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공학박사 학위논문
Control of vacuum process for growing high quality
organic/inorganic perovskite films for solar cells
태양전지용 고품질 유/무기 혼합
페로브스카이트 성막을 위한 진공공정제어
2019년 8월
서울대학교 대학원
재료공학부
김 범 수
i
Abstract
Control of vacuum process for growing high quality
organic/inorganic perovskite films for solar cells
Kim Beom-Soo
Department of Materials Science and Engineering
The Graduate School
Seoul National University
Metal halide based perovskites have attracted large attention
delivering high power conversion efficiencies (PCEs) in solar cells and
light emitting diodes (LEDs) in last several years. One of the critical
issues in this field is the growing high-quality films reproducibly. Most
of the devices reported up to now have been fabricated using solution
processes. The solution process have brought to considerable increase
in PCEs, with easy accessibility for experiments combined with various
process engineering. However, the vacuum process has potentials for a
stable process with high reproducibility and controllability, considering
the fact that this process is already successfully employed in
commercialized organic light emitting diode (OLED) industry. In the
ii
vacuum process, various advantages can be realized for the fabrication
the perovskite films such as high purity, large area, controllable growth
parameters in real time, excluding the influences from atmospheric
factors and solvents. Additionally, conformal morphology to the sub-
layer can be readily obtained hence an integration with silicon solar
cells in tandem structure on the textured silicon surfaces is achievable.
Nevertheless, the vacuum processes for the perovskite is still minor
process compared to the solution process in the perovskite field,
presumably due to some difficulties in the process with large entry
barrier. In this thesis, we report all-vacuum processed perovskite solar
cells, effective method for growing the perovskite films and the
adsorption/growth mechanism for the precursor of the perovskite,
methylammonium iodide (MAI) in the vacuum process to improve the
process controllability and to understand the film growth mechanism.
In chapter 1, basic features of the perovskite in respect of the
structure, electrical and optical properties are introduced. In addition,
the general working principle for the perovskite solar cells and vacuum
process are explained.
In chapter 2, application of the vacuum process to the perovskite
sell is discussed. The perovskite solar cell is fabricated using all-
vacuum process including the co-deposited perovskite layer.
Molybdenum oxide (MoO3) and N,N′-Di(1-naphthyl)-N,N′-
iii
diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) which are widely used
in vacuum processed organic light emitting diode and organic
photovoltaic, are successfully introduced into the perovskite solar cell.
The solar cells resulted in a high open circuit voltage (VOC) of 1.12 V,
which is comparably high value considering the high performing solar
cells reported up to that time. The fact that the MoO3/NPB layer is
widely used in OPVs/OLEDs implies that technologies developed for
vacuum processed OLEDs/OPVs can be successfully applied in the
perovskite solar cells to accelerate the development of the perovskite
solar cells.
In chapter 3, we report an effective method to control the
compositions of MAPbI3 perovskite via working pressure of MAI and
its effects on perovskite films in the vacuum co-deposition process.
Thermal heating of the MAI source in a vacuum chamber increases the
working pressure, which can be an indicator for the control of the ratio
of MAI in the perovskite film. The working pressure is systematically
varied and resulting physical properties of the perovskite films are
analysed. At the optimum working pressure, the perovskite solar cell
fabricated using an all-vacuum process showed a maximum power
conversion efficiency of 14.5% with high reproducibility, implying
successful formation of the film using the pressure-controlled vacuum
co-deposition.
iv
In chapter 4, we report the growth characteristics of MAI in vacuum
process. Growth characteristic is crucial for the fundamental
understanding the film-growth, as well as for the controllability in the
fabrication process due to the effects on the deposition parameters.
MAI shows surface dependent deposition property which is especially
varied in the presence of PbI2 layers. As the thickness of PbI2 layer
increase, the deposition rates of MAI increased rapidly. At a constant
working pressure, all of the deposition rates begin to decrease reaching
to similar values after certain times depending on the initial PbI2
thicknesses. This phenomena was analysed by atomic force microscopy
(AFM) discussing on the topology, surface potential, thickness and
density changes. Conclusively, these results suggest that the dipole
induced adsorption mechanism for MAI in vacuum process. We believe
that our model would give insights for understanding the growth
mechanism of MAI in vacuum, as well as the improvement of the
controllability since the mechanism directly affect the deposition
parameters.
Keywords: MAPbI3 perovskite solar cell, all-vacuum process, MAI
working pressure, MAI deposition, MAI growth in vacuum
Student Number: 2015 - 30180
v
Contents
Abstract ................................................................................... i
Contents .................................................................................. v
List of Tables ......................................................................... ix
List of Figures ........................................................................ x
Chapter 1. Introduction ........................................................ 1
1.1 Motivation and outline of thesis........................................ 1
1.1.1 Motivation ............................................................................... 1
1.1.2 Outline of thesis ....................................................................... 3
1.2 Perovskite solar cells ......................................................... 5
1.2.1 Materials of the perovskite ...................................................... 5
1.2.2 Optoelectronic properties of the perovskite ............................ 6
1.2.3 Various Methods to grow the perovskite thin film ................ 10
1.2.4 Basic characterization of perovskite solar cell ...................... 15
1.3 Vacuum process ............................................................... 16
1.3.1 General theory ....................................................................... 16
1.3.2 Equipments for vacuum process ........................................... 17
vi
Chapter 2. Vacuum processed perovskite solar cells ....... 21
2.1 Introduction .................................................................... 21
2.2 Preliminary data .............................................................. 23
2.3 Film characterizations..................................................... 26
2.3.1 Absorbance & XRD patterns ................................................. 27
2.3.2 Surface analyzes .................................................................... 30
2.4 Device performances ....................................................... 32
2.4.1 Effects of HTLs ..................................................................... 33
2.4.2 Reproducibility ...................................................................... 48
2.4.3 Hysteresis .............................................................................. 50
2.5 Summary ......................................................................... 53
Chapter 3. Composition-controlled organometal halide
perovskite via MAI pressure in vacuum co-deposition
process .................................................................................. 54
3.1 Introduction ................................................................... 54
3.2 Experiments ................................................................... 56
3.2.1 Perovskite evaporation system .............................................. 56
3.2.2 Film characterization ............................................................. 59
3.3 Results and discussion................................................... 60
vii
3.3.1 Working pressure and thickness ............................................ 60
3.3.2 Working pressure and structural property ............................. 63
3.3.3 Working pressure and absorbance ......................................... 65
3.3.4 Working pressure and morphologies ..................................... 68
3.3.5 Device performance............................................................... 71
3.3.6 Origin for low IPCEs ............................................................. 74
3.3.7 Reproducibility ...................................................................... 77
3.3.8 Compositin measurment by EDX .......................................... 80
3.4 Summary ....................................................................... 82
Chapter 4. Growth characteristics of MAI on PbI2 in
vacuum process.. .................................................................. 83
4.1 Introduction ................................................................... 83
4.2 Experiments ................................................................... 84
4.2.1 Film fabrication ..................................................................... 84
4.2.2 QCM analysis ........................................................................ 85
4.2.3 Film characterization ............................................................. 86
4.3 Results and discussion................................................... 86
4.3.1 Thickness change and XRD depending on sub-layers .......... 86
4.3.2 Study of deposition kinetics using QCM............................... 91
4.3.3 Hypothesis ............................................................................. 95
viii
4.3.5 AFM study ............................................................................. 98
4.3.6 Density and thickness change analysis ................................ 104
4.3.8 Surface potential analysis .................................................... 109
4.3.9 Growth mechanism of MAI in vacuum ............................... 113
4.4 Summary ..................................................................... 118
Chapter 5. Summary and conclusion .............................. 119
Bibliography ...................................................................... 122
초록 ..................................................................................... 131
CURRICULUM VITAE ................................................... 134
List of Publications ............................................................ 136
List of Presentations .......................................................... 137
List of Awards .................................................................... 141
ix
List of Tables
Table 2.1 Perovskite solar cell performance of the best performing
device and the average values of the 72 devices from 6 different
batches.. ................................................................................................ 47
Table 2.2 The solar cell parameters of the device with the MoO3/NPB
layer with different scan directions. ..................................................... 51
Table 3.1 Average photovoltaic parameters of the fabricated perovskite
solar cells. The values were extracted from 4–8 cells (23 cells for the
cells fabricated at 5.1 × 10−5 torr)... ...................................................... 78
Table 4.1 Thickness of deposited MAI on different substrates. All the
substrates are exposed to MAI for 60 min under 7×10-6 torr. .............. 89
x
List of Figures
Figure 1.1 The structure of organometal halide perovskite ................... 8
Figure 1.2 Schematic figure for the various methods to fabricate the
MAPbI3 perovskite films. ................................................................... 14
Figure 1.3 The picture of glove box integrated vacuum evaporator
systems used for the perovskite and other layers. ................................ 18
Figure 2.1 1 (a) The evaporator used for the preliminary experiment
(Bell-jar, Selcos) (b) Absorbance and (c) XRD data of the MAPb3-xClx
film. (d) Device fabricated with different structures using the
evaporator. ............................................................................................ 25
Figure 2.2 The absorbance of the 320 nm thick MAPbI3 film grown on
the glass substrate using vacuum co-evaporation.. ............................... 28
Figure 2.3 The X-ray diffraction (XRD) patterns of a 320 nm thick
MAPbI3film using vacuum co-evaporation... ....................................... 29
Figure 2.4 The demonstration of MAPbI3 perovskite in the preferred
orientation along (110) direction..... ..................................................... 31
Figure 2.5 The J−V characteristic of the device without the MoO3 layer
.............................................................................................................. 36
Figure 2.6 The J−V characteristic of the device without the NPB layer
.............................................................................................................. 38
Figure 2.7 X-ray diffraction (XRD) patterns of the fabricated
perovskite film on the different substrates .......................................... 41
xi
Figure 2.8 The schematic diagram of the energy levels of each layer in
the device without MoO3 layer. Note that the energy levels are
represented against the vacuum level. ................................................ 43
Figure 2.9 (a) The current density-voltage (J−V) characteristics and (b)
incident photon-to-electron conversion efficiency (IPCE) spectrum of
the best performing perovskite solar cell.. ........................................... 46
Figure 2.10 Histogram plots of the solar cell parameters; (a) Power
conversion efficiency (b) short-circuit current (c) open circuit voltage
(d) fill factor of the 72 devices from 6 different batches... .................. 49
Figure 2.11 . The current density-voltage (J−V) characteristics of a
device with the MoO3/NPB layer for different scan directions... ........ 51
Figure 3.1 Schematic Fig. of the vacuum co-deposition system for the
perovskite layer...... .............................................................................. 58
Figure 3.2 Thickness and deposition rate of the perovskite films under
different working pressures deposited for 1 h with the same deposition
rate of PbI2 as 0.5 Å/s. The first data point (2 × 10−6 torr) represents
PbI2 only film...... ................................................................................ 62
Figure 3.3 (a) XRD patterns of the perovskite films under different
pressures on the indium tin oxide/MoO3 (5 nm)/NPB (20 nm) substrate.
