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Optical NanoGauge / Optical MicroGauge

Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

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Page 1: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

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Optical NanoGauge / Optical MicroGauge

Page 2: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

2

C11627 P12 C11295 P14

C10178 P10

SiO2

SiO2

SiO2

C12562 C11011

C11623

C11665

C10323

SiO2

P6

P16

P18 P20

P16

NEW

SiO2

Optical MicroGauge

700 μm

2900 μm

100 μm100 μm

50 μm

25 μm

0.5 μm

10 nm20 nm20 nm

Sample thickness

Optical NanoGauge Microscopic typeOptical NanoGauge / Optical MicroGauge

*The refractive index of SiO2 is 1.5, Si is 3.67 in this catalog.

Optical NanoGauge

1 mm100 μm10 μm1 μm100 nm

Extensibility model forresearch laboratory

Thick film measurementwith high speed

Embedded modelin 1Box unit

Ultrathin film measurementwith high speed

Multipointmeasurement

Microscope typeNanoGauge

Microscope typeMicroGauge

Embedded modelin 1Box unit

Page 3: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

3

High measurement stability for focus and angular fluctuations

Defocus

No difficulty involved in designing a measurement systemShort down time for maintenanceNo adjustment jig necessary

Costreduction

Angularfluctuation

Roll-to-roll film production

Example: Inline measurement settings for film coating system

Let-off

Cutting, Roll-up

Drying, Curing

Multipoint NanoGaugeC11295

Optical NanoGaugeC12562

Optical MicroGaugeC11011

Coating, Deposition (PVD/CVD)

Plastic film, Bonding layer, ITO, Wet film

Coating layer

Film thickness, Coated layer thickness, Total thickness

Measurement after drying and curing

Example: Inline measurement settings for PVD/CVD system

Flange

Vacuumchamber

Multipoint NanoGaugeC11295

Max. 15 points

Film thicknessmeasurement

Evaporation film(PVD/CVD)

ITO, SiOx, NbO

Vacuum conditions - Vacuum level: 10-5 Pa - Environment temp: Less than +80 ˚C

Inside/outside of vacuum chamber is isolated by vacuum flange.Inside vacuum chamber, up to 15 vacuum fibers with 3 m maxlength can be installed.

* Please consult us for more details.

At a vertical movement of 6 mm, the Optical NanoGauge

has variations below 0.1 nm, while a typical thickness

measuring device exhibits variations up to 8 nm.

During angular movement from 0 degrees to 5 degrees,

the Optical NanoGauge has variations 0.39 nm (0.047 %)

while a typical thickness measuring device exhibits variations up to 5 nm or more.

Incident angle

0 degrees

3 degrees

5 degrees

Optical NanoGauge

702.23 nm

702.29 nm

702.62 nm

Typical thickness measuring device

702.47 nm

703.70 nm

709.38 nm

10

8

6

4

2

0

-20 3 5

Variation amount (nm)

Incident angle (degrees)

Optical NanoGauge

Typical thickness measuring device

3

3

2

2

1

10-1

-1

-2

-2

-3

-3

Optical NanoGauge

Typical thickness measuring device

0

Variation amount (nm)

Amount of vertical movement (mm)

Position

-3 mm

-2 mm

-1 mm

Reference point

+1 mm

+2 mm

+3 mm

Optical NanoGauge

701.59 nm

701.63 nm

701.66 nm

701.65 nm

701.66 nm

701.67 nm

701.65 nm

Typical thickness measuring device

698.39 nm

699.92 nm

701.13 nm

702.37 nm

703.51 nm

704.74 nm

705.91 nm

Focus dependence versus reference point: ±3 mm (1 mm pitch), WD of reference point: 10 mm Angular dependence versus reference point: 0 degrees to 5 degrees, WD of reference point: 10 mm

Reflectivity measurementTransmission measurement Chromaticity

Both surface analysis

Transmittance measurementis available.

Stability for focus700 nm SiO2 film measurement example 700 nm SiO2 film measurement example

Stability for angular fluctuations

Page 4: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

4

C11665/C11011 C12562/C11295/C11627C12562/C11295/C11627C12562/C11295/C11627

Neighboring circuitmaking

Glass substrate production process (Electrostatic Capacitive touch panel)Touch panel

Semiconductor

Secondary battery

FPD

PV

Example applications

The Optical Gauge series can be used in each process in a variety of manufacturing settings.

A touch panel is the key factor in today's hottest digital products such as smart phones, tablets, digital cameras' liquid crystal displays, and advanced gaming systems. Although there are various detection schemes for touch panels, the resistive film manufacturing process is used here as an example to show how the Optical Gauge series is used in such a process.

The Optical Gauge series is used in the various manufacturing processes of semiconductor devices in which metal wiring is more multilayered, processes are increasingly miniaturized, and lower voltage is used. This contributes to improvement in the yield and shortens the time required to start a process.

The demand for secondary batteries, such as lithium ion, is rapidly increasing not only due to their use in personal computers and cell phones, but also with the development of electric vehicles and hybrid electric vehicles. The research and development of more efficient products are ongoing. The Optical Gauge series can be used in a wide range of processes in the manufacture of secondary batteries, contributing to promoting shorter tact time.

The Optical Gauge series can be used in a wide range of processes in the manufacture of FPD (flat-panel display) such as liquid crystal, LED, organic EL, VFD fluorescent display tube and plasma display.

Solar power generation is expanding continuously as a growing industry for the reduction of greenhouse gas emissions and other features. Also, many companies are engaging in research for improving the conversion efficiency of the solar cell or modules used in power generation. The Optical Gauge series can be used in a wide range of processes in the manufacture of solar cell or modules.

