, M. S. Shur, and R. Gaska, GaN-based power high electron mobility transistors, in 'Wide Energy Bandgap Electronic Devices”, pp. 173-216, Fan Ren and John Zolper, Editors, World Scientific (2003), ISBN 981-238-246-1
[email protected]://nina.ecse.rpi.edu/shur/
GaN 1/f Noise Surprises
1.E-07
1.E-06
1.E-05
1.E-04
1.E-03
1.E-02
1.E-01
1.E+00
1.E+0110
10-7
10-6
10-5
10-4
10-3
10-2
10-1
1
GaN[8]
Si [1-2]
GaAs[1-2]
SiC [3-4]
GaN HFETon Sapphire [8-9]
GaAsHEMTs [5]
GaN HFETon SiC [9]
Si NMOS [6-7]
GaN MOS-HFET [10]
1.E-07
1.E-06
1.E-05
1.E-04
1.E-03
1.E-02
1.E-01
1.E+00
1.E+0110
10-7
10-6
10-5
10-4
10-3
10-2
10-1
110
10-7
10-6
10-5
10-4
10-3
10-2
10-1
1
GaN[8]
Si [1-2]
GaAs[1-2]
SiC [3-4]
GaN HFETon Sapphire [8-9]
GaAsHEMTs [5]
GaN HFETon SiC [9]
Si NMOS [6-7]
GaN MOS-HFET [10]
Device noise is smaller than materials noise!!!
[email protected]://nina.ecse.rpi.edu/shur/
Where the traps are (from GR noise)
-3.5
-3.0
-2.5
-2.0
-1.5
-1.0
-0.5
0.0
0.24 eV [42]
AlGaN thin films
1 eV [54]
1.6 eV [41]
0.2 eV [38]1-3 meV [30]
0.35-0.36 eV [36,38]
0.42 eV [37]
0.85 eV [38]
1 eV [4]1 eV [33]
EC
AlGaN/InGaN/GaN heterostructures
AlGaN/GaN heterostructures
GaNphotodetectors
Ene
rgy
E (
eV)
From S. L. Rumyantsev, Nezih Pala, M. E. Levinshtein, M. S. Shur, R. Gaska, M. Asif Khan and G. Simin, Generation-Recombination Noise in GaN-based Devices, from GaN-based Materials and Devices: Growth, Fabrication, Characterization and Performance, M. S. Shur and R. Davis,
Editors, World Scientific, 2004
[email protected]://nina.ecse.rpi.edu/shur/
0
10
20
30
40
50
60
-10 -8 -6 -4 -2
Idc(VG= 0)
VG(t)
Id (return @ VG= 0)
VG= 0
Id (VG)
Current collapse
Tarakji, G. Simin, N. Ilinskaya, X. Hu, A. Kumar, A. Koudymov, J. Zhang,and M. Asif Khan, M.S. Shur and R. Gaska, Appl. Phys. Lett., 78, N 15, pp.
2169-2171 (2001) G. Simin, A. Koudymov, A. Tarakji , X. Hu, J. Yang and
M. Asif Khan, M. S. Shur and R. Gaska APL October 15 2001
VG
Gate Lag and Current collapse in AlGaN/GaN HFETs:Pulsed measurements of “return current”
Time
Time
IDS
VT
“Return” current
Current collapse
[email protected]://nina.ecse.rpi.edu/shur/
Nearly Identical Gate Lag Current Collapse was observed in:
I-SiC/Sapphire
Pd/Ag/AuGaN AlN
AlGaN S G D
I-SiC/Sapphire
Pd/Ag/AuGaN AlN
n-GaN S G D
GaN MESFET AlGaN/GaN HFET AlGaN/GaN MOSHFET
I-SiC
Pd/Ag/AuGaN AlN
AlGaN
S G D
SiO2
0 20 40 60 80 100 120 1400.00.20.40.60.81.01.21.41.61.82.02.22.4
R, k
Ω
LG, µm
R(0) R(τ)
LG
• AlGaN cap layer is not primarily responsible for CC
• Only the gate edge regions contribute to the CC
GTLM pattern (LG variable, LGS= LGD =const)
[email protected]://nina.ecse.rpi.edu/shur/
Electron temperature contour map VD = 10V and VS = VG = 0V
From N. Braga, R. Gaska, R. Mickevicius, M. S. Shur, M. Asif Khan, G. Simin, Simulation of Hot Electron and Quantum Effects in AlGaN/GaN HFET, submitted to JAP
Importance of gate edge engineeringconfirmed
[email protected]://nina.ecse.rpi.edu/shur/
Mechanism of current collapse in GaN FETs
• Current collapse is not related to AlGaN layer alone
• Current collapse is caused by trapping at gate edges
• Current collapse can be eliminated by using DHFET structures
• Current collapse time delay correlates with 1/f noise spectrum
• SOLVE THE CURRENT COLLAPSE ISSUE BY CHANNEL AND GATE EDGE ENGINEERING
[email protected]://nina.ecse.rpi.edu/shur/
G. Simin et.al. Jpn. J. Appl. Phys. Vol.40 No.11A pp.L1142 - L1144 (2001)
• Better 2DEG confinement and Partial strain compensation• Significantly reduced carrier spillover
•No current collapse
I-SiC
Pd/Ag/Au
GaN
AlN
InGaN (x ≤ 5%, 50 A) AlGaN (x=0.25,250 A)
S G D
I-SiC
Pd/Ag/Au
GaN
AlN
InGaN (x ≤ 5%, 50 A) AlGaN (x=0.25,250 A)
S G DS G D S G D
1017
1016
1014
~0.1 µm
Regular HFET InGaN channel DHFET
1014
~0.05 µm
InGaN channel DHFET Design – 2D simulationsG-Pisces (VG= -1; VD = 20 V)
[email protected]://nina.ecse.rpi.edu/shur/
From R. Gaska, M. Asif Khan, and M. S. Shur, III-nitride based UV light emitting diodes, pp. 59-76 in UV Solid-State Light Emitters and Detectors. Proc. NATO ARW, Series II, Vol. 144, ed. By M. S. Shur and A. Zukauskas, Kluwer, Dordrecht, 2004
Strain and Energy Band Engineering
•Graded composition profile and quaternary AlGaInN •Superlattice buffers for strain relief•PALE and MEMOCVD epitaxial growth•Homoepitaxial substrates•Non-polar substrates
0.0 0.2 0.4 0.6 0.8 1.00
10
20
30
40
50
60
70
Thic
knes
s (n
m)
Al molar fractionFrom A. D. Bykhovski, B. L. Gelmont, and M. S. Shur, Elastic Strain Relaxation in GaN-AlN Superlattices, Proceedings of International Semiconductor Device Research Symposium, Vol. II, pp. 541-544, Charlottesville, VA, ISBN 1-880920-04-4, Dec. 1995
[email protected]://nina.ecse.rpi.edu/shur/
Effect of Strain on Dislocation-Free Growth
• Critical thickness as a function of Al mole fraction in AlxGa1-xN/GaN: superlattice (solid line), SIS structure (dashed line).
From A. D. Bykhovski, B. L. Gelmont, and M. S. Shur, J. Appl. Phys. 81 (9), 6332-6338 (1997)
0
10
20
30
40
50
60
0 0.2 0.4 0.6 0.8 1
Al Mole Fraction
Thickness, nm
100 200 300 400 500 600
1,000
2,000
3,000
300K
77K
Hal
l Mob
ility
(cm
2 /Vs)
AlGaN Thickness (A)
Effect of Critical Thickness on Electron Mobility
[email protected]://nina.ecse.rpi.edu/shur/
MOs
NH3
Surface roughening
Pre-reaction!!!
gas-phase reaction and low surface migration
Growth front
Growth steps
Conventional MOCVDConventional MOCVD
[email protected]://nina.ecse.rpi.edu/shur/
MOs
NH3
Minimized pre-reaction
Enhanced migration
allowing V/III separation hence reducinggas-phase reaction & enhancing surface migration
Growth front
Growth steps
MEMOCVDMEMOCVDTMTM
[email protected]://nina.ecse.rpi.edu/shur/
AlInGaN HFETs on 4AlInGaN HFETs on 4”” SubstratesSubstrates
AlAl0.250.25GaGa0.750.75N/GaNN/GaN44”” sapphiresapphire
8 mm edge exclusion8 mm edge exclusion
3.2 3.4 3.6 3.8 4.0 4.2 4.4
0
2000
4000
6000 5
4
321
PL
Inte
nsity
(a.u
.)
Photon Enenrgy (eV)
Room temperature PL mapping of 4” diameter AlGaN/GaN HFET wafer
22 22 23 23 24
Al%22 22 23 23 2422 22 23 23 24
Al%
AlAl-- variation < 2% over 4variation < 2% over 4”” waferwafer
MEMOCVDMEMOCVD™™
[email protected]://nina.ecse.rpi.edu/shur/
Bulk AlN (400 µm)
Pd/Ag/Au
GaN (0.3 µm)Epitaxial AlN (0.3 µm)
Pd/Ag/Au
AlGaN (22 nm)
SourceGate
Drain
AlGaN/ GaN HFET
Makes surface smoother
Al molar fraction 29%Substrate from Crystal IS
HEMT structure design on Bulk AlN substrate
[email protected]://nina.ecse.rpi.edu/shur/
-2 0 2 4 6 8 10 12 14 16 180.00.10.20.30.40.50.60.70.80.91.0
Max. VGS=+5V;1V step
Dra
in C
urre
nt, A
/mm
VDS, V
Devices on AlN comparable to those on semi-insulating SiCDevices with W = 1 mm (multi finger) have been fabricated
Lg ~ 1.5 mm, Lgs ~ 1 mm, Ldg ~ 4 mm
Large positive Vgs > 5 V applied
Much larger than for HEMTs on SiC
DC characteristics of AlGaN/GaN HEMT device
[email protected]://nina.ecse.rpi.edu/shur/
-10 -5 0 5 10 15 20 25-202468
10121416182022242628
PAE
Gain
POut
Dev. Eff. Width = 100 µm
2.2 W/mm
4.1 W/mm
VDS=25 V VDS=45 V
PO
ut, d
Bm
; G
ain,
dB
; P
AE
, %
Delivered Input Power, dBm
RF characteristics of AlGaN/GaN HEMT device
4 GHz
[email protected]://nina.ecse.rpi.edu/shur/
Inverted channel design to be explored
AlN
InGaN
DrainSourceGate 1
n-type AlGaInN
AlN
InGaN
DrainSourceGate 1
n-type modulation doped AlGaInN
SET, patent pending
[email protected]://nina.ecse.rpi.edu/shur/
Plasma Wave THz DevicesDeep submicron FETs can operate in a new PLASMA regime at frequencies up to 20 times higher than for conventional transit mode of operation
-600 -500 -400 -300 -200 -100 0
0
1
2
3
4
5
C
B
A
Res
onan
t Pea
k (a
.u.)
Gate Voltage(mV)
THz emission from 60 nm InGaAs HEMTResonant detectionOf sub-THz and THz
0 2 4 6 8 10 1202468
101214161820
0 1 2 30.0
0.5
1.0
0.2 0.4 0.6 0.8
0.4
0.6
0.8
1.0
InGaAs-HEMT
f (TH
z)
Usd (V)f (THz)
Em
issi
on (a
.u.)
Emis
sion
Inte
nsity
(a.U
.)
Detection Frequency (THz)
InSb-bulka)
b)
From W. Knap, J. Lusakowski, T. Parenty, S. Bollaert, A. Cappy, V. Popov, and M. S. Shur, Emission of terahertz radiation by plasma waves in sub-0.1 micron AlInAs/InGaAs high electron mobility transistors, Appl. Phys. Lett. , March 29 (2004)
[email protected]://nina.ecse.rpi.edu/shur/
GaN Microwave Detector
0 5 10 15 20
0
5
10
15
20(a)GaN HFET
f ( GHz )
R
( V/W
)
Measured DataCalculated (x0.25)
0.0 0.5 1.0 1.5 2.0
0
100
200
300(b)
From J. Lu, M. S. Shur, R. Weikle, and M. I. Dyakonov, Detection of Microwave Radiation by Electronic Fluid in AlGaN/GaN High Electron Mobility Transistors, in Proceedings of Sixteenth Biennial Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits, Ithaca, New York, Aug. 4-6 (1997), pp. 211-217
[email protected]://nina.ecse.rpi.edu/shur/
GaN-based Plasma Wave Electronics
-4 -2 0 2 4
0.0
2.0
4.0
6.0
8.0 T=8 K, GaN HEMT600 GHz
Indu
ced
V s-Vd (m
V) (L
ock-
In X
Out
put)
Vg (V)50 75 100 125 150 175 200 225 250
0.0
1.0
2.0
3.0
4.0
5.0
Inte
nsity
(a.u
.)
Frequency (GHz)
Radiation intensity from 1.5 micron GaN HFET at 8 K.
600 GHz radiation response of GaN HEMT at 8 K
8 GHz cutoff
[email protected]://nina.ecse.rpi.edu/shur/
Electronic island at the surface of semiconductor grain in pyroelectric matrix
(MQDs -Moveable Quantum Dots)
Control by external field – zero dimensional Field Effect (ZFE)
Po
Semiconductor
Electronic island
PyroelectricPo
Semiconductor
Electronic inversion island
Pyroelectric
Hole inversion island
Inversion electron and hole islands at the surface of pyroelectric grain in semiconductor matrix
After V. Kachorovskiy and M. S. Shur, APL, March 29 (2004)
[email protected]://nina.ecse.rpi.edu/shur/
Terahertz oscillations
MOVABLE QUANTUM DOTS (MQD)
CAN SWITCH OR SHIFT FREQUENCY BY EXTERNAL FIELD OR BY LIGHT
1 THz to 30 THz
2D island might oscillate as a whole over grain surface. The oscillations can be exited by AC field perpendicular to Po
00
4( 2 )p
ePmR
=+
πωε ε
Oscillation frequency is of the order of a terahertz
0 2~ω π/
Oscillation frequency
After V. Kachorovskiy and M. S. Shur, APL, March 29 (2004)
[email protected]://nina.ecse.rpi.edu/shur/
New Physics of Movable Quantum Dots• Self-assembled quantum dot arrays• Coulomb blockade• Light concentration in quantum dots• Left handed materials
• Terahertz detectors• Terahertz emitters• Terahertz mixers• Photonic terahertz devices• Photonic crystals• Plasmonic crystals• Solar cells and thermo voltaic cells
New Potential Applications
[email protected]://nina.ecse.rpi.edu/shur/
I owe a debt of gratitude to my students, postdocs, and collaborators around the Globe
[email protected]://nina.ecse.rpi.edu/shur/
New device physics of nitride based materialsEnables new applicationsRequires new designs and new modeling approaches
GaN based microwave devicesFactor of 10 to 30 advantage in powerInsulated gate has an advantage
THz plasma wave electronics devicesGaN has an advantageBoth resonant detectors and emitters are possible
Conclusions