(b) Magnified image of the XRD patterns in red square region...... .... 64
Figure 3.4 (a) Absorbance of the perovskite film at various pressures
on a glass substrate. The thicknesses are indicated in the brackets. (b)
xii
Absorbance at 550 nm of the fabricated films. (c) Color of the
perovskite films. From the left, the films are PbI2 only, 0.6, 1.7, 3.2, 4.1,
5.1, 6.5, and 8.3 × 10−5 torr-deposited films....... ................................. 66
Figure 3.5 Reflectance of PbI2. The incident beam is tilted 7° toward
the substrate ......................................................................................... 67
Figure 3.6 AFM images of the perovskite films with different pressures
grown on an indium tin oxide/MoO3 (5 nm)/NPB (20 nm) substrate .. 70
Figure 3.7 Three-dimensional AFM image of the perovskite films
shown in Fig. 3.6. ................................................................................ 70
Figure 3.8 SEM image of the perovskite films shown in Fig. 3.6. .... 70
Figure 3.9 (a) Current density-voltage (J-V) characteristics of the
fabricated devices at the different pressures. (b) IPCE spectra of the
fabricated perovskite solar cells. .......................................................... 73
Figure 3.10 (a) IPCE spectrum selected from Fig. 3.9 for low,
optimized, high working pressure fabricated device with short (450 nm)
and long (650 nm) wavelength. (b) Simulated electric field in the
device of short (450 nm) (c) and long (650 nm) wavelength... .......... 76
Figure 3.11 (a) Hysteresis of the fabricated solar cell fabricated under
the optimized pressure, 5.1×10-5 torr. (b) J–V characteristics at the
different scan rates of the device fabricated under optimized pressure,
5.1×10-5 torr .......................................................................................... 79
Figure 3.12 Atomic ratio of iodine to lead measured by EDX for the
xiii
fabricated perovskite films. .................................................................. 79
Figure 4.1 (a) The thickness of MAI/PbI2 films on different initial PbI2
thicknesses (b) X-ray diffraction patterns of the MAI deposited on PbI2
films with different thicknesses... ......................................................... 90
Figure 4.2 (a) Schematic figure for comparative adsorption experiment
on QCMs (b) monitored deposited weight of MAI on QCM/PbI2(x nm)93
Figure 4.2 (c) The measured thickness change and adsorbed weight
and (d) monitored deposition rates and working pressure.. ................ 94
Figure 4.3 Schematic figure of the hypothesis to explain the deposition
parameter changes shown in Fig. 4.2(d). .............................................. 97
Figure 4.4 (a) 3D-topology (5μm × 5μm) of the MAI exposure films
with different times and initial PbI2 thickness and (b) RMS roughness
values extracted from 5μm × 5μm images.. ........................................ 99
Figure 4.5 (a) Topology (b) Surface potential and (c) phase images of
potentials of the MAI films (5 𝜇𝜇𝑚𝑚×5 𝜇𝜇𝑚𝑚) ......................................... 101
Figure 4.6 (a) Topology (b) Surface potential and (c) phase images of
potentials of the MAI films (1 𝜇𝜇𝑚𝑚×1 𝜇𝜇𝑚𝑚) ......................................... 102
Figure 4.7 (a) Topology (b) Surface potential and (c) phase images of
potentials of the MAI films (0.5 𝜇𝜇𝑚𝑚×0.5 𝜇𝜇𝑚𝑚) ................................... 103
Figure 4.8 (a) Thickness change and (b) density change of the
deposited films on PbI2 (x nm) films with MAI deposition time ....... 106
Figure 4.9 Schematic figure for the thickness change on PbI2 layer in
xiv
vacuum process .................................................................................. 108
Figure 4.10 (a) Surface potential images (5 𝜇𝜇𝑚𝑚 × 5 𝜇𝜇𝑚𝑚) and (b)
Average surface potential values measured from various scales ........ 112
Figure 4.11 (a) Schematic figure for why the MAI potential is changed
with thickness and (b) illustration how the orientation change of MAI
appear in SKPM measurement ........................................................... 115
Figure 4.12 Schematic illustration for growth of MAI on various PbI2
thickness with time ............................................................................. 117
1
Chapter 1
Introduction
1.1 Motivation and outline of thesis
1.1.1 Motivation
The hybrid organic/inorganic perovskite (e.g., MAPbI3) based solar
cells attract large attention because of high power conversion
efficiencies (PCEs) [1-5]. Most of the devices reported up to now have
been fabricated using solution processes. One of the critical issues of
the solution processed perovskite solar cells is the reproducibility
coming from the difficulties in controlling the uniformity [6-7], pin-
hole formation [7-8], sensitivity to moisture and air [9-10]. A variety of
approaches have been introduced such as sequential deposition [2,8,11],
solvent modifications [4,12-16], manipulation of the crystallization
time [17,18], and changing the annealing conditions [19-22], which are
mostly attempted in the modification of the solution processes. Vacuum
evaporation has a potential for high reproducibility and controllability
due to solvent free processes combined with controllable growth
parameters in a clean and inert environment [23-29]. Nevertheless, the
fully vacuum–processed perovskite solar cells have been rarely
2
reported comparing to the solution processed devices. Following Liu’s
successful application of the vacuum process to the perovskite solar
cell, several groups have reported the perovskite solar cells using
vacuum co-deposition process [23-25, 30-42]. Most of these groups
commented on difficulties of controlling the MAI in vacuum. It is
known to be difficult to calibrate the thicknesses of deposited MAI due
to the gas-like behaviors in vacuum chamber and the rough surfaces
with poorly adsorbed MAI films [24, 25, 30-33, 43-46]. These
problems hinder an accurate monitoring and controlling the MAI in
vacuum process. However, the vacuum process is still one of the most
promising method since its general advantages such as high purity
films, uniformity, clean environments excluding solvent/atmospheric
influences [23-29]. Additionally, commercially succeeded OLED
industries have used vacuum process implying it is stable and effective
process for optoelectronic devices.
Regarding these issues, in this thesis, researches for employing the
advantages of vacuum process to the perovskite solar cells,
methodology to control the process and growth mechanism of MAI in
vacuum process will be discussed.
3
1.1.2 Outline of thesis
In chapter 1, a brief introduction for the material, MAPbI3, and the
development of the methods for perovskite film-growth will be
described. Additionally, the general working mechanism of the
perovskite solar cell and the experimental methodologies to fabricate
the perovskite films in vacuum process will be introduced.
In chapter 2, the perovskite solar cell employing all-vacuum process
will be mainly discussed. The stable and efficient combination for hole
extraction layers MoO3/NPB, which is widely used in the vacuum
processed OLEDs/OPVs, were successfully applied into the vacuum
processed perovskite solar cell. This successful application of the
vacuum deposited MoO3/NPB as a hole extraction layer implies that
utilization of typical thermal-evaporation materials developed for the
OPVs/OLEDs to perovskite solar cells is feasible, thus leading to an
extension of the research areas
In chapter 3, an efficient method to control the vacuum process for
the perovskite and the resultant thin film properties are discussed. The
compositions of the perovskite were able to be adjusted with the
working pressures of MAI. Using this method, the properties of the
films with various compositions were significantly differed. The
4
thickness, optical properties, structural, morphological, compositional
properties with device performances are reported. At the optimum
pressure of MAI resulted in the maximum power conversion efficiency
of 14.5% with good reproducibility. Throughout this work, it is
expected that it would be useful for the readers to find their optimized
condition of the vacuum co-deposited perovskite films.
In chapter 4, the growth mechanism of MAI in vacuum process is
discussed. MAI shows surface dependent deposition characteristics
which is especially varied in the presence of PbI2 layers. As the
conclusion, we suggest the dipole induced adsorption mechanism for
MAI in vacuum process. This chapter would be interested in terms of
the newly suggested growth mechanism which varies the thickness or
deposition rate. In this regards, the researchers who work in this field
may find practical information for control MAI in vacuum since the
growth mechanism directly affect the deposition parameters.
5
1.2 Perovskite solar cells
1.2.1 Materials of the perovskite
In perovskite solar cells, the perovskite usually composed with
organic cat ion (A), metal (B), and halogen components(X) called
ABX3 type perovskite or organo-metal halide perovskite. In this
perovskite, MA+, Pb+, I- are widely used components as the organic cat
ion, metal and halogen parts respectively in the orgaometal halide
perovskite. MA+ plays the role of providing a charge balance in
perovskite structure without covalent interactions with other
components where Pb2+ and I- are bonded with the combination of
covalent and ionic bonds. In this perovskite structure, the lower part of
the conduction band (CB) is mainly composed by hybridization of s
orbital of Pb and p orbital of I where upper part of the valance band
(VB) is mainly comprised of p orbital of Pb [47]. The perovskite is
typically obtained from the reaction of the two precursors, PbI2 and
MAI. The formation activation energy of the perovskite is low enough
to occur in room temperature, hence the perovskite can be readily
formed by mixing the two components or employing the diffusion of
MAI into the PbI2 layer.
6
1.2.2 Optoelectronic properties of perovskite
The probability of exiting the molecules are given by Since the direct
p-p band transition of the perovskite, where the electron density is
localized, the perovskite shows the high absorption coefficients in the
visible light range with the optical band gap of ~1.5 eV [48]. The
absorption coefficient of the perovskite in the visible light is
comparable to amorphous silicon or GaAs. Also, since the optical band
gap can be tuned by substituting the elements of the perovskite, the
absorption edge can approach to Shockley−Queisser limit [49]. On the
other hand, it is reported that measuring accurate refractive index of the
perovskite is challenging. The grain size, roughness, pin-holes and
crystallinity which depend on the film growing process affect the
refractive index significantly [50, 51]. Therefore, the stable process for
the film fabrication is required to accurately measure the optical
property of the perovskite thin films. In the perovskite, it was debatable
whether the excitons or free carriers are dominantly generated since the
exciton binding energy is known to be about 13~16 meV [52-54],
which results in delocalized Wannier-like exciton characteristics.