C11011C10178 C11011C10178 C11011C10178

C11011

C11665/C11011 C10323

C11665/C11011

C11665/C11011

Receiving substrate Etching

Wafer production process Pre-process

Ingot production Cut ingot Wafer polishing Wafer oxidizing

Rep

eat

Photoresistcoating Lithography Etching Ion implantation

Rep

eatSilicon

planarizationOxidizing,

Diffusion, Coating Cleaning

Electrode plateproduction

Crush/mixture

Electrode coil winding

Coating Roll press

Drying Drying

Slitter Separator

For NIR modelFor NIR modelFor NIR model

Array process

Glass substrate Coating Resist coating

EtchingCleaning

Inspection,Repair

Color filter substrateproduction process

Color filter process

Alignment filmcoating Rubbing

For transmission measurement model

Crystalline silicon PV production process

Silicon ingot Silicon slice Texture formation AR coat formation Electrode formation Heat sintering

Glass substrate Cleaning

CIGS PV production processMO

electrode formation PatterningCu-Ga filmformation

In filmformation

C12562/C11295/C11627

C12562/C11295/C11627C12562/C11295/C11627

C12562/C11295/C11627C12562/C11295/C11627

C12562/C11295/C11627

ITO Patterning Backside ITO Patterning

Page 5: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

5

C11665/C11011C12562/C11295/C11627

Flexible printed substrate

Production process

Film

Coating filmPlastic filmObject color

AR coating, PET, Coating layer, PE, PMMA Coating film, Evaporation film, Functionality film,Acrylic resin, Video head

Micro measurement

Patterned semiconductorPatterned FPDMEMS

Multipoint measurement

Simultaneous measurement in multiplechamber In-line, in-situ measurement of APC

FPD

Cell gap, Organic EL film, Alignment film, TFTITO, MgO, Resist film on glass substratePolyimide, High-functioning film and Color film for FPD

Film thickness and color measurementof flat panel

Semiconductor material

Film on a waferThin film

Metal-oxide coating such as SiO2, SiC, Si and TiO2

Nitride coating, Wet film, Resist coatingPolished silicon, Optical disk, DLC, Carbon

In-situ measurement

Process feed gas

Process exhaust gas

Film formationprocess

Film formation process monitorDry and wet etching measurement

Metal-oxide coating such as SiO2 and Si

C11011 C11665/C11011

C11665/C11011

Heat-sealing Bonding film

Inspection

Back end process

Electrodeformation

Waferinspection

Waferpolishing

Waferdicing

Stealth dicing

Wirebonding

Mold

Productinspection

Assembly process Inspection process

StackingDischargeand charge Sorting

Alignment filmcoating

Seal materialcoating

Cell process

Spacerspraying Bonding

LCimplantation

Sealing

Sealing

Bondingpolarizing plate

Module process

Mountbacklight

Dynamic operatinginspection

SealingMapping

measurement

Quality controlinspection Modularization

CIGS filmformation

CdS buffer layerformation Patterning

Transparentelectrode formation Patterning

Quality controlinspection

Metal-oxide coating such as TiO2

Film with fillerResist coating, Oxide film, Nitrogen film

Tester

C12562/C11295/C11627 C12562/C11295/C11627

C12562/C11295/C11627

C12562/C11295/C11627

Glass substrate production process

EtchingNeighboring circuit

making

Page 6: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

6

10 nm to 100 μm thin film high speed measurement

10 nm 100 μmSiO2

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

Feature

1

Feature

2

Feature

3

Feature

4

Feature

5

Feature

6

Feature

7

Feature

8

Feature

9

Specification

Precise measurement of fluctuating film

Analyze optical constants (n, k)

External control available

*1: When converted with the refractive index of SiO2 = 1.5*2: Standard deviation (tolerance) when measuring 400 nm thick SiO2 film*3: Depending on optical system or objective lens magnification to be used*4: Measurement guaranteed range listed in VLSI standard measurement warranty sheet*5: Continuous data acquisition time excludes analysis time

Type number*1

*2 *3

*3

*3

*5

*3 *4

Measurement film thickness

Repeatability

Accuracy

Light sourceMeasurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Power requirement

Power consumption

Fiber connector shape

C12562-0210 nm to 100 μm

0.02 nm

±0.4 %

Halogen

400 nm to 1100 nm

Approx. φ1 mm

10 mm

Max.10 layers

FFT analysis, Fitting analysis, Optical constant analysis

3 ms / point

RS-232C, Ethernet

AC 100 V to 240 V, 50 Hz/60 Hz

80 VA

FC

New model for wider thickness range and higher speed measurement

Ultrathin film measurementwith high speed

The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral interferometry. The Optical Gauge series is capable of measuring the thinnest 10 nm film. Capable of a wide range of film thickness measurements from 10 nm to 100 μm, it can accommodate a wide variety of objects. Moreover, high-speed measurement up to 100 Hz is possible, enabling measurement in fast-moving lines.

Capable of measuring 10 nm thin films

Shortening of cycle time (max. 100 Hz)

Enhanced external triggers(accommodates high-speed measurement)

Covers broad wavelength range (400 nm to 1100 nm)

Simplified measurement is added to the software

Capable of both surface analysis

NEW C12562������� ���� ��

10 nm to 100 μm thin film high speed measurement

Page 7: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

7

C12562 standard system (Sample stage)

150±1

75±1

53 (M

IN)

183+

30 (

MA

X)

52+

30 (

MA

X)

2 (M

IN)

27

10±1

8±1

130±1

280±1

Option

Configuration example

StandardOption

Optical NanoGaugeC12562

Optical NanoGaugeC12562

Sample stageA10192-04

Sample

Data analyzerM11698

Film thicknessmeasurement software

StandardOption

C12562 standard system (Mounted into customer's equipment)

Sample

RS-232C/Ethernet

Sample stage Light condenser optics

Data analyzerData analyzer M11698

(Unit: mm)Dimensional outline

Main unit (Approx. 7.3 kg)

Sample stage A10192-04

Manufacturing equipment (i.e., etching or film forming equipment)

A10192-04 (Lensless type)This stage accommodates samples up to φ200 mmin diameter. Light condenser not included.

This receptacle is a tool for setting a fiber probe in a mount.

A10192-05 (Visible light condenser lens type)This stage accommodates samples up to φ200 mmin diameter. It comes with a visible-light condenserlens with corrected chromatic aberration.WD: approx. 35 mmMeasurement spot diameter: φ1.5 mm

Macro optics A10191-03Visible light condenser lens for A10192-05

Two branch light guide

Data analyzer

1 set of a monitor, mouse, and keyboard.

FC receptacle A12187-02

This receptacle lamp unit for C12562.

Replacement lamp unit L12839-01

Analysis software for both surface.

