Use of MicrobeamUse of Microbeamat JAEA Takasaki at JAEA Takasaki

Mitsuhiro FUKUDAResearch Center for Nuclear Physics(RCNP)

Osaka University

APAC2007 THZH102

AuthorsAuthorsTakasaki Advanced Radiation Research InstituteJapan Atomic Energy Agency

Tomihiro Kamiya, Masakazu Oikawa, Takahiro Satoh, Takuro Sakai, Satoshi Kurashima, Nobumasa Miyawaki, Susumu Okumura, Hirotsugu Kashiwagi,Watalu Yokota

Research Center for Nuclear Physics (RCNP)Osaka University

Mitsuhiro Fukuda, Kichiji Hatanaka, Tetsuhiko Yorita

ContentsContents1. Microbeam Production Systems

at TIARA Facility

2. Applications of the Microbeams

3. Development of a New High-Energy Heavy Ion Microbeam System

4. Generation of High Quality Beams by Upgrading Cyclotrons

5. Summary

1. Microbeam Production Systems at 1. Microbeam Production Systems at TIARATIARA FacilityFacility

K110 Cyclotron

3MV Tandem Accelerator

3MV Single-ended Accelerator

Several-Hundred-MeVHeavy Ion Microbeam

and Single-Ion Hit

Several-Dozen-MeV Heavy Ion Microbeam

Several-MeVLight Ion

Microbeam

TTakasakiakasaki IIon accelerators foron accelerators for AAdvanceddvanced RRadiationadiation AApplicationpplication

Ener

gy (M

eV)

0.01

0.1

1

10

100

1000

AVF Cyclotron

Tandem Accelerator

Ion Implanter

Mass Number (amu)1

Single-ended

10 200100

400kV Ion Implanter

Production of MicrobeamProduction of Microbeam

Primary beam

Object slitsDivergence-defining slits

Quadrupole lenses

Focal plane

Microbeam line

Heavy Ion Microbeam Line Light Ion Microbeam LineSeveral-dozen MeV Several MeV

Spot Size of Light Ion Microbeam Spot Size of Light Ion Microbeam

０．５μm

SEM(Scanning Electron Microscope) image of a silicon relief pattern

0 0.4 0.8 1.2Horizontal Position (μm)

Inte

nsity

of S

econ

dary

El

ectro

ns

0.25 μm

Secondary electron mappingto measure the beam spot size

Scanning the microbeam

2. Applications of the 2. Applications of the MicrobeamsMicrobeams

2 dimensional distribution of elements in cattle blood vessel cell

20μm x 20μm

S

BrP

K

Cell

In vacuum In air

Sample

Microbeam

X-ray detector for PIXE

Beam Scanner

γ-ray detector for PIGE

Measurement System

X-ray

γ-ray

Tooth

Dental Sample

Distribution of fluorine and calcium in tooth

In-air Micro-PIXE Analysis Using 2 MeV Proton Microbeam

Application of several-hundred-MeVheavy ion Microbeam

Beam spot size : 5～10 μm

Single-ion hit rate : several hits/min

Collimator

Cell

Beam

Driving a sample stage

10 μ m核

イオンのヒット位置

Mammalian cultured cell

Heavy ion microbeam

10 μ m10 μ m

Elucidation of Cellular Radiation Response

Cell nucleus

Damage in DNA

• Investigation of cell-to-cell communications such as “bystander effects”

• Analysis of cellular spatial sensitivity, interaction of damages, dynamics of cellular repair and intra-cellular process like apoptosis

Hit position

Collimation of Beam

3. Development of a New High3. Development of a New High--EnergyEnergyHeavy Ion Microbeam SystemHeavy Ion Microbeam System

Micro Slits

2790

mm

Divergence Defining Slits

Quadruplet

basement floor level

Beam Shifter

Basement Floor

4930

mm

Deflection Magnet

Beam Scanner

Several-hundred-MeV heavy ion beam( ΔE/E < 0.02% )

Ion Beam Optics

1st Floor

End-station

Focusing type

Preliminary ResultPreliminary Result

Several-hundred-MeV heavy ions

Mammalian cell

Nucleus

Beam spot sizeabout 0.7 μm in diameter

(achieved)

5~10 μmCytoplasm

High speed single-ion hit with targeting accuracy

less than 1μm

10 mm

Fluorescence ofbeam spot

Observation of beam spot on a plastic scintillator

applied to

Single-ion hit ratemore than 600 hits / min

(under development)