Therefore, in perovskite solar cells the free carriers are mainly
considered. The crucial working principle of the perovskite absorber in
the solar cell is characterized by significantly long charge carrier
diffusion length [55-58]. Several mechanisms have been proposed to
7
explain the long carrier diffusion length both hole and electron. The one
of the crucial reasons for this long electron-hole diffusion lengths is
that the dominant point defects, such as iodine interstitial defects,
methylammonium interstitial defects and iodine vacancies generate
shallow traps against CB or VB resulting in easy de-trap process which
does not significantly hinder the carrier transporting [59-62]. This is
considered to be the reason of the superior electrical property (long life
time, diffusion length) of the perovskite. Another mechanism is
featured as the ferroelectricity of the perovskite. J. M. Frost et al.,
reported that the spontaneous polarization of the perovskite induces
muti-domains in the perovskite resulting in the separation the path for
the electron and holes respectively. A similar mechanism has been
previously proved by piezorsponse force microscopy (PFM) for the
BaFeO3 perovskite where the domains reduce the bimolecular
recombination resulting in long carrier diffusion length [46].
Therefore, it is possible to diffuse over a micrometer for the electrons
and holes through the CB and VB respectively. Additionally, it has been
8
Figure. 1.1 The structure of organometal halide perovskite. The most
widely used components are marked with bold in the parentheses
which are MA+, Pb2+, I- for the monovalent organic cat ion, divalent
metal and the halogen components respectively.
9
reported that MAPbI3 possesses inherently benign grain boundaries,
which may act as traps in the film [65]. With these characteristics, the
high absorption coefficients combined with long electron-hole diffusion
lengths attributed from the shallow taps of the point defects and benign
grain boundaries, MAPbI3 generates the charge carriers then transports
the carriers to the electron or hole transport layers under the lights.
These properties are suitable for the active layer in the photovoltaic
devices.
10
1.2.3 Various methods to grow the perovskite films
MAPbI3 is formed via the reaction between MAI and PbI2. Since the
fabrication process directly affect the optoelectronic properties and it is
challenging to grow the high quility films, various method for the
growing the films have been reported as follows.
One-step Spin coating
The spin coating is carried out by the casting the mixed solvent
containing MAI and PbI2 on to the desired substrates. In this process,
the solvent should resolve both MAI and PbI2 and the widely used
solvent is dimethylformamide (DMF). Once the solvent drops onto the
substrates, the perovskite film is immediately formed since the DMF
evaporates quickly. Therefore, it is often indicated that this process
causes poor morphologies, as well as the lots of the voids inside of the
film. This possibly cause degrading of the film quality and the device
performance in the solar cells. To retard the crystallization, improved
methods such as a dropping toluene or use of dimethyl sulfoxide
(DMSO) which evaporates slowly comparing to DMF [4,13].
Sequential (two-step) spin coating
In the sequential spin coating, the PbI2 layer is deposited on the
substrate by spin-coating and PbI2 deposited substrate is dipped into the
11
MAI solution. MAI is resolved in a solvent, such as IPA, therefore MA+
+ I- ions intercalate into PbI2 layer. In order to fully convert the pre-
deposited PbI2 layer into the perovskite, the MAI should diffuse into
PbI2. Therefore, generally substrate heating is usually required for this
process, around 100 ℃. Another stagey is employing a porous PbI2
layer to enhance the diffusivity of MAI.
Burshka et al reported this method to fabricate the perovskite solar
cell and the authors showed that the pin-hole free, compact perovskite
film which resulted in the PCE of 15% [2]. The formation of the
perovskite is possible since the MAI inter-diffuses into the PbI2 layer,
therefore the annealing process is typically required to form the
perovskite structure.
Vacuum process
Liu et al., reported vacuum processed perovskite by co-deposition of
PbCl2 and MAI [23]. In this process, MAI and the lead halide (PbI2 or
PbCl2) are co-evaporated in the vacuum chamber and the composition
is controlled by the deposition rate of the each source. It is reported that
the use of PbCl2 requires the post annealing process to form the
perovskite structure since the MAI should be supplied excessively to
satisfy the stoichiometry, and this excessive MAI should be removed
whereas the iodide perovskite using PbI2 can be formed without
annealing processes. Polander et al. reported fully vacuum–processed
12
perovskite solar cells using various hole transporting layers (HTLs) and
found that 2,2',7,7'-tetra(N,N -di-p -tolyl)amino-9,9-spirobifluorene
(spiro-TTB) possessing HOMO level of -5.3 eV resulted in the higher
solar cell performance with VOC of 1.07 V and PCE of 10.9% than
spiro-2’,7,7’-tetrakis-(N,N-di-p-methoxyphenylamine)-9,9’-
spirobifluorene (spiro-OMeTAD), possessing the HOMO level of -5.0
eV which showed VOC of 0.85 V and PCE of 7.7%. [31]. O.
Malinkiewicz et al., reported the similar process, vacuum co-deposition,
with MAI and PbI2. The authors introduced the organic charge
transporting layers, PEDOT:PSS/poly(N,N′-bis(4-butylphenyl)-
N,N′-bis(phenyl)benzidine (poly-TPD) for the hole-extraction and
6,6)-phenyl C61-butyric acid methyl ester (PCBM) as the electron-
extraction layer [24].
Vapor state reaction
Q. Chen et al., reported the perovskite formation by “vapor-assisted
solution process” (VASP) [15]. The PbI2 layer was previously deposited
on the films by solution process and then the substrate was exposed to
MAI vapor in nitrogen-filled glove box. The MAI powder was spread
out around the PbI2 coated substrates with a Petridis covering on the
top and heated at 150 °C for desired film. In this work, the authors
reported a planar structure perovskite solar cell with PCE of 12.1%. ,
X. Zhu et al., reported that vapors state reaction of MAI with inorganic
13
mixed halide, PbCl2 and CsCl2. In this work the PbCl2 without and
with Cs-substituted films was deposited on by a thermal evaporation
[17]. During PbCl2 deposition, the CsCl was simultaneously evaporated
obtain the PbCl2 films with different compositions. The mixed halide
films were transferred into the nitrogen-filled glovebox. The MAI
powder was placed into a 70 mm × 70 mm aluminum reactor to form a
∼0.5 mm thick uniform and compact thin film. Then, the samples were
placed on a layer of MAI powder, and heated to 150 °C for 20 min to
ensure transformation of PbCl2 and CsCl into perovskite, similar to the
methods “VASP” reported by Q. Chen [15]. Finally, the perovskite
samples were transferred into a petri dish, cooled for 30 min, washed
with 50 mL isopropanol, and dried by flowing nitrogen gas. In this
work, the authors demonstrated the PCE of 20.13 %.
14
Figure 1.2 Schematic figure for the various methods to fabricate the
MAPbI3 perovskite films
15
1.2.4 Basic characterization of perovskite solar cell solar cell
Current density-voltage characterization
The short-circuit current density is defined as the current extracted at
applied external voltage is zero and the open circuit voltage is defined
as the photo voltage where the extracted current is zero under
illumination. The maximum output power (PMAX) is defined by the
maximum area given by photo current × photo voltage (JMAX × VMAX ).
The fill factor, FF, is defined as follows.
SCOC
MAXMAX
JVJV
FF××
=
The power conversion efficiency (PCE, ηp ), consequently, is
defined as follows where Pinput correspond to the power of incident
light typically 100 mW/cm2 for the AM1.5G condition.
input
SCOC
input
MAXp P
FFJVPP ××
==η
Incident photon-to-current efficiency
The incident photon to current efficiency (IPCE) or external quantum
efficiency (EQE) is the ratio of number of incident photons over
number of collected electrons. Since the photo generated current is
dependent on the wavelength it is described as follows.
16
)(#)(#
(%)λ
λphotonsincidentof
electronsofIPCE =
The short circuit current at AM 1.5G, therefore can be calculated
from the measured IPCE as follows.
sourcelighttheofnsityintelighttheI
dIIPCEqhcJ MAXSC
:
)()(
0
0, λλλλλ
∫=
1.3 Vacuum process
1.3.1 General theory
The vacuum deposition process is typically conducted below 10-4 torr
and the vacuum levels are categorized as low vacuum (~10-3 torr), high
vacuum (10-7 torr) and ultra-high vacuum (~10-9 torr). The sources are
heated in vacuum and when they reach to the vapor pressure, the
sources start to vaporize. The vaporization can be described as Hertz–
Knudsen vaporization equation as follows.
0.5 1/ (2 ) ( * )secdN dt C mKT p pπ − −= −
,where dN is number of evaporating atoms per surface area, C is
17
constant that depends on the rotational degrees of freedom in the liquid
and the vapor, p* is vapor pressure of the material at temperature, p is
pressure of the vapor above the surface, k is Boltzmann’s constant, T is
absolute temperature and m mass of the vaporized species [66]. The
vaporized molecules would collide to the substrate, which results in the
deposition forming films on substrate.
1.3.2 Equipment for vacuum process
Evaporator
The nitrogen filled glove box integrated vacuum chambers (VEV-502,
VTS corp.) are used to fabricate perovskite films as well as other layers
in the solar cells. One of the chamber possess 7 sources where hole
transporting layers and the perovskite are deposited and another
chamber possess 3 sources where electron transporting layers and
electrode metal layers are deposited. All of the sources are able to be
loaded through the glove box without exposing to air. The distance
from the source to the substrate is approximately 40cm and the
substrate rotates which ensure the uniformity of the deposited films.
18
Figure. 1.3. The picture of glove box integrated vacuum evaporator
(VTS corps.) systems used for the perovskite and other layers.
19
Thickness monitor
The thickness and deposition rate can be measured by quartz crystal
microbalance (QCM) which measures the adsorbed mass by the
frequency change. The relation between adsorbed mass and frequency
change is represented by Sauerbrey equation [67].
202
q q
ff m c mA ρ µ
∆ = − ∆ = − ∆
, where f0 is resonance frequency (Hz), Δf is frequency change (Hz),
Δm is mass change (g), A is pezoelectrically active crystal area, ρq is
density of quartz (g/cm3) and μq is shear modulus of quartz of AT-cut
crystal (2.947 ×1011 g·cm-1·S-1). For the simplicity, c is used as
“sensitivity factor” for the QCM. The frequency change appears as the
adsorbed thickness or deposition rate through the thickness monitor
(CRTM-9000, ULVAC). The frequency change and adsorbed mass are
in the linear relation when the frequency change is less than ~5%,
hence the QCMs are replaced around the frequency change is ~2%.
Vacuum gauges
For the low vacuum, from 1 atm to 10-3 torr, the pirani gauges are used.
The high level vacuum is monitored by ionization gauge (VARIAN 572,
Agilent). It reads the current generated by the hot electrons from the
filament, which would collide with gas molecules between the filament
20
and electrodes in the ionization gauge. The pressure can be measured
from the current as follows.
c
g g
IpS I
=
, where p is pressure Ic is ion collector current Ig is electron emission
current and Sg is gas sensitivity factor. Sg was set to default value, 1,
corresponding to nitrogen and air. However, if MAI molecule affect the
ion collector current the gas sensitivity factor would be changed,
presumably larger than 1 since its polarity [68], hence the working
pressure of MAI in this research are nominal values.
Vacuum pumps
The two types of pumps are used for the evaporator, rotary and
cryogenic pump. The rotary pump is used to reach the vacuum level
around 10-3 torr. Once the vacuum level reaches this value, the
cryogenic pump (C200, Suzuki Shokan) is used which adsorbs the gas
molecules with the temperature ~10 k. The temperature is maintained
by helium compressor (A200, Suzuki Shokan) and water cooling chiller.
This pump is quite robust enough to reach to the base pressure of ~10-7
torr under using the MAI evaporation more than a year.
21
Chapter 2
Vacuum processed perovskite solar cells
2.1 Introduction
In the perovskite solar cells, the one of the critical issues, as
mentioned in the chapter 1.1.1, is the reproducibility. The main reason
for this is that the fabrication of the reproducible film is challenging
due to the characteristics of the perovskite films such as non-uniform
surface, voids in the films, pinhole formation and the sensitivity to the
air/moisture. Therefore, to enhance the reproducibility, as well as to
enhance the film quality, various attempts have been introduced such as
the solvent modifications [4, 12-16], varying the post treatments of the
films [17-22]. The vacuum process has a potential for high
reproducibility and controllability due to solvent free process combined
with controllable growth parameters in a clean and inert environment
[23-28]. Another important issue in the perovskite solar cells is HTLs
since the most widely used HTL, spiro-OMeTAD possesses a few meV
lower HOMO level than the VB edge of the MAPbI3 and MAPbI3-xClx
[69]. Nonetheless, there have been reported high performance
perovskite solar cells using this HTL, spiro-OMeTAD, there is still
room for further improvement in terms of the energy level matching.
22
The level mismatching would cause a reduction of the VOC, due to the
lowering in built-in field and the thermionic loss during the hole
extractions as mentioned in the chapter 1.2.3. In this regard, there have
been various reports to find the HTL s in order to achieve high
performing perovskite solar cells [70-775]. However, most of the
devices shows the lower performances than spioro-OMeTAD used
devices except Poly(triarylamine) (PTAA) used device which shows the
PCE of 16.7% [4]. Polander et al. reported all vacuum−processed
perovskite solar cells using various HTLs and found that 2,2',7,7'-
tetra(N,N -di-p -tolyl)amino-9,9-spirobifluorene(spiro-TTB) possessing
HOMO level of -5.3 eV resulted in the higher solar cell performance
with VOC of 1.07 V than spiro-OMeTAD possessing the HOMO level of
-5.0 eV with VOC of 0.85 V. In this regard, one can note that the HOMO
level matched HTMs are able to result in the higher performances than
spiro-OMeTAD used perovskite solar cells.
In these regards, research on the stable process for the perovskite with
efficient charge transporting layer (CTL) can be two important issues in
the perovskite solar cell community. In this chapter, we report all-
vacuum processed perovskite solar cell employing efficient HTL
minimizing the energetic loss. All of the layers, including the
perovskite layer and other CTLs deposited without breaking the
vacuum. In addition, the widely used HTLs, MoO3 and NPB, in the
vacuum processed OLEDs and OPVs field are successfully applied into
23
the perovskite solar cell system.
2.2 Preliminary data
The mixed halide perovskite, which is typically formed with the
reaction between MAI and PbCl2, consequently forms the MAPbI3-xClx
is the widely used material next to MAPbI3. In order to satisfy the
stoichiometry in the perovskite, the molar ratio of MAI:PbCl2 should be
approximately 3:1 which requires the excessive MA+ and Cl-
components should be removed after the deposition. For the removal
process, annealing the substrate at 150°C is carried out. The vacuum
co-deposition of the mixed halide perovskite was fabricated
preliminarily without the information for the deposition rate of the MAI,
since the poor adsorption property onto the substrate, which makes the
measuring the film thickness is difficult. In this experiment, the
deposition rate of PbCl2 was set to 0.5 Å/s which had been calibrated
before the deposition using a profilometry (KLA-Tencor Alpha-Step
IQ) where the deposition rate of MAI was 0.5 Å/s using a nominal
tooling factor, but maintained the deposition rate constant during the
deposition. After the deposition, the substrate was annealed in the
nitrogen ambient at 150℃ as reported elsewhere [clx] . The perovskite
layer was deposited in the bell-jar evaporator (Selcos) as shown in Fig.
24
2.1a. The absorbance and X-ray diffraction (XRD) patterns of the
fabricated perovskite films correspond to the previously reported data
[76-78] (Fig. 2.1b and 2.1c). However, most of the device are short-
circuited as featured in J-V curve shown in Fig. 2.1d, regardless the
composition of the perovskite and the device structures. The origin was
not clear, but we presume that the technical problems may cause the
poorly performing device. For example, air exposure before/after the
perovskite layer deposition, short distance from the source to the
substrate and oil contamination from the diffusion pump are inevitable
for the bell-jar evaporator used in this experiment. Therefore, we
started to use the evaporator (VEV-502, VTS corp, Fig. 1.3), which
includes glove box integrated with two vacuum chambers, various
source and cryogenic pumps for high vacuum, for the perovskite layer,
other CTLs and metal.
25
Figure 2.1 (a) The evaporator used for the preliminary experiment
(Bell-jar, Selcos) (b) Absorbance and (c) XRD data of the MAPb3-xClx
film. (d) Device fabricated with different structures using the
evaporator
26
2.3 Film characterization
2.3.1 Film fabrication
Under the enhanced experimental condition using the evaporator
shown in Fig. 1.3 as mentioned above, the perovskite layer was formed
by co-deposition of MAI (Jida Ruibo Optoelectronics Tech.) and PbI2.
Unlikely to the mixed halide perovskite (e.g. MAPbI3-xClx), any post-
treatment such as heating is not required for the triiodide perovskite
using vacuum co-deposited.
A QCM (INFICON, 5Mhz) was located on the PbI2 source which
reads only the deposition rate of PbI2. This QCM was enclosed by the
aluminum foil to exclude the effect of the MAI, since its gas-like
behavior in the vacuum chamber. The other QCM was located at the
near the substrate which enables to read the deposition rate of MAI and
also PbI2. This QCM, therefore, is able to read the growth rate of the
perovskite, as well as the rate of MAI since the deposition rate of PbI2
is fixed constant using the other QCM located near the PbI2 source. The
base pressure of the vacuum chamber was about 1×10-6 torr and this
pressure was increased up to 2×10-5 Torr when MAI is deposited.
Regardless this increase of the vacuum pressure, the deposition rates of
the PbI2 and MAI are maintained constant during the co-deposition. To
27
form the 320 nm thick of the perovskite, 150 nm thick of PbI2 was
deposited which was read by the QCM 1. The total deposition tame was
about 1 hour.
2.3.2. Absorbance and XRD patterns
Fig. 2.2(a) shows the absrobance of a 320nm thick MAPbI3 film
grown on a glass substrate, which were recorded by a VARIAN Cary
5000 UV–vis spectrophotometer. The absorbance corresponds to
previously reported data in visible light range, which implies that the
perovskite structure via vacuum co-evaporation described in the
chapter 2.4 was successfully formed. Fig 2.2(b) shows the XRD
patterns of the fabricated MAPbI3 film grown on a ITO (150 nm)/MoO3
(5 nm)/NPB (20 nm) substrate. The peaks at 14.06˚, 28.26˚ 31.73˚,
40.55˚ and 43.13˚ correspond to (110), (220), (310), (224) and (314)
planes of the tetragonal form of MAPbI3 structure [76-78]. It is worth
noting that the high intensity of (110) and (220) peaks represent that the
highly preferred oriented of the perovskite film on the NPB layer,
which will be used as a HTM later. The preferred orientation, [110]
direction, is demonstrated in Fig. 2.3.
28
Figure 2.2 (a) The absorbance of the 320 nm thick MAPbI3 film
grown on the glass substrate using vacuum co-evaporation. (b) The X-
ray diffraction (XRD) patterns of a 320 nm thick MAPbI3 film grown
on the ITO/MoO3(5 nm)/NPB (20 nm) substrate using vacuum co-
evaporation.
29
Figure 2.3. The demonstration of MAPbI3 perovskite in the preferred
orientation along (110) direction. This figure was drawn by Diamond
3.2 program.
30
2.3.3 Surface ananlyzes
Fig. 2.4(a) shows the AFM (XE-100, Park Systems) image of the
MAPbI3 perovskite film grown on ITO/MoO3 (5 nm)/NPB (20 nm)
substrate with noncontact mode. The root mean squre (RMS) roughness
is 9.7 nm and the maximum peak to valley value is 70 nm from the 320
nm thick film. These values can be consiered small considering the
total thickness of the film. Fig. 2.4(b). shows the red line profile of Fig.
2.4(a), which demonstrates the rms value is about 10 nm again. This
surface can be considered smooth since the rms values reported in
MAPbI3 values are 10 nm ~ 170 nm in the solution perovskite, and it is
often stated that rms value of 10 nm as smooth in the published paper
[79,80]. In this regard, the fabricated perovskite by vacuum co-
evaporation as described in the chapter 2.2, was succesed with the
smooth morphology.
31
Figure 2.4. (a) The atomic force microscopy (AFM) topographic
image of the 320nm thick MAPbI3 perovskite grown on the
ITO/MoO3(5 nm)/NPB(20 nm) substrate using the vacuum co-
evaporation. (b) The red line profile of the topographic image in Fig.
2.4a.
32
2.4 Device performance
150 nm -thick ITO coated glass substrates were cleaned with acetone
and isopropyl alcohol. All the materials except the perovskite, were
thermally evaporated at the base pressure of <1×10-6 Torr without
breaking the vacuum. The vapor pressure was increased up to 2×10-5
torr when MAI is deposited similar to the previous reports [24, 31], as
mentioned in chapter 2.2. The deposition rate of MAI was monitored in
real time using a crystal thickness sensor, QCM, and was maintained
constant during the deposition, while the deposition rate of PbI2 (Alpha
Aesar) was kept constant with 0.5 Å/s during the co-deposition. The
perovskite layer was formed without any annealing process. The NPB
(Nichem), C60 (SES Research) and BCP (Nichem) layers were
deposited at a rate of 1 Å/s, and the MoO3 (Sigma Aldrich) and the Al
layers were deposited at the rates of 0.5 Å/s and 4 Å/s respectively. The
deposition rates were calibrated using a profilometry (KLA-Tencor
Alpha-Step IQ) before the deposition. The active area of each device
was 4 mm2 and 72 devices were fabricated from 6 different batches to
average the cell performance. After the evaporation, the devices were
encapsulated using an epoxy resin with glass cans in an N2
environment. The current density-voltage (J–V) characteristics were
measured under simulated AM 1.5G sunlight of 100 mW/cm2 using
33
Newport (91160A) solar simulator, and recorded using a Keithley 237
source measurement unit at room temperature. The light intensity was
calibrated using a standard Si-solar cell (NREL). The scan step of J-V
characteristics was 0.02 V with 0.3 seconds of interval time for each
step, and the scan direction was from negative to positive voltage. The
incident photon–to–electron conversion efficiency (IPCE) was
measured using a 1000 W Xe lamp combined with a monochromator
and its intensity was calibrated with a Si photodiode. The IPCE was
measured without light bias under the short circuit condition.
2.4.1 Effects of HTLs
2.4.1.1 Function of the MoO3 layer
Transition metal oxides(TMOs), such as MoOx, ruthenium oxides
(RuOx), vanadium oxides (VOx), tungsten oxides (WO3) and rhenium
oxide (ReO3) with high work functions are widely used hole injection
layers (HILs) in OLEDs/OPVs [81]. These high electron affinity TMOs,
especially MoO3 which shows the fermi level of 6.01 eV in an ultra-
high vacuum deposition on the indium tin oxide (ITO) substrate, causes
the electron transfers from the ITO to the MoO3 with the positive level
of the vacuum level shift. Therefore the hole injection barrier, which
can be determined the difference between the Fermi level of the anode
and HOMO level of the HTM can be reduced. The hole injection
34
barrier should be considered in the perovskite solar cells similarly to
the conventional OPV devices since the holes accumulated at the
junction of the anode/HTM would cause the positive electric field in
the forward bias. Therefore, the photo-generated holes flows against the
positive field in hole extraction barrier which significantly reduces fill
factor (FF). Also, forming an ohmic contact between the anode and
HTM results in increase the built-in field in the fabricated photovoltaic
device.
To support these functions of MoO3 in the perovskite solar cells,
the device without MoO3 was fabricated. The device structure is
ITO(150 nm)/NPB (20 nm)/perovskite (320 nm)/C60 (50 nm)/BCP (8
nm)/Al (100 nm). The schematic energy diagram for this structure is
shown in fig. 3.2. The J–V characteristic of the fabricated device is
shown in fig. 3.3. The device showed PCE of 4.2%, JSC of 15.0
mA/cm2, VOC of 0.84 V and FF of 0.33. From the J–V characteristic, it
can be seen the s-kink in the forward bias region which implies the
injection barrier at the ITO/NPB interface as previously discussed in
chapter 3.1. Also, the current density is almost zero from 1 V ~ 3 V in
the forward bias region because of the injection barrier between
ITO/NPB which is known as about 1.2 eV ~ 1.7 eV. As previously
mentioned in chapter 3.1, the MoO3 forms an ohmic contact increasing
the built-in field in the devices. Therefore, without the MoO3 layer the
built-in field would be reduced and the overall solar cell performance
35
might be degraded. Regarding these factors above, the MoO3 is a
crucial layer in the fabricated perovskite solar cell for the hole
extraction layer to enhance the solar cell performances.
36
Figure 2.5. The current density−voltage (J−V) characteristic of the
device without the MoO3 layer. The device structure is ITO(150
nm)/NPB (20 nm)/perovskite (320 nm)/C60 (50 nm)/BCP (8 nm)/Al
(100 nm).
37
2.4.1.2 Function of the NPB layer
In MAPbI3, the free carriers are dominantly generated under the light
bias [52,53]. These generated charge carriers diffuse to either anode or
cathode. Therefore it would be needed the charge blocking layers to
collect the desired charges at the electrodes selectively. In order to
block the undesired charges, the energy levels should be taken into
account. In the perovskite solar cell system, since the CB of MAPbI3 is
-3.9 eV, the electron blocking layer should possesses the CB or LUMO
level lower than -3.9 eV. In this regard, the NPB layer, which possesses
the LUMO level of -2.2 eV, will act as an efficient electron blocking
layer enhancing the charge collection efficiency. Fig. 2.6 shows the
J−V characteristic of the device without NPB layer. The device
structure is ITO (150 nm)/MoO3(5 nm)/perovskite (320 nm)/C60 (50
nm)/BCP (8 nm)/Al (100 nm). The device showed the PCE of 6.4%,
JSC of 11.1 mA/cm2, VOC of 0.78 V and FF of 0.74.
38
Figure 2.6. The current density−voltage (J−V) characteristic of the
device without the NPB layer. The device structure is ITO(150
nm)/MoO3(5 nm)/perovskite (320 nm)/C60 (50 nm)/BCP (8 nm)/Al
(100 nm).
39
As previously mentioned in this chapter, the one of the possible reason
for the lowering these parameters can be caused by the absence of the
charge-blocking layer. However, since the perovskite layer is known to
be sensitive to the under layer there might be differences in the
crystallinity or the growth modes with the different sub-layers. Fig. 3.6
shows the X-ray diffraction (XRD) patterns of the perovskite film
grown on the ITO/MoO3 (5nm) and ITO/MoO3 (5nm)/NPB (20 nm)
substrates respectively. Both films show the (110) and (220) as the
main peaks at 14.06˚, 28.26˚. However the peak main intensities exhibit
a significant difference with the different substrates. The low peak
intensity on the MoO3 sub-layer indicates that the crystallinity of the
perovskite film is somehow but still oriented along [110] direction.
However, the relative very strong intensity of the NPB sub-layer show
that the high intensity of the main peak which implies the much higher
crystallinity than on the MoO3 sub-layer. The reason why the
crystallinity is degraded on the MoO3 layer is not clear yet. However, it
can be inferred that the NPB layer can be used for a higher crystallinity
in the perovskite film. After publication of this work, P. Schulz et al.,
reported that, the absence of the organic layer between MoO3 and the
perovskite results in forming MoO2. [82] In this work, it is discussed
that this MoO2 induces the interface trap states which hinders the
charge extraction hence resulting in the low FF and JSC. This work also
supports that the NPB layer is necessary for the successful fabrication
40
of the perovskites solar cell.
41
Figure 2.7. X-ray diffraction (XRD) patterns of the fabricated
perovskite film on the different substrates.
42
2.4.2 Device with MoO3/NPB layer
As discussed previously, in chapter 2.4.1, both MoO3 and NPB layers
are needed to enhance the device performance. Therefore, the device
was desiged as ITO/MoO3 (5 nm)/NPB (20 nm)/Perovskite (320
nm)/C60 (50 nm)/BCP(8 nm)/Al(100 nm). The MoO3 and NPB layers
were used as a hole extraction layer, and the perovskite was used as the
light absorbing layer and charge transport layer with its high absorption
coefficient and ambipolar charge transport characteristic as discussed in
chapter 1.2.1. The C60 layer was used as the electron transporting layer
and the bathocuproine (BCP) layer was used as a buffer layer which
mainly acts 1) preventing Al diffusion in to C60 2) preventing a dipole
formation between C60 and Al layer and 3) formation of an ohmic
contact at their interface.[83-85] . The schematic diagram of the relative
energy levels of each layer in this device is shown in fig. 2.8.
43
Figure 2.8. The schematic diagram of the relative energy levels of
each layer in the device without MoO3 layer. Note that the energy
levels are represented against the vacuum level.
44
The 72 devices were fabricated and measured repeatedly from 6
different batches with identical structure. The best performing device
showed the JSC of 18.1 mA/cm2, the VOC of 1.12 V and the FF of 0.68
resulting in the PCE of 13.7% with the average values as JSC of 18.5
mA/cm2, the VOC of 1.05 V and the FF of 0.57 resulting in the PCE of
11.1%. The J−V characteristic and IPCE spectrum of the best
performing device is shown in Fig.2.9 and the parameters are
summarized in table 2.1.The calculated JSC by integrating the IPCE
spectrum using the following equation was 17.8mA/cm2, which agrees
well with the JSC obtained from J−V curve implying that the spectral
mismatch is less than 2%.
sourcelighttheofnsityintelighttheI
dIIPCEqhcJ MAXSC
:
)()(
0
0, λλλλλ
∫=
It is interesting to note that the device exhibits the high VOC of 1.12 V,
which is one of the highest VOC values reported up to now [2,3,5,8].
The high VOC indicates that MoO3/NPB structure works efficiently as a
hole extraction layer minimizing the voltage loss. This high VOC is
attributed to the good alignment of the HOMO level of NPB to the VB
edge of MAPbI3. The open circuit voltage is higher than the devices
with spiro-OMeTAD (VOC of 0.85 V and HOMO level of -5.0 eV) and
45
spiro-TTB (VOC of 1.07 V and HOMO level of -5.3 eV) as the HTL in
the vacuum processed perovskite solar cells reported in the reference
24. One can note that the open circuit voltage increased as the HOMO
level of the HTM is getting closer to the VB edge of MAPbI3 in the
vacuum processed solar cells as expected.
46
Figure 2.9. (a) The current density-voltage (J−V) characteristics and
(b) incident photon-to-electron conversion efficiency (IPCE) spectrum
of the best performing perovskite solar cell.
47
PCE (%)
JSC (mA/cm2)
VOC (V) FF
Best device 13.7 18.1 1.12 0.68
Average 11.1 18.5 1.05 0.57
Table 2.1 Perovskite solar cell performance of the best performing
device and the average values of the 72 devices from 6 different
batches.
48
2.4.2 Reproducibility
Fig. 2.10 displays the histograms of (a) PCE (b) JSC (c) VOC and (d) FF
of the 72 devices from 6 different batches. It is shown that the JSC and
VOC are distributed within 17.2 mA/cm2 ~ 19.5 mA/cm2 and 0.98 V ~
1.12 V respectively, exhibiting small deviation within approximately
7% from the average values. The FF values show a relatively wide
distribution, 0.39~0.68, hence causing the similar distribution of PCE
values, 7.1%~13.7%. The origin of this variation of the FF’s is not clear
yet. Still the variation of the performance of the solar cells fabricated
using the vacuum process is fairly narrow compared to the normal
solution processed perovskite solar cells
49
Fig. 2.10. Histogram plots of the solar cell parameters; (a) Power
conversion efficiency (b) short-circuit current (c) open circuit voltage
(d) fill factor of the 72 devices from 6 different batches.
50
2.4.3 Hysteresis
Fig. 5.1 shows the J–V characteristics with the different scan
directions. The scan step was 0.02 V and the step of the each voltage
was 300 ms. As shown in fig. 5.1, the vacuum processed perovskite
solar cell showed the hysteresis. The main difference caused from the
FF, which showed 0.62 in forward scan, short circuit to open circuit
direction, and 0.56 in the reverse scan, open circuit voltage to short
circuit direction. On the other hand, the JSC values were 18.1 mA/cm2
and 17.1 mA/cm2, VOC values were 1.09 V and 1.07 V for the forward
and reverse scans respectively, which showed the less difference than
FF. These different scan directions result in the differences of 6% in
JSC, 1.9% in VOC, 11% in FF and 17% in PCE. It has been reported that
in the mesoscopic structure the hysteresis is observed as well as in the
planar heterojunction structure the hysteresis might be observed. The
FF degradation in the reverse scan implies that the generated charge
carriers are not extracted to the external circuit and the reasons are not
clear yet. The plausible origins would be discussed in the next chapter.
,
51
Fig. 2.11. The current density-voltage (J−V) characteristics of a
device with the MoO3/NPB layer for different scan directions. The
device structure is ITO (150 nm)/MoO3 (5 nm)/NPB (20 nm) MAPbI3
(320 nm)/C60 (50 nm)/BCP (8 nm)/Al (100 nm).
Table 2.2 The solar cell parameters of the device with the
MoO3/NPB layer shown in fig. 5.1 with different scan directions.
Scan directions
PCE (%)
JSC (mA/cm2)
VOC (V) FF
Forward 12.1 18.1 1.09 0.62
Reverse 10.3 17.1 1.07 0.56
52
To investigate the effect of the HTLs on the hysteresis behaviour,
the devices without MoO3 or NPB layers were measured in different
scan directions of the J–V characteristic. As shown in fig. 5.2 the
device without MoO3 layer shows the hysteresis as well as in the case
of the device shown in fig. 5.1, with the MoO3/NPB layer. The solar
cell parameters were differed with difference scan directions, JSC of
2.3% of VOC, 10% of FF and 12.5% of PCE. In addition, the device
without NPB layer showed the hysteresis as well shown in fig. 5.3. In
the similar way to the device without MoO3 layer, the differences of the
JSC, VOC, FF and PCE were 4.5%, 12%, 1.3% and 7.8% respectively. It
is interesting to note that unlike to the previous cases, the FF showed
the least variation in different scan directions. In addition, the FF value
in the case of the without NPB, is the highest among the devices with
MoO3/NPB or NPB layer in the fabricated solar cell. The value 0.74
and 75 in the fig. 5.3, is even higher than the best performing device
with PCE of 13.7% which shows the FF of 0.68. Regarding these facts,
the higher fill factor gives smaller hysteresis, and the parameter
affecting the fill factor would be the one of the crucial reasons for the
hysteresis.
53
2.7. Summary
In summary, we have demonstrated the fully vacuum-processed
perovskite solar cells with high efficiency and reproducibility. The best
performing device showed PCE = 13.7%, JSC = 18.1 mA/cm2, VOC =
1.12 V, FF = 0.67 and the reproducibility is higher than the normal
solution processed perovskite solar cells. Importantly the considerably
high VOC value was obtained by employing the MoO3/NPB layer as the
hole extraction layer. This high VOC is attributed to the alignment of
HOMO level of the NPB to the VB edge of MAPbI3. The fact that the
MoO3/NPB layer is widely used in OPVs/OLEDs implies that
technologies developed for vacuum processed OLEDs/OPVs can be
successfully applied in perovskite solar cells to accelerate the
development of the perovskite solar cells. In addition, since the vacuum
deposition process is free from the materials restriction by their
solvents, it is a promising tool to apply the various charge transport
materials in the layered structures.
54
Chapter 3
Composition-controlled organometal halide
perovskite via MAI pressure in vacuum co-
deposition process
3.1 Introduction
The vacuum co-deposition is one of the promising methods for growing
perovskite films because the high purity of materials and easy
controllability without effects of solvents or the atmosphere ensure the
high quality of the films with good reproducibility [23–29]. In addition,
since the vacuum process does not affect under-layers, whereas the
solution process limits the under-layers because of the solvent effect of
the top layer, it can be readily employed to optimize the device
architectures with various charge transport layers. Unlike vacuum
sequential deposition, the vacuum co-deposition process does not
require a substrate heating process; thus, a room-temperature process is
easily achievable. However, considering there have been over
thousands papers published in the organic/inorganic hybrid perovskite
field, a few groups have reported the vacuum co-deposition process
[29–34]. The reasons are probably the difficulties of controlling MAI in
55
the vacuum chambers, because MAI increases the vacuum pressure and
it is difficult to calibrate the thickness of MAI and, consequently, the
deposition rates because of the poor adsorption property of MAI
[24,25,30-32,43-48]. Effective control of deposition rates of MAI
would be key for the growth of the perovskite films, because the
compositions significantly affect the properties of the perovskite films.
With the solution processes, there have been various reports about the
effects of the compositions on the properties of the perovskite films,
such as the morphologies, grain sizes, electrical and optical properties,
and device performances [86-91]. In these works, the compositions
were controlled using different precursor ratios between MAI and PbI2
in one-step depositions or different concentrations of MAI solutions in
two-step depositions. However, in the vacuum co-deposition process,
only limited information about the effect of the composition on the
perovskite films is available [39,46,91]. Therefore, introducing an
effective method to control MAI, and establishing a framework for the
effects of the compositions on perovskite in a vacuum process would be
significant.
In this chapter, we report an effective method for controlling the
compositions of the perovskite films in a vacuum co-deposition process
using the working pressures monitored by a vacuum gauge. The
compositions of the perovskite were able to be adjusted with the
working pressures of MAI. Using this method, the properties of the
56
films with various compositions were revealed; they showed significant
differences under the different working pressures. Furthermore, we
show the application of the fabricated perovskite films to solar cell
devices composed of molybdenum oxide MoO3, NPB and C60 layers
as the charge transport layers via the all-vacuum process. Optimum
pressure of MAI resulted in, the maximum power conversion efficiency
of 14.5% with good reproducibility.
3.2 Experimental
3.2.1 Perovskite evaporation system
Fig. 3.1 shows the schematic illustration for the vacuum evaporator
system for the perovskite films. Perovskite layers were grown by co-
deposition of PbI2 and MAI where the deposition rate of PbI2 was fixed
at 0.5 Å/s and the pressures of MAI was varied as a deposition
parameter. The deposition rates and vacuum pressures were monitored
by a crystal thickness sensor (INFICON, 5 MHz) and an ionization
gauge (Varian 572, Agilent Technologies), respectively. A 2 nm thick
PbI2 layer was deposited before heating up the MAI source. When MAI
was heated in the chamber, the vacuum pressure (working pressure)
was gradually increased, and it was heated until the vacuum pressure
57
reached 0.6, 1.7, 3.2, 4.1, 5.1, 6.5, and 8.3 × 10−5 torr. The relative gas
sensitivity (gas correction factor) was set to 1.0 which corresponds to
the value for N2. The pressures were maintained within ±0.1 torr from
the setting pressures for 1 h during the deposition by controlling the
input power of the heating module of the MAI source manually. The
perovskite layers were formed without annealing.
58
Fig. 3.1. Schematic Fig. of the vacuum co-deposition system for the
perovskite layer.
59
3.2.2 Film characterization
The UV-vis absorption and reflectance spectra of the films were
recorded with a Varian Cary 5000 UV-vis spectrophotometer. AFM
topographic images of the perovskite film on the ITO/MoO3/NPB
substrate were taken using a PSIA XE-100 scanning probe microscope
in noncontact mode. XRD measurements were performed on a D8
Advance diffractometer (Bruker) using Cu Kα radiation. The structure
of the devices was ITO/MoO3 (5 nm)/NPB (20 nm)/perovskite/C60 (50
nm)/BCP (8 nm)/Al (100 nm), with an active area of 4 mm2. After the
deposition, the devices were encapsulated using an epoxy resin with
glass cans in a N2 environment. The J-V characteristics were measured
under 100 mW/cm2 of simulated AM 1.5G sunlight using a Newport
(91160A) solar simulator, and recorded using a Keithley 237 source
measurement unit at room temperature. The light intensity was
calibrated using a standard Si-solar cell (NREL). The general scan step
of the J-V characteristics was 0.02 V at intervals of 0.3 s for each step
(0.067 V/s), and the scan direction was from negative to positive
voltage. For the experiment involving changing the scan rates, the
various scan steps were 0.1, 0.08, 0.04, 0.005, and 0.001 V, which
resulted in scan rates of 0.333, 0.267, 0.133, 0.033, 0.017, and 0.003
V/s, respectively. The IPCE was measured using a 1000 W Xe lamp
combined with a monochromator, and its intensity was calibrated with
60
a Si photodiode. The IPCE was measured without light bias under the
short-circuit condition using a lock-in amplifier with monochromatic
light from the chopped Xe lamp with 1 kHz. The EDX and SEM data
was measured using a MERLIN Compact (FE-SEM).
3.3 Results and discussion
3.3.1 Working pressure and the thickness
As shown in Fig. 3.1, the deposition rate of PbI2 was monitored by
sensor 1, and was fixed at 0.5 Å/s. When MAI is deposited, sensor 2
reads the rates of both PbI2 and MAI, while sensor 1 reads the rate of
PbI2. The vacuum pressure (working pressure) read by the ionization
gauge increases when MAI is thermally evaporated as previously
reported [24,30,31,39,46] The working pressure was maintained
constant by the controlling the temperature of the MAI crucible. Fig.
3.2 shows the thicknesses or the deposition rates of the perovskite films
fabricated under the different pressures with the fixed PbI2 deposition
rate for 1 h. Overall, the thicknesses increased from 180 to 320 nm as
the pressure increased. However, the thicknesses were maintained
constant when the working pressure increased from 4.1 × 10−5 torr to
61
6.5 × 10−5 torr. The reason why there are plateaus in the figure is not
clear at this moment and requires further study.
62
Fig. 3.2. Thickness and deposition rate of the perovskite films under
different working pressures deposited for 1 h with the same deposition
rate of PbI2 as 0.5 Å/s. The first data point (2 × 10−6 torr) represents
PbI2 only film
63
3.3.2 Working pressure and structural property
The X-ray diffraction (XRD) patterns of the fabricated perovskite
films are shown in Fig. 3.3. The main peaks, (110) and (220) planes, of
the tetragonal phase (space group I4/mcm) of the perovskite appeared
at all the pressures as previously reported [34, 76-78]. The intensities of
the main peaks increased until the pressure reached 6.5 × 10−5 torr, and
then decreased at 8.3 × 10−5 torr, as well as the calculated crystal size
from the full-width at half-maximum (FWHM) as shown in Table S1.
In Fig. 2b, we show that the peak of the (001) plane of PbI2 appears at
the low pressures. The intensity of this peak of PbI2 gradually
decreased as the pressure increased, and this peak had almost
disappeared at 4.1 × 10−5 torr. Therefore, it can be inferred that at the
low pressures, the amount of MAI is insufficient to convert all the PbI2
to the perovskite and the perovskite and PbI2 are homogeneously
dispersed in the film.
64
Fig. 3.3. (a) XRD patterns of the perovskite films under different
pressures on the indium tin oxide/MoO3 (5 nm)/NPB (20 nm)
substrate. (b) Magnified image of the XRD patterns in red square
region in Fig. 2a.
65
3.3.3 Working pressure and absorbance
Fig. 3.4(a) shows the absorbance spectra of the fabricated perovskite
films on the glass substrates. The absorption edge of PbI2 is ~540 nm,
and the absorbance after this wavelength of the PbI2 film is attributed to
the reflectance of PbI2 as shown in Fig. 3.5 and in reference 37. Under
the low working pressures, 0.6–3.2 × 10−5 torr, the absorbance at 540
nm increased gradually causing the red shift of the absorption edges.
Accordingly, determining the absorption edges became difficult,
because the films were in homogeneously blended with PbI2 and
perovskite, as shown in Fig. 3.2. At the pressures of 4.1–6.5 × 10−5 torr,
the absorbances apparently increased for all wavelengths and the
absorption edges shifted to ~780 nm, indicating that perovskite with a
band gap of 1.55–1.60 eV was formed [92]. At the pressure of 8.3 ×
10−5 torr, the absorbance increased further owing to the increased
thicknesses. Fig. 3.4(b) shows the absorbance at 550 nm, near the
absorption edge of PbI2, at different pressures. As shown, the increase
in absorbance at 550 nm with the pressure indicated that the films were
optically changed from PbI2 to perovskite, and this tendency was
similar to the change in thickness shown in Fig. 3.2. Fig. 3.4(c) shows
the obvious color changes of the films caused by the shift of the
absorption edges.
66
Fig. 3.4 (a) Absorbance of the perovskite film at various pressures on a glass substrate. The thicknesses are indicated in the brackets. (b) Absorbance at 550 nm of the fabricated films. (c) Color of the perovskite films. From the left, the films are PbI2 only, 0.6, 1.7, 3.2, 4.1, 5.1, 6.5, and 8.3 × 10−5 torr deposited films.
67
400 500 600 700 8000
20
40
60
80
100 Glass/PbI2 (180 nm)
Refle
ctan
ce (%
)
Wavelength (nm)
Fig. 3.5. Reflectance of PbI2. The incident beam is tilted 7° toward the substrate
68
3.3.5 Working pressure and morphological changes
Fig. 3.6 shows the atomic force microscopy (AFM) images of the
perovskite films grown on the same substrate shown in Fig. 3.2. As
shown in Fig. 3.6(a), the deposited PbI2 film shows a root mean square
(RMS) roughness of 7.5 nm and relatively high peak-to-valley value of
118 nm considering the thickness of the film, which is caused by
partially protruded areas. These values decreased with the incorporation
of MAI, and the RMS roughness and peak-to-valley values decreased
to 3–5 nm and 33–68 nm, respectively, in the low-pressure-fabricated
film shown in Fig. 3.7 and d. At the pressure of 4.1 × 10−5 torr, similar
to the tendencies of the thickness and absorbance, a radical change in
the morphology occurred with the increased particle sizes, and the
RMS values increased to ~12 nm. The particles seemed slightly sharper
at 5.1 × 10−5 torr with a negligible change in the RMS values, and the
particles apparently became large upon a further increase in the
pressure to 6.5 × 10−5 torr. At the pressure of 8.3 × 10−5 torr, the
particles appeared to have irregular shapes compared to the previous
cases and gave the highest RMS roughness values. As expected, an
overly excessive amount of MAI in the films caused the poor
morphologies of the perovskite films. The tendency of these changes in
the particle sizes corresponds to the calculated crystal sizes from the
XRD data, shown in Fig. 3.3. Additional information about the
69
morphologies, RMS values, and three-dimensional images are
presented in Fig. 3.6, 3.7 and 3.8.
70
Fig. 3.6. AFM images of the perovskite films with different pressures
grown on an indium tin oxide/MoO3 (5 nm)/NPB (20 nm) substrate:
(a) PbI2, (b) 0.6 (c) 1.7 (d) 3.2 (e) 4.1, (f) 5.1 (g) 6.5 and (h) 8.1 × 10−5
torr.
Fig. 3.7. 3D- AFM image of the perovskite films shown in Fig. 3.6
Fig. 3.8. Scanning electron microscopy image of the perovskite films
shown in Fig. 3.6. The scale bars represent 1 micrometer.
71
3.3.6 Device performances
Fig. 3.9 shows the current density-voltage (J-V) characteristics of the
perovskite solar cells at the different pressures. The device structure is
indium tin oxide (ITO)/MoO3 (5 nm)/NPB (20 nm)/perovskite/C60 (50
nm)/bathocuproine (BCP) (8 nm)/Al (100 nm). The structure is
identical to that used in a previous work, where all the layers were
deposited by vacuum thermal deposition [30]. The MoO3 and NPB
layers are used as hole transport layers, the C60 layer is used as an
electron-transporting layer, and BCP is used as a buffer layer.
Interestingly, the performances differed significantly with the pressure
of MAI. As the pressure increased from 0.6 × 10−5 torr, the JSC
increased and showed a remarkable change at 4.1 × 10−5 torr, similar to
the previously discussed properties of the films. Therefore, it can be
inferred that perovskite was properly formed at certain pressures with
the appearance of considerable changes in the physical properties
discussed above, and the film works efficiently as an absorber in the
solar cells. Upon further increase of the pressure to 5.1 × 10−5 torr, the
JSC was maximized and decreased after this pressure. The open-circuit
voltage (VOC) values showed virtually no change until the pressure of
5.1 × 10−5 torr and then decreased after this pressure as well. The
values of fill factor (FF) showed a tendency similar to those of the JSC
and VOC, exhibiting the highest value at the pressure of 5.1 × 10−5 torr;
72
hence, the PCE was maximized at this pressure. The best-performing
device showed a PCE of 14.1%, JSC of 19.7 mA/cm2, VOC of 1.05 V,
and FF of 0.69. Fig. 3.9(b) shows the incident photon-to-current
conversion efficiency (IPCE) spectra at the different pressures. The
different shapes in the IPCE spectra were probably caused by the
different optical properties, refractive indices, and morphologies
[50,51]. The values of experimental JSC and integrated JSC from the
IPCE spectra are tabulated in Table S3. At the pressure of 0.6 and 5.1 ×
10−5 the deviations of these values were less than 5% implying that the
spectral mismatch is less than 5%. However, at the other pressures,
especially at 3.2 × 10−5 torr and 8.3 × 10−5 , the experimental JSC values
showed relatively large deviations. The reason is not clear yet, but it
may be attributed to the changes in the recombination mechanisms in
the different compositions.
73
Fig. 3.9 (a) Current density-voltage (J-V) characteristics of the fabricated devices at the different pressures. (b) IPCE spectra of the fabricated perovskite solar cells.
.
74
3.3.7 Origin of low IPCE
Fig. 3.10 shows the IPCE spectrum of selected from Fig. 3.9
representing the low pressure, middle pressure and high pressure
fabricated device for 1.7, 5.1 and 6.5 × 10−5 torr respectively . As
shown, the low pressure fabricated device shows small IPCE around
long wavelength region, λ= 650 nm, whereas the high pressure one
shows relatively small IPCE around short wavelength region, λ= 450
nm . The simulated electric fiend intensity using transfer matrix method
based on the refractive indices of the materials composed the device is
shown in Fig. 3.10 (b) and (c). The case for λ=450 nm shows Beer-
Lamber regime and the λ=650 nm shows cavity interference regime due
to the absorption differences of the perovskite layer. It is know that the
low pressure, MAI deficient condition cause the perovskite as n-type.
Therefore, the holes generated from the near HTL side maybe collected
whereas the holes generated near around ETL from the long
wavelength, 650 nm may recombine during the transporting the n-
type perovskite layer [93]. On the contrary, the high pressure fabricated
device, which shows p-type property. Therefore, as shown in Fig.
3.10(b), the electrons generated near around HTL side by shot
wavelength, ~450 nm would recombine during transporting through the
p –type perovskite layer. These would be the plausible reason for the
low IPCE of the low and high pressure fabricated films under long and
75
short wavelength respectively.
76
Fig. 3.10 (a) IPCE spectrum selected from Fig. 3.9 for low, optimized, high working pressure fabricated device with short (450 nm) and long (650 nm) wavelength. (b) Simulated electric field in the device of short (450 nm) (c) and long (650 nm) wavelength.
.
77
3.3.8 Reproducibility
In order to check the reproducibility of the vacuum-pressure-based
control, additional batches were fabricated under the optimized
conditions. As shown in Table 1, the average PCE of 23 devices from
three batches was 12.7% (standard deviation (s.d.) ±0.84%). In addition,
considering the other parameters such as JSC, VOC, and FF that exhibit
the reasonably small standard deviations shown in Table 1, the
vacuum-pressure-based control results in the reproducible results. Fig.
3.11(a) shows the hysteresis and Fig. 3.11(b) displays the scan-rate-
dependent behavior of the solar cell fabricated under the optimized
condition, 5.1 × 10−5 torr. As shown in Fig. 3.11(a), it is worth noting
that the J-V curve shows negligible changes with the different scan
rates and even slightly high performances at a slow scan rate, 3 mV/s,
which would be closer to the steady state for the measurement than the
fast scan rates [94]. With this scan rate, 3 mV/s, the best-performing
device showed increased photovoltaic parameters: JSC of 20.1 mA/cm2,
VOC of 1.00 V, and FF of 0.72 resulting in a PCE of 14.5%. The
average values and standard deviations of PCE, JSC, VOC, and FF with
this scan rate were 13.4% (s.d. ±0.78), 19.1 mA/cm2 (s.d. ±0.74), 1.02
V (s.d. ±0.02), and 0.65 (s.d. ±0.04), respectively, with the same
devices and batches shown in Table 3.1.
78
Pressure
(×10−5 torr)
PCE
(%)
JSC
(mA/cm2)
VOC
(V) FF
0.2
(only PbI2) 0.04
(±0.002) 0.1 (±0.01) 0.91 (±0.003)
0.30 (±0.002)
0.6 1.8 (±0.3) 3.6 (±0.4) 1.07 (±0.02)
0.48 (±0.02)
1.7 3.9 (±1.5) 7.6 (±2.6) 1.08 (±0.03)
0.46 (±0.06)
3.2 4.9 (±0.2) 9.0 (±0.1) 1.05 (±0.003)
0.52 (±0.02)
4.2 10.7 (±1.2) 17.6 (±0.5) 1.07 (±0.02)
0.57 (±0.05)
5.1 12.7 (±0.8) 18.5 (±0.6) 1.05 (±0.02)
0.65 (±0.04)
6.5 6.2 (±1.8) 11.8 (±1.3) 0.95 (±0.01)
0.54 (±0.13)
8.3 0.4 (±0.02) 1.11 (±0.06)
0.89 (±0.02)
0.42 (±0.02)
(± standard deviation)
Table 3.1. Average photovoltaic parameters of the fabricated
perovskite solar cells. The values were extracted from 4–8 cells (23
cells for the cells fabricated at 5.1 × 10−5 torr).
79
Fig. 3.11 (a) Hysteresis of the fabricated solar cell fabricated under
the optimized pressure, 5.1×10-5 torr. (b) J–V characteristics at the
different scan rates of the device fabricated under optimized pressure,
5.1×10-5 torr .
80
3.3.9 Composition measurement by EDX
Fig. 3.12 displays energy-dispersive X-ray spectroscopy (EDX) data
of the fabricated perovskite films directly indicating how the working
pressures affect the compositions in the perovskite films. The ratio of I
to Pb increased with the pressure. At the low pressures, the ratio
showed relatively small changes and began to increase considerably at
the pressure of 4.1 × 10−5 torr, which is analogous to the other physical
properties discussed above. Therefore, it can be concluded that the
working pressure of MAI can be an efficient indicator to control the
composition of the perovskite in the vacuum co-deposition process.
Further study is required for the quantitative analysis of the growth
mechanism of the perovskite film under vacuum.
81
Fig. 3.12. Atomic ratio of iodine to lead measured by EDX for the
fabricated perovskite films.
82
3.4 Summary
In summary, we have demonstrated an effective method to control
the composition of MAI in perovskite films for vacuum co-deposition.
The increased working pressure of MAI in the vacuum chamber can be
a proper indicator for controlling the composition in the perovskite
films. The thicknesses, absorbances, XRD spectra, morphologies,
device performances, and compositions changed significantly with the
working pressure of MAI. At the optimum pressure, the device showed
a maximum efficiency of 14.5% with good reproducibility, and all of
the layers were deposited under vacuum. These results will provide a
useful guide for the fabrication of perovskite films using the vacuum
co-deposition process.
83
Chapter 4
Growth characteristics of MAI on PbI2 in vacuum
process
4.1 Introduction
Following Liu’s successful application of the vacuum process to the
perovskite solar cell, several groups have reported the perovskite solar
cells using vacuum co-deposition process [23-25, 30-42]. Most of these
groups commented on difficulties of controlling the MAI in vacuum. It
is known to be difficult to calibrate the thicknesses of deposited MAI
due to the gas-like behaviors in vacuum chamber and the rough
surfaces with poorly adsorbed MAI films [24, 25, 30-33, 43-46]. These
problems hinder an accurate monitoring and controlling the MAI in
vacuum process. To resolve this issue, it is important to understand the
behavior of MAI in vacuum, how it adsorbs on different surfaces in
vacuum. In this paper, we report the adsorption mechanism and kinetics
of MAI in vacuum process. MAI shows surface dependent adsorption
characteristics and it is not fully explained by only chemisorption.
Initial PbI2 layer induces enhanced physisorption of MAI on MAI
surface, examined by comparative adsorption experiments on quartz
84
crystal microbalances (QCMs) and scanning Kelvin probe microscopy
(SKPM). These results suggest that the ferroelectricity of perovskite
formed by reacting with adsorbed MAI triggers the adsorption of polar
molecules such as MAI to increase the adsorption rate, which is
proposed as the mechanism for the MAI adsorption in vacuum.
4.2 Experimental
4.2.1 Film fabrication
PbI2 (x-nm)/MAI films The ITO-coated glass were cleaned with acetone
and isopropyl alcohol. After PbI2 (Alpha aser) evaporated on the
substrates, MAI (Jida Rubibo Optoelectronic Tech. 2 times purifying
by sublimation graded) was heated until it reaches 7 × 10−5 torr,
monitored by ionization gauge (Varian 572, Agilent Technologies) and
then the substrates were exposed to MAI vapor for 5, 8 and 25 min. For
the accurate control the MAI, the same amount MAI source, 0.80g,
was carefully measured and loaded in a crucible through a nitrogen-
filled glove box. The temperature was controlled by PID control (SJ
Power, STP-1500) and after reaching the desired working pressure, the
temperature was manually controlled to maintain the working pressure
constant.
85
4.2.2 QCM Analysis
The QCMs (INFICON, 5 MHz) were monitored by crystal oscillation
type deposition controller, (CRTM-9000, ULVAC). When the bare
QCMs were loaded for sensor 1 and 2, MAI was deposited and it was
calibrated to read same thickness by adjusting the tooling factor for
sensor 11 to be, 0.877 from the thickness difference shown in Fig. S1,
with while other deposition parameters such as Z-ratio and density
remained same (Z-ratio=1, density=1g/cm3). The PbI2 (Alfa Aesar)
layers were deposited ~1 Å/s under 2×10-6 torr only on the sensor 2.
The two sensors, exposed to MAI at the same time for 25 minutes with
different deposited PbI2 thicknesses on the QCM, sensor 2. The
adsorbed weights are calculated from the monitored thicknesses using
equation ∆f=Cf ∆m where ∆f is frequency change, Cf is sensitivity
factor for 5 MHz AT-cut quartz crystal, 56.6Hzμg-1cm2 and ∆m is
mass weight change per unit area, (g/cm2). In our experiment, the
∆f/f<0.005, therefore it is able to apply the equation above assuming
the variation from z ratio is negligible.
86
4.2.3 Characterization
The thicknesses of the films measured by a profilometry (KLA-
Tencor Alpha-Step IQ). The thickness are measured 3~5 points in the
film and averaged in ambient condition. The topology, phase and
SKPM images were measured by the XE-100 (Park systems) under
ambient condition at room temperature using pt-coated ElectriTap300g
(Budget sensors) with force constant 40 N/m. The SKPM measurement
were carried out in non-contact mode, using scan parameters as VAC=2
V, resonance frequency of 17 kHz and scan rate for 0.5 Hz. X-ray
diffraction (XRD) measurements were carried out by D8 Advance
diffractometer (Bruker) using Cu Ka radiation. The steps were 0.04
degree with exposure time for 1 second for each step.
4.3 Results and discussion
4.3.1 Thickness change and XRD depending on sub-layers
Table 1 displays the thicknesses of vacuum-deposited MAI on different
substrates in a same batch for 60 min under 7×10-5 torr. Interestingly,
the thicknesses are remarkably varied depending on the presence or
absence of PbI2 layer whereas relatively small variations on the other
substrates. The measured thicknesses of MAI on PbI2 layer are ca. ~2
87
times thicker than the substrates without PbI2 initial layers. It is
speculated that this variation of MAI on different substrates could be
the reason why it is difficult to calibrate the thickness of MAI
accurately, as well as to control the deposition of MAI and/or MAPbI3
in vacuum process as previously reported [24, 25, 30-33, 43-46]. The
deposited film thicknesses depend also on the thickness of the initial
PbI2 players as shown in Fig. 4.1. The initial thickness of PbI2 layers
were varied from 0 (ITO surface) to 200 nm and these substrates were
exposed to MAI vapor for 60 minutes at a pressure of 7×10-5 torr in a
same batch. The black and red lines indicate that the total thickness and
thickness changes (∆d) between the MAI/PbI2(x-nm) films and the
initial thicknesses of the PbI2 layer, respectively. Surprisingly, only 2
nm of PbI2 layer results in 2 times thicker film than the film on ITO
surface without PbI2 layer. The 2 nm of PbI2 layer is much thinner than
the adsorbed MAI thickness so that the amount of diffusion of MAI
into PbI2 forming the perovskite to increase the thickness would be
limited. As shown in Fig. 4.1b, apparent perovskite (110) peak at 14.2°
was observed on 20~200 nm of PbI2 layers whereas the MAI/PbI2-2nm
exhibits relatively small perovskite (310) peaks at 31.7°, inferring thin
perovskite layer is formed [95]. The ∆d increases with increasing the
thickness of the PbI2 layer up to 100 nm but decreases when the PbI2
layer is 200 nm thick. X-ray diffraction patterns in Fig. 1b show that
the PbI2 (001) peak at 12.6˚ appears only when the thickness of the
88
initial PbI2 is 200 nm, indicating that unreacted PbI2 remains after the
exposure to MAI under the condition. It can be inferred that the 200 nm
of PbI2 is thick enough to form larger amount of perovskite resulting in
decrease in the thickness change. Also, the adsorbed amount of MAI is
not directly appeared in the ∆d since diffused MAI into PbI2 induces
small volume (or thickness) change compared to intrinsic MAI films.
Therefore, to analyze the adsorbed amount of MAI quantitatively, we
used two QCMs in vacuum as shown in Fig. 4.2. The peak at
12.7°corresponds to PbI2 (001). The peaks at 14.2°, 28.2°, 28.5°,
31.7°, 40.5° and 43.1° correspond to (110) (004) (220) (310) (224) and
(314) of tetragonal phase MAPbI3 perovskite. The peaks at 19.7°, 19.9°
and 26.3° correspond to (002), (101) and (102) MAI [95].
89
Substrate ