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Concentration Variability of Halocarbons over an Electronics Industrial Park and Its Implication in Compliance with the Montreal Protocol ENVIRONMENTAL SCIENCE & TECHNOLOGY VOL. 35, NO. 16, 2001 Speaker: Ann

Concentration Variability of Halocarbons over an Electronics Industrial Park and

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Concentration Variability of Halocarbons over an Electronics Industrial Park and Its Implication in Compliance with t he Montreal Protocol. ENVIRONMENTAL SCIENCE & TECHNOLOGY VOL. 35, NO. 16, 2001. Speaker: Ann. Ozone hole. http://www.esrl.noaa.gov/news/2007/ozone2007.html. - PowerPoint PPT Presentation

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Page 1: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration Variability of Halocarbons

over an Electronics Industrial Park and Its Implication in Compliance with

the Montreal ProtocolENVIRONMENTAL SCIENCE & TECHNOLOGY VOL. 35, NO. 16, 2001

Speaker: Ann

Page 2: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

http://www.esrl.noaa.gov/news/2007/ozone2007.html

Ozone hole

Page 3: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Target compounds

CFC-113 、 CCl4 、 CFC-12 、 CFC-11 、 CH3CCl3 、

C2HCl3 、 C2Cl4

RCl + hv → R + Cl

Cl + O3→ ClO + O2

ClO + O → Cl + O2

Net reaction : O3 + O → 2O2

Page 4: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Sampling locations

Page 5: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Instruments

☆ In-situ (2000) - Park : GC / ECD

☆ Flask (2000) - Park : GC / MS

☆ Flask (1997) - Park : GC / ECD

☆ Flask (1997) - Coastal : GC / ECD

☆ Column : DB-1 ( 60 m X 0.32 mm X 1.0 μm )

Page 6: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

In-situ chromatogram

Page 7: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration distributionIn July 2000 (Flask)

In March 1997 (Flask)

Page 8: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration variability

Page 9: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Relative concentration variation

Page 10: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Relative concentration variation

Page 11: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Relative concentration variation

Page 12: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration v.s wind direction

0 °

90 °

180 °

270 °

Page 13: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration v.s wind direction

CCl4 CFC-113

CFC-12 CFC-11

Page 14: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Concentration vs. wind direction

CH3CCl3

C2HCl3 C2Cl4

Page 15: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Conclusions

☆The in-situ measurement method can be more precisely recorded and better rationalized than the flask measurement method.

☆ The minor emissions of CFC-113 and CCl4 detected by the in-situ method combining with wind data suggest that good compliance with the Montreal Protocol.

Page 16: Concentration Variability of Halocarbons       over an Electronics Industrial Park and

Thank you for your attention