4. Generation of High Quality Beams4. Generation of High Quality Beamsby Upgrading Cyclotronsby Upgrading Cyclotrons

TIARA Cyclotron Facility

RCNP Cyclotron Facility

Microbeam Applications

Materials, Medical, Biological Sciences

Ultrahigh Resolution Experiment

Nuclear Physics

Upgrade of AVF Cyclotron

-Flattop Acceleration SystemEnergy Spread ΔE/E = 0.01 ~ 0.05 %

-Temperature Control SystemMagnetic Field Stability : ΔB/B < 0.001%

Development of Flattop Acceleration SystemDevelopment of Flattop Acceleration System

Flattop CavityBeam

Dee

Flattop Cavity

Main Resonator

JAEA AVF Cyclotron

Pickup signal of V1+V5

-1.5

-1

-0.5

0

0.5

1

1.5

-360 -270 -180 -90 0 90 180 270 360

Superimposing the fifth harmonic voltageon the fundamental one

Rel

ativ

e A

mpl

itude

Phase (degrees)

Fundamental

Fifthharmonics

Single Turn ExtractionSingle Turn Extraction

Multiturn extraction Single turn extraction

0. 00

0. 05

0. 10

0. 15

0. 20

0. 25

0. 30

0 10 20 30 40 50 60 70

Beam

Cur

rent

(μA

)

Probe Position (mm)

V1 = 36.502 kVV5 = 0.0 kV

Ordinary Acceleration

Beam bunch for single-pulse injection

1

1 0

1 0 0

1 0 0 0

1 0 4

9 0 0 1 0 0 0 1 1 0 0 1 2 0 0 1 3 0 0 1 4 0 0

カウ

ント

時 間 （ 1 5 c h / 1 R F 周 期 ）Time

0

20

40

60

80

100

0 10 20 30 40 50 60 70

フラットトップ ON

ビー

ム電

流（

nA）

プローブ位置（mm）

V1 = 32. 7 kVV5 = 1. 2 kV

Probe Position (mm)

Bea

m C

urre

nt (n

A)

1

1 0

1 0 0

1 0 0 0

1 0 4

1 0 5

9 0 0 1 0 0 0 1 1 0 0 1 2 0 0 1 3 0 0 1 4 0 0

カウ

ント

時 間 （ 1 5 c h / 1 R F 周 期 ）Time

260 MeV 20Ne7+

@ JAEA AVF Cyclotron

Turn pattern before extraction

Flattop Acceleration

Stabilization of Cyclotron Magnet FieldStabilization of Cyclotron Magnet Fieldby Controlling Cooling Water Temperatureby Controlling Cooling Water Temperature

Temperature increase caused byheat from coils : Δtyoke ~5 oC

Magnetic field stability :ΔB/B ~ 3×10-4

- Insertion of water cooled plate for heat shielding

Δtyoke ~ 0.1 oC- Stabilization of cooling water

temperature for coils Δtcoolant ~ 0.5 oC

ΔB/B ~ 1×10-5

Calculated temperature distribution(a) without plate (b) with plate

¼ cut

Improved

Cyclotron magnet

Water-cooled plate

Trim coil

YokePole

Main coil

High Quality Beam at RCNP Cyclotron FacilityHigh Quality Beam at RCNP Cyclotron FacilityRing Cyclotron

K=400 MeVΔE/E ~ 0.01%Since 1992

Stability of Magnetic Field

ΔB/B < 0.001%Grand Raiden

Energy ResolutionΔE/E ~ 0.005%

AVF CyclotronK=140 MeVΔE/E < 0.1%Since 1973

Upgraded recently

Ultrahigh Energy Resolution Experiment Using the Ultrahigh Energy Resolution Experiment Using the High Quality BeamHigh Quality Beam

Lateral and Angular dispersion matchingbetween WS-beam line and Grand RAIDEN

Ultrahigh resolution of ΔE = 12.8 keV

World record !!

58Ni(3He,t)E = 140 MeV/uΔE = 35keV

Ultrahigh resolution(3He,t) measurement

RCNP2001

IUCF

Ordinary resolution(p,n) measurement

Comparison of resolutions

RCNP

5. Summary5. Summary

- Elucidation of Irradiation effects to living cells

5 ~ 10 μm(Collimation)

H ~ Xe>10-3(original)

K110 AVF Cyclotron

High-Energy Heavy-ion

260 MeVNe

< 1 μm(Focussing)

10-4(new)

3MV Tandem

3MV Single-ended

Accelerator

- Analysis of single event phenomena in semiconductor devices

<1 μmH ~ Au10-4Heavy ion

- Micro-PIXE analysis- PBW (Proton Beam Writing)

0.25 μm2~3 MeVH, He

10-5Light ion

ApplicationsSpot sizeIonΔE/EMicrobeam

Microbeams available at TIARA, JAEA Takasaki