Film thickness measurement software U12708-01

Optical NanoGauge C12562

USB2.0 LAN1 LAN2 MONITOR AUDIOUSB3.0

LIGHT

SENSOR

TRIG. IN

POWER

LINE

Optical NanoGauge C12562

USB2.0 LAN1 LAN2 MONITOR AUDIOUSB3.0

LIGHT

SENSOR

TRIG. IN

POWER

LINE

Optical NanoGauge C12562

USB2.0 LAN1 LAN2 MONITOR AUDIOUSB3.0

LIGHT

SENSOR

TRIG. IN

POWER

LINE

292±1 408±1

6±2

98.5

±1

Film thicknessmeasurement

software

D95P connector

SUS-acceptable light tube

5000+200-0

200+50-0

FC connector

φ10

φ12

φ20

Page 8: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

8

Theoretical wave pattern

Spectral reflection factor(measurable quantity)

Wavelength (nm)

Ref

lect

ivity

(%

)

400

20

40

60

80

500 600 700 800

Interference spectrum measurement of transparent electrode (ITO film: 350 nm)

The analyzed film thickness is the theoretical value, which is the least RMS (Root Mean Square) value of the theoretical wave pattern and measurement reflection pattern.

Spectral interferometry is used to measure film thickness.When light enters a thin film sample, multiple reflections occur inside the thin film. These multiple-reflection light waves boost or weaken each other along with their phase difference. The phase difference of each multiple-reflection light is determined by the light wavelength and optical path length (= distance that light moves back and forth in the thin film multiplied by the film refractive index).

This phase difference allows the spectrum reflected from or transmitted through the sample to produce a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum. The Optical NanoGauge utilizes spectral interferometry to analyze a target spectrum by the curve-fitting or FFT (Fast Fourier Transform) method that matches your application.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

The number of signals is increased as the film thickness becomes thick. The signal intervals in short wavelength range appears more often than those in the long wavelength range.

Analysis by curve fitting For measuring less than1 μm film thickness

Analysis by FFT (Fast Fourier Transform) For measuring more than 1 μm film thickness

Fourier transform

Measurement of etalon (30 μm)

Ref

lect

ivity

(%

)

500

12.5

17.5

22.5

15

20

25

600 700 800 900 1000

Wavelength (nm)

4.00

2.00

6.00

0.1 1.0 10 100

0.00

Inte

nsity

Optical film thickness (μm)

30 μm

Principle

Page 9: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

9

Both surface analysis

Film thickness

150 nm (n=2.0)

100 nm (n=1.5)

1000 nm (n=1.5)

150 nm1100 nm2

1000 nm3 1120.00 nm3

Film thicknessanalysis result

143.69 nm1119.25 nm2

Film thicknessanalysis result

Both side analysis Standard measurement

Ref

lect

ivity

400 600 800 1000Wavelength (nm)

Ref

lect

ivity

400 600 800 1000Wavelength (nm)

Ref

lect

ivity

400 600 800 1000Wavelength (nm)

Ref

lect

ivity

400 600 800 1000Wavelength (nm)

150 nm1100 nm2

1100 nm3 960.00 nm3

Film thicknessanalysis result

147.28 nm1120.06 nm2

Film thicknessanalysis result

Both surface analysis for both-side-coated samplesIn some cases, a coating film is applied to the back side of thin film samples. If such both-side-coated samples are measured by an ordinary method, the fitting cannot be consistent as the effect of the film on the back side is not taken into account, and therefore accurate values cannot be obtained. In addition, if the thickness of the film on the back side changes, the system cannot follow the change during the measurement and this may largely affect measured values.

Since the Optical Gauge is equipped with the both surface analysis function as an option, which makes it possible to measure both-side-coated samples accurately measurement of both-side-coated samples.

100 μm (n=1.7)Board

1

2

3

Both-side-coated samples

Coating film on the surface: first layer

Coating film on the surface: second layer

Coating film on the bottom surface

Thickness of coating film not only on the surface but also on the back side is measured with high accuracy.

Errors in measured values are large.

*This is the result of a simulation using an analysis model.

When the thickness of the coating filmon the back side is increased by 100 nm

Thickness is measured with high accuracy, even back side film thickness is changed.

Measurement errors are large, and the values are inaccurate as changes in the coating film on the back side cannot be followed.

*This is the result of a simulation using an analysis model.

Measurable wave pattern (simulation)Theoretical wave pattern

The analysis is performed using the film thickness measurement software U12708-01.

NEW

NEW

Page 10: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

10

20 nm 50 μmSiO2

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

Feature

1

Feature

2

Feature

3

Feature

4

Feature

5

Feature

6

Feature

7

������� ���� ��C10178

Highly accurate and real time measurement of thin filmfrom 20 nm to 50 μm thickness

High speed and high accuracy

Real time measurement

Mapping function

Precise measurement of fluctuating film

Analyze optical constants (n, k)

External control available

Specification

*1: When converted with the refractive index of SiO2 = 1.5*2: Standard deviation (tolerance) when measuring 400 nm thick SiO2 film*3: Depending on optical system or objective lens magnification to be used*4: Measurement guaranteed range listed in VLSI standard measurement warranty sheet*5: Continuous data acquisition time excludes analysis time

C10178-01Type number C10178-03 (NIR model)

20 nm to 50 μm

0.01 nm

400 nm to 1100 nm

250 VA

150 nm to 50 μm

0.05 nm

900 nm to 1650 nm

230 VA

*1

*2 *3

*3

*3

*5

*3 *4

Measurement film thickness

Repeatability

Accuracy

Light sourceMeasurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Interface

Power requirement

Power consumption

Fiber connector shape

±0.4 %

Halogen

Approx. φ1 mm

10 mm

Max.10 layers

FFT analysis, Fitting analysis, Optical constant analysis

19 ms / point

RS-232C, Inter-software data transfer by PIPE or Ethernet

USB 2.0

AC100 V to 120 V / AC200 V to 240 V, 50 Hz / 60 Hz

φ12 sleeve shape

Extensibility model forresearch laboratory

Versatile standard type for basic research

The Optical NanoGauge Film Thickness C10178 is a non-contact film thickness measurement system utilizing spectral interferometry. Film thickness is measured quickly with high sensitivity and high accuracy through spectral interferometry. As our photonic multichannel analyzer (PMA) is used as the detector, a variety of measurement items such as quantum yield, reflectance, transmittance and absorption can also be measured simultaneously while measuring film thickness of various optical filters, coating, etc.

Quantum yield, reflectance, transmittanceand absorption can be measured withspecific accessories.

Highly accurate and real time measurement of thin filmfrom 20 nm to 50 μm thickness

Spectral interferometry is used to measure film thickness.When light enters a thin film sample, the sample produces a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

Page 11: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

11

0.05

Configuration example

C10178 standard system

Option

StandardOption

StandardOption

C10178 mapping system for measuring thickness distribution

Mapping stage C8126-31, -32Measurement time: 2 s/point

Stage movement resolution: 0.1 mmStage movement repeatability: ±0.01 mm

Measurement area: to 140 mm square (C8126-31) (4 inch to 8 inch wafer) : to 200 mm square (C8126-32) (4 inch to 12 inch wafer)

Macro optics A10191-01

Light condenser optics

LED light source

Data analyzer

Sample stageLED light source L11693

(Unit: mm)Dimensional outline

Photonic Multichannel Analyzer (Approx. 5 kg) Halogen light source (Approx.2.6 kg)

Two branch light guide

Film thicknessmeasurement software

SIGNAL INPUT

PHOTONIC MULTI-CHANNEL ANALYZER C10027C10027

Halogen light sourceL6758-11

Data analyzer C10471-01

Photonic Multichannel Analyzer

Sample

Sample stageA10192-01

SIGNAL INPUT

PHOTONIC MULTI-CHANNEL ANALYZER C10027C10027

Mapping stageC8126-31,-32

Data analyzerC9025-11

Photonic Multichannel Analyzer

USB 2.0 / RS-232C

Film thicknessmeasurement software

Halogen light sourceL6758-11

Visible light condenser lens for A10192-02

Macro optics A10191-02IR condenser lens for A10192-03.

A10192-01 (Lensless type)This stage accommodates samples up to φ200 mmin diameter. Light condenser not included.

A10192-02 (Visible light condenser lens type)This stage accommodates samples up to φ200 mmin diameter. It comes with a visible-light condenserlens with corrected chromatic aberration. (For C10178-01)WD: approx. 35 mm, Measurement spot diameter: φ1.5 mm

A10192-03 (IR condenser lens type)This stage accommodates samples up to φ200 mmin diameter. It comes with a condenser lens coveringthe UV to near infrared light range. (For C10178-03)WD: approx. 35 mm, Measurement spot diameter: φ1.5 mm

Wavelength: 420 nm to 720 nm

Data analyzer C10471-01Laptop type data analyzer is available as an option.

Data analyzer C9025-11A desktop data analysis device for mappingmeasured result is available.

L6758-11

A10193-02

80±0.2

φ12

0 -0.0

5

2000+100 0 300+100

0

φ9.

2

50±0.2

50±0.2

*Please refer to page 7 the dimensional outline of sample stage A10192.

C10027-02 (Extensibility model for research laboratory)

383±2

9.7±

0.5

PHOTONIC MULTI-CHANNEL ANALYZER

SIGNAL INPUT

C10027

99±1

262±1

124±

1

C10028-01 (NIR model)PHOTONIC MULTI-CHANNEL ANALYZER

SIGNAL INPUT

C10028

262±1 433±2

9.7±

0.5

2085

57.5

15

8013

0

115 231

188

0.05

φ18

±0.2

φ7

0 -0.1

φ10

0.05

0.05

0.05

0 -0.1

φ10

50±0.2

Page 12: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

12

Specification

���� ��� ��� �� �������� C11627

*1: When converted with the refractive index of SiO2 = 1.5*2: Standard deviation (tolerance) when measuring 400 nm thick SiO2 film*3: Depending on optical system or objective lens magnification to be used*4: Measurement guaranteed range listed in VLSI standard measurement warranty sheet*5: Continuous data acquisition time excludes analysis time

Type number*1

*2 *3

*3

*3

*5

*3 *4

Measurement film thickness

Repeatability

Accuracy

Light source

Measurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Power requirement

Power consumption

Fiber connector shape

C11627-01

Integrates a light source, spectrometer and data analyzer into a compact box,ideal for mounting in customer's equipment

The Optical NanoGauge C11627 is a non-contact film thickness measurement system utilizing spectral interferometry. With the integration of the light source, a spectrometer and a data analysis unit in one unit, the C11627 offers a compact configuration consisting solely of the main unit and optical fiber. Designed for compactness and space savings under the assumption that it will be built into the customer's system, the C11627 can accommodate a wide variety of objects of measurement. Furthermore, because it is reference-free, the C11627 eliminates the need for cumbersome reference measurement and can perform high-speed and high-accuracy measurement for long hours in a stable manner.

20 nm 50 μmSiO2

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

Highly accurate and real time measurement of thin filmfrom 20 nm to 50 μm thickness

Highly accurate and real time measurement of thin filmfrom 20 nm to 50 μm thickness

Feature

1

Feature

2

Feature

3

Feature

4Reference-free operation

Compact and space-saving

High speed and high accuracy

Feature

5

Feature

6

Precise measurement of fluctuating film

Analyze optical constants (n, k)

External control available

20 nm to 50 μm

0.02 nm

±0.4 %

LED

420 nm to 720 nm

Approx. φ1 mm

10 mm

Max.10 layers

FFT analysis, Fitting analysis, Optical constant analysis

19 ms / point

RS-232C / Ethernet

AC 100 V to 240 V, 50 Hz/60 Hz

70 VA

FC

Embedded modelin 1Box unit

Spectral interferometry is used to measure film thickness. When light enters a thin film sample, the sample produces a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

Page 13: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

13

C11627 standard system (Sample stage)

Option

Configuration example

StandardOption

Optical NanoGaugeC11627-01

Optical NanoGaugeC11627-01

Sample stageA10192-04

Sample

Data analyzerM11698

Film thicknessmeasurement software

StandardOption

C11627 standard system (Mounted into customer's equipment)

Sample

RS-232C/Ethernet

(Unit: mm)Dimensional outline

Main unit (Approx. 6 kg) Light guide

Macro optics A10191-03

Light condenser opticsSample stage

Visible light condenser lens for A10192-05 A10192-04 (Lensless type)This stage accommodates samples up to φ200 mmin diameter. Light condenser not included.

A10192-05 (Visible light condenser lens type)This stage accommodates samples up to φ200 mmin diameter. It comes with a visible-light condenserlens with corrected chromatic aberration.WD: approx. 35 mmMeasurement spot diameter: φ1.5 mm

Manufacturing equipment (i.e., etching or film forming equipment)

OPTICAL NANO GAUGE

COM LAN USB

LINE

FIBERPROBE

PS2 MONITORPOWER

C11627

OPTICAL NANO GAUGE

COM LAN USB

LINE

FIBERPROBE

PS2 MONITORPOWER

C11627

Data analyzerData analyzer M116981 set of a monitor, mouse, and keyboard.

Data analyzer

*Please refer to page 7 for the dimensional outline of sample stage A10192.

This receptacle is a tool for setting a fiber probe in a mount.

FC receptacle A12187-02

292±1

OPTICAL NANO GAUGE C11627

COM LAN PS2 MONITOR USB

LINE

POWERFIBERPROBE

333±1

6±2

98.5

±1

FC connector SUS-acceptable light tube φ7 FC connector

36 φ10

φ10 36

5000+200 0

Film thicknessmeasurement

software

Page 14: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

14

Enables simultaneous measurements in multiple chambers in thin filmproduction lines and multipoint measurements in film production lines

20 nm 100 μmSiO2

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

Feature

1

Feature

2

Feature

3

Feature

4

Feature

5

Feature

6

Feature

7

Feature

8

Feature

9

Feature

10

���������� ������ � C11295

Simultaneous film thickness measurementup to 15 points

Reference-free operation

Stable long-term measurement bycorrection of light intensity fluctuation

Alarm and warning function (pass/fail)

Reflectance (transmittance) andspectrum measurements

High speed and high accuracy

Real time measurement

Precise measurement of fluctuating film

Analyze optical constants (n, k)

External control availableSpecification

Multipoint measurement model for real time simultaneous measurements

*1: Model number suffix "-XX" indicates number of measurement points. *2: When converted with the refractive index of SiO2 = 1.5*3: Standard deviation (tolerance) when measuring 400 nm thick SiO2 film*4: Depending on optical system or objective lens magnification to be used*5: Measurement guaranteed range listed in VLSI standard measurement warranty sheet*6: Halogen light source model is C11295-XXH.*7: Continuous data acquisition time excludes analysis time

Type number *1C11295-XX

*3 *4

*2

*6

*4

*4

*7

*4 *5

Measurement film thickness

Repeatability

Accuracy

Light source

Measurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Interface

Power requirement

Power consumption

Fiber connector shape

Number of measurement points

20 nm to 100 μm

0.02 nm

±0.4 %

Xenon

320 nm to 1000 nm

Approx. φ1 mm

10 mm

Max.10 layers

FFT analysis, Fitting analysis

19 ms / point

Ethernet

USB 2.0 (Main unit - Computer)

RS-232C (Light source - Computer)

AC 100 V to 240 V, 50 Hz/60 Hz

Approx. 330 VA (2 ch) to Approx. 450 VA (15 ch)

SMA

2 to 15

Multipointmeasurement

Enables simultaneous measurements in multiple chambers in thin filmproduction lines and multipoint measurements in film production lines

The Multipoint NanoGauge Film Thickness C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. The C11295 performs real time multipoint measurements, and enabled simultaneous measurements in multiple chambers and multipoint measurement on the surface of a film. The C11295 can also measure the reflectance (transmittance), the color of the object, and the temporal change simultaneously with film thickness measurement.

Spectral interferometry is used to measure film thickness. When light enters a thin film sample, the sample produces a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

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15

Configuration example

C11295-03 standard system

Option

StandardOption

(Unit: mm)Dimensional outline

Data analyzerData analyzer C10471-21Laptop type data analyzer is available as an option.

Film thickness monitor Color monitor

Measuring data

Measurement value trend data

Alarm and warning can be set to appear during monitoring

Warningscreen

Monitor screen

Multipoint NanoGauge

Simultaneous measurement

Analyzer

Lightsource Fiber branching method

Light source

Analyzer

Bifurcated fiber

Multibranchingfiber

Measurement time difference occurs

Multidetector method

Concept view comparing multidetector and fiber branch method

Multipoint measurement method

Measurement screen

Multichannel analyzer

* Available using halogen light model.

POWER

Light source*

Film thicknessmeasurement software

SampleData analyzer C10471-21

Typical thickness measuring device

Measurement mode selectionfilm thickness / reflectance / transmittance

Main unit (Approx. 6 kg)

Light source (Approx. 6.4 kg)

Light source light guide

This receptacle is a tool for setting a fiber probe in a mount.

SMA receptacle A12187-01

442 308

123.

5

39.539.5 232

12.736

16 16110142

158

227

5

311

Measurement light guide 30

420.3

φ6

(50.3) 500 +30 0 50

φ4.8

φ8

SMA connector30

φ26 0 -0

.1

φ15

-0.0

2-0

.10

1000+50 0

φ4.8

φ20

SMA connectorSMA connector1000+100

0 10 000 +200 0100

φ4.8

Page 16: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

16

Highly accurate and real time measurement of thin filmin micro field of view through microscope

Highly accurate and real time measurement of thin filmin micro field of view through microscope

Feature

1

Feature

2

Thickness measurement in micro fieldof view

High speed and high accuracy

Specification

���������� ��� �� ���� ����� C10323/C11623

*1: SiO2 film measurement features*2: Si film measurement features*3: Standard deviation (tolerance) when measuring 400 nm thick SiO2 film*4: Standard deviation when a 6 μm thick silicon film was measured*5: Measurement guaranteed range listed in VLSI standard measurement warranty sheet*6: Depending on optical system or objective lens magnification to be used

Type number C10323-01 C11623-21

Microscopic type for measuring thin film in small area

The Optical Gauge C10323 and C11623 are a microscopic thickness measurement systems. Objects with irregular surfaces that would produce high level of scattered light cannot be measured at the macro level. For these types of objects, measuring a small area reduces scattered light making measurement possible.

20 nm 50 μmSiO2

0.5 μm 700 μmSiO2

0.5 μm 300 μmSi

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

Feature

3

Feature

4

Analyze optical constants (n, k)

External control available

C11623

C10323

*1

*2

*6

*5 *6

Repeatability

Accuracy

Light source

Measurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

External control function (Option)

Interface

Power requirement

Power consumption

Measurementfilm thickness

Refractive index of glass: 1.5

Refractive index of silicon: 3.67

±0.4 %

Halogen

φ8 μm to φ80 μm

Refer to objective lens list

Max.10 layers

FFT analysis, Fitting analysis, Optical constant analysis

RS-232C / Inter-software data transfer by PIPE / Ethernet

USB 2.0

AC100 V to 120 V / AC200 V to 240 V, 50 Hz / 60 Hz

330 VA

20 nm to 50 μm

-

0.02 nm

400 nm to 1100 nm

*3

0.5 μm to 700 μm

0.5 μm to 300 μm

0.1 nm

940 nm to 1000 nm

*4

Microscope typeMicroGauge

Microscope typeNanoGauge

Spectral interferometry is used to measure film thickness. When light enters a thin film sample, the sample produces a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

Page 17: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

17

C10323-01 microscope system

Option

StandardOption

(Unit: mm)Dimensional outline

POWER

SIGNAL INPUT

PMA-11PHOTONIC MULTI-CHANNEL ANALYZER

Monitor Photonic Multichannel AnalyzerC10027-02

Halogenlight sourceL6758-11

Film thicknessmeasurement software

Data analyzerC10471-01

Sample stageA10407-01

Objective lens5× to 50×

Objective lens

Data analyzerData analyzer C10471-01Laptop type data analyzer is available as an option.

Lens

5×10×20×50×

Measurement spot size

φ80 μm

φ40 μm

φ20 μm

φ8 μm

NA

0.14

0.26

0.40

0.42

Working distance

37.5 mm

30.5 mm

20.0 mm

17.0 mm

Microscopicobjective lens

Macro measurement Micro measurementwith microscope

Samples which are difficult to measure with the conventional macro system, such as a wafer with irregular patterns and MEMS, can be measured with a microscopic system. Samples with irregular surfaces may not be able to be measured at the macro level due to high level of scattered light. In the micro measurement with a microscopic system, the measurement point can be narrowed down to a flat area with little scattered light, that makes measurement possible.

Principle and advantages of microscopic system

Scattered light

Scattered light

Scattered light

A10407-01 (Stage moving area: 75 mm × 50 mm)

A10407-02 (Stage moving area: 150 mm × 150 mm)

Sample stage

Microscope unit (Approx. 15 kg)

Sample stage for A10406 (Option)

111 17

4

205

317

129

4540

174

186

φ34

A10407-01

134 13

4

84

181227

140.5

25.5 φ34

A10407-02

Configuration example

Photonic Multichannel Analyzer (Approx. 5 kg) Halogen light source (Approx.2.6 kg)L6758-11

2085

57.5

15

8013

0

115 231

188

40

341

262 167 114 68

617

A10406-01

C10027-02

383±2

9.7±

0.5

PHOTONIC MULTI-CHANNEL ANALYZER

SIGNAL INPUT

C10027

99±1

262±1

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18

Specification

���� ��� ��� �� �� ������ C11665An integrated built-in system capable of handling a wide variety of objects,including thin films and substrates

The Optical Microgauge C11665 is non-contact film thickness measurement and is designed compact of integrating a light source, a detector and a data analysis unit in 1 box.In the semiconductor industry, the widespread use of TSV technology is making substrate thickness measurement a critical area, while the semiconductor film industry is making the bonding layers ever thinner. Advances in these fields now require high accuracy film thickness measurement in the 1 μm to 300 μm range. The C11665 works well on various types of materials from silicon substrates to thin films and easily measures thicknesses in 0.5 μm to 700 μm range often used by semiconductor and film manufacturers.

1 μm 10 μm 100 μm 1 mm100 nm

Measurablerange

One unit measures a wide range of materials from thin filmto silicon substrate in thickness from 0.5 μm to 700 μm

Feature

1

Feature

2

Feature

3

Feature

4

Reference-free operation

Compact and space-saving

High speed and high accuracy

Precise measurement of fluctuating film

Feature

5

Feature

6

Analyze optical constants (n, k)

External control available

One unit measures a wide range of materials from thin filmto silicon substrate in thickness from 0.5 μm to 700 μm

0.5 μm 700 μmSiO2

0.5 μm 300 μmSi

*1: SiO2 film measurement features*2: Si film measurement features*3: Standard deviation when a 6 μm thick silicon film was measured*4: Depending on optical system or objective lens magnification to be used*5: At the time of the etalon measurement*6: Continuous data acquisition time excludes analysis time

Type number C11665-01*1

*2

*4

*4

*6

*4 *5

*3 *4

Measurement filmthickness

Refractive index of glass: 1.5

Refractive index of silicon: 3.67

Repeatability

Accuracy

Light source

Measurement wavelength

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Power requirement

Power consumption

Fiber connector shape

0.5 μm to 700 μm

0.5 μm to 300 μm

0.1 nm

±1 %

LED

940 nm to 1000 nm

Approx. φ1 mm

5 mm

Max.10 layers

FFT analysis, Fitting analysis, Optical constant analysis

19 ms/point

RS-232C / Ethernet

AC 100 V to 240 V, 50 Hz/60 Hz

85 VA

FC

Embedded modelin 1Box unit

Spectral interferometry is used to measure film thickness. When light enters a thin film sample, the sample produces a unique spectrum that depends on the film thickness. Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum.

Incident lightPhase

difference

Reflected light

Film

Substrate

Intensity

Intensity

Intensity

Number of signal interval increased.

Wavelength

Wavelength

Wavelength

Thin film

Thick film

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19

Spectral reflection factor(measurable quantity) Theoretical wave pattern

Interference spectrum measurement of resist film

Analysis by curve fitting For measuring less than 10 μm film thickness

Analysis by FFT (Fast Fourier Transform) For measuring more than 10 μm film thickness

Measurement of etalon (300 μm)

The analyzed film thickness is the theoretical value, which is the least RMS (Root Mean Square) value of the theoretical wave pattern and measurement reflection pattern.

300 μmFourier transform

C11665 standard system (Sample stage)

Option

Configuration example

StandardOption

Optical NanoGaugeC11665-01

Sample stageA10192-04

Sample

Data analyzerM11698

Film thicknessmeasurement software

StandardOption

C11665 standard system (Mounted into customer's equipment)

Sample

RS-232C/Ethernet

(Unit: mm)Dimensional outline

Sample stageA10192-04 (Lensless type)This stage accommodates samples up to φ200 mmin diameter. Light condenser not included.

OPTICAL NANO GAUGE

COM LAN USB

LINE

FIBERPROBE

PS2 MONITORPOWER

C11665

Manufacturing equipment (i.e., etching or film forming equipment)

OPTICAL NANO GAUGE

COM LAN USB

LINE

FIBERPROBE

PS2 MONITORPOWER

C11665

Data analyzerData analyzer M11698

Main unit (Approx. 7.2 kg)

292±1

OPTICAL MICRO GAUGE C11665

COM LAN PS2 MONITOR USB

LINE

POWERFIBERPROBE

408±1

6±2

98.5

±1

Optical NanoGaugeC11665-01

1 set of a monitor, mouse, and keyboard.

This receptacle is a tool for setting a fiber probe in a mount.

*Please refer to page 7 the dimensional outline of sample stage A10192.

FC receptacle A12187-02

Data analyzer

Film thicknessmeasurement software

Analysis method

Light guideFC connector SUS-acceptable light tube φ7 FC connector

36 φ10

φ10 36

5000+200 0

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20

25 μm to 2200 μm

10 μm to 900 μm

16.7 ms/point

25 μm to 2900 μm

10 μm to 1200 μm

22.2 ms/point

High speed measurement of film, glass and waferHigh speed measurement of film, glass and wafer

Specification

������� ����� �� C11011

The Optical MicroGauge C11011 series is a film thickness measurement system utilizing laser interferometry. High speed measurement at 60 Hz, applicable to in-line measurement in production. In addition, an optional mapping system can measure the thickness distribution of a given specimen. The C11011 can be used in a wide range of applications, such as product manufacture process monitoring or quality control.

Measurablerange

25 μm 2200 μm 2900 μmSiO2

10 μm 900 μm 1200 μm

*1: SiO2 film measurement features*2: Si film measurement features*3: Standard deviation when a 6 μm thick silicon film was measured*4: Optional model with 1,000 mm working distance is available. (C11011-01WL)*5: During continuous data acquisition but excludes analysis time

Type number C11011-01WC11011-01*1

*2

*4

*4

*3

*3

*5

Repeatability

Accuracy

Light source

Spot size

Working distance

Number of measurable layers

Analysis

Measurement time

External control function

Interface

Power requirement

Power consumption

Measurement filmthickness

Refractive index of glass: 1.5

Refractive index of silicon: 3.67

1 μm 10 μm 100 μm 1 mm

Feature

1

Feature

2

Feature

3

Measurement of non-transparent (white color)sample by infrared photometry

High speed measurement at 60 Hz

Measurement of pattern-formed wafer orwafer with protective film

Feature

4

Feature

5

Feature

6

Long working distance

Mapping function

External control available

High speed measurement model compatible with in-line systems, capable of measuring up to 2.9 mm

Thick film measurementwith high speed

WaferSi for PV panel

Wafer

Semiconductor

SiC coat, Si coat, Wet coat, Polished Si, Optical disk

Optical film

Film

AR coating, PET, Coating layer, Coating film, Evaporation film, Functionality filmAcrylic resin, Video head

Panel

FPD

Cell gap, Glass thickness, DLC, High-function film

100 nm

< 500 μm : ±0.5 μm, 500 μm : ±0.1 %

Infrared LD (1300 nm)

φ 60 μm

155 mm

One layer (Multilayer measurements are possible.)

Peak detection

RS-232C / PIPE

USB 2.0

AC 100 V to AC 240 V, 50 Hz/60 Hz

50 VA

Si

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21

C11011-01, -01W standard system

Configuration example

StandardOption

StandardOption

C11011-01, -01W mapping system for measuring thickness distribution

(Unit: mm)Dimensional outline

Main unit (Approx. 8.5 kg) Probe head: A8653-01, -02

Thickness distributionof a wafer

Measurement of bonded wafer(multilayer)

In-situ monitoring of thickness (during wet etching)Use laser interferometry to measure film thickness.

Optical fiber

Probe headA8653-01

Etcher or Grinder

Sample

RS-232C / PIPE

Optical MicroGaugeC11011-01, -01W

USB 2.0

Data analyzerC9025-02

Wafer mapping software

Optical fiber

Optical MicroGaugeC11011-01, -01W

Wafer mapping software

Mapping stageC8126-021,-22

USB 2.0 / RS-232C Data analyzer

C9025-11

USB 2.0

The probe head irradiates sample with near infrared light which reflects back from the film front surface. Some of the light transmits through the film and reflects back from the boundary on the opposite side. The controller internally processes each reflected light to detect the position where light was reflected or in other words the position on the film boundary. The controller then calculates the film thickness from the distance between the detected peaks.

Probe head

Distance between the

peaks indicates film

thickness

Reflected light from the boundary

Incident light

Film

SubstrateDisplay from 70 μm to 76 μmSample: 8-inch Si bare wafer (Protective film / after grinding process)

Principle

Option

Data analyzer

Data analyzer C9025-01, -11[Desktop]For the standard system: C9025-01For the mapping system: C9025-11

Data analyzer C9025-02, -12[Laptop]For the standard system: C9025-02For the mapping system: C9025-12

Probe head A8653-02This probe head is surface-treated to make itacid-resistant and is recommended for use whilemounted in wet etching equipment.

Horizontal setting optics A9925-01This optical system is designed to connect tothe probe head and is useful when installing theprobe head in narrow locations with little workingdistance.

Analysis method

Measurement data

500

200

200

400

400100 3000

300

100

Time (second)

Thic

knes

s (μ

m)

0

Thickness measurement data

412±1

123.

5±1

5.9±

1383±1

OPTICAL MICRO GAUGE C11011

POWER

φ19±

0.3

WD=155±0.2 95.8±0.2

φ15±

0.3

13.9 Optical fiber (4 m)

φ34±

0.5

OPTICAL MICRO GAUGE C11011

Power

Probe headA8653-01

Mapping stage C8126-21, -22Measurement time: 2 s/point

Stage movement resolution: 0.1 mmStage movement repeatability: ±0.01 mm

Measurement area: to 140 mm square (C8126-21) (4 inch to 8 inch wafer) : to 200 mm square (C8126-22) (4 inch to 12 inch wafer)

Page 22: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

22

Specification

������

����� ��� C8126

Type number0.1 mm

±0.01 mm

AC100 V to AC117 V, AC200 V to AC240 V , 50 Hz/60 Hz

C8126-22, -32: 170 VA

12 inch Stage unit for C8126-22, -32: 940 mm(W) × 595 mm(H) × 750 mm(D) Approx. 82 kg

Mapping thickness distribution of wafer and thin film Compatible with Optical NanoGauge or Optical MicroGauge

The Mapping Stage C8126 series is a mapping system that performs wafer and film in-plane thickness distribution measurement when combined with any one of the various Optical Gauge series. The C8126 can be used for examination of in-plane uniformity of etching and grinding property and for quality control purpose.

Type numberWafer (inch) Film (mm)

C11011-01C11011-01W

C10178-01C10178-03

4 to 8

4 to 12

4 to 8

4 to 12

< 140 × 140

< 200 × 200

< 140 × 140

< 200 × 200

Measurable range

C8126-21

C8126-22

C8126-31

C8126-32*For more details of the specification, please contact us.

*For more details of the specification, please contact us.*1: Either 100 V system or 200 V system can be selected.*2: For C8126-21, -31 details of the specification, please contact us. *3: For C8126-21, -31 details of the specification, please contact us.

Compatible withNanoGauge / MicroGauge

Feature

1

Feature

2

Feature

3

Thickness distribution measurement

Mapping thickness distribution of pattern-formed wafer

Mapping thickness distribution of pattern-formed wafer with protective film

C8126-21, -22 (For C11011 series)

StandardOption

StandardOption

C8126-31, -32 (For C10178 series)

Optical fiber

Stage unit

Optical MicroGauge C11011-01,-01W

USB 2.0

Probe headA8653-01

Wafer

Wafer mapping software

Data analyzerInterface

(USB 2.0 / RS-232C)

Stage movement resolution

Stage movement repeatability

Power requirement

Power consumption

Dimensional outline / Weight

C8126-21, -22, -31, -32

*1

Optical NanoGauge C10178-01, -03

Film thicknessmeasurement software

USB 2.0

Data analyzer

Interface(USB 2.0 / RS-232C)

Stage unit

Halogen light sourceL6758-11

SIGNAL INPUT

PHOTONIC MULTI-CHANNEL ANALYZER C10027

Power

*2

*3

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23

StandardOption

200 nm to 950 nm

± 0.75 nm

< 2 nm

Approx. 70 VA

300 nm to 800 nm

±1.0 nm

< 3 nm

Approx. 50 VA

Type number C10346-02C10346-01

Detect in-process plasma light emission over a wide spectrum range in real time during etching, PVD and CVD

The C10346 is a monitoring system that detects wide spectrum plasma emission during the process of etching, PVD and CVD in semiconductor manufacturing.With its various analysis functions, it can be used for setting up end-point detection conditions and automatic detection of etching and cleaning, estimation of plasma species and monitoring (plasma) contamination and abnormal discharges.

Feature

1

Feature

2

Feature

3

Simultaneous measurement of widespectrum

Real time plasma (emission) measurement

Easy measurement using optical fiber

C10346 standard system

USB 2.0Optical

fiber probe

Multiband plasma-process monitorC10346-01, -02

Data acquisition softwareU9046

Data analyzer

Wavelength range

Wavelength accuracy

Wavelength resolution (FWHM)

Power requirement

Power consumption

Analog output terminal

Fiber probe

Interface

Digital output terminal(Determinate signal output)

Digital output terminal(Busy signal)

Digital input terminal (Starting measurement trigger signal)

AC 100 V to AC 240 V, 50 Hz / 60 Hz

2 channel, 0 V to 10 V

SMA

USB 2.0 Type B

TTL maximum 5 channel

TTL 1 channelUsing TTL 4 channel

TTL 1 channelUsing TTL 5 channel

Benefits

Easy parameter evaluation to detect etchingand cleaning endpointOptimal condition (or trigger) used for defining endpoint can beset for individual process by analyzing and simulating the timingat which etching and cleaning end.

Automatic detection of etching and cleaningendpointBoosts the process throughput and reduces device damage byautomatically detecting the endpoint for each ware by utilizingendpoint detection condition optimized for each process.

Estimation of plasma species during processPlasma spectrum library allows estimation of plasma speciesin a process.

������� �����

�������� ������ � ����� ��� C10346-01, -02

SIGNAL INPUT

C10346PLASMA PROCESS MONITOR

Page 24: Optical Gauge Series€¦ · Ultrathin film measurement with high speed The Optical NanoGauge Film Thickness C12562 is a non-contact film thickness measurement system utilizing spectral

★ Product and software package names noted in this documentation are trademarks or registered trademarks of their respective manufacturers.● Subject to local technical requirements and regulations, availability of products included in this promotional material may vary. Please consult your local sales representative.● Information furnished by HAMAMATSU is believed to be reliable. However, no responsibility is assumed for possible inaccuracies or omissions. Specifications and external

appearance are subject to change without notice.

© 2014 Hamamatsu Photonics K.K.

Cat. No. SSMS0043E05MAR/2014 HPKCreated in Japan

www.hamamatsu.comHAMAMATSU PHOTONICS K.K.HAMAMATSU PHOTONICS K.K., Systems Division812 Joko-cho, Higashi-ku, Hamamatsu City, 431-3196, Japan, Telephone: (81)53-431-0124, Fax: (81)53-435-1574, E-mail: [email protected].: Hamamatsu Corporation: 360 Foothill Road, Bridgewater. N.J. 08807-0910, U.S.A., Telephone: (1)908-231-0960, Fax: (1)908-231-1218 E-mail: [email protected]: Hamamatsu Photonics Deutschland GmbH: Arzbergerstr. 10, D-82211 Herrsching am Ammersee, Germany, Telephone: (49)8152-375-0, Fax: (49)8152-2658 E-mail: [email protected]: Hamamatsu Photonics France S.A.R.L.: 19, Rue du Saule Trapu, Parc du Moulin de Massy, 91882 Massy Cedex, France, Telephone: (33)1 69 53 71 00, Fax: (33)1 69 53 71 10 E-mail: [email protected] Kingdom: Hamamatsu Photonics UK Limited: 2 Howard Court, 10 Tewin Road, Welwyn Garden City, Hertfordshire AL7 1BW, United Kingdom, Telephone: (44)1707-294888, Fax: (44)1707-325777 E-mail: [email protected] Europe: Hamamatsu Photonics Norden AB: Torshamnsgatan 35 SE-164 40 Kista, Sweden, Telephone: (46)8-509-031-00, Fax: (46)8-509-031-01 E-mail: [email protected]: Hamamatsu Photonics Italia S.r.l.: Strada della Moia, 1 int. 6, 20020 Arese (Milano), Italy, Telephone: (39)02-93581733, Fax: (39)02-93581741 E-mail: [email protected]: Hamamatsu Photonics (China) Co., Ltd.: B1201 Jiaming Center, No.27 Dongsanhuan Beilu, Chaoyang District, Beijing 100020, China, Telephone: (86)10-6586-6006, Fax: (86)10-6586-2866 E-mail: [email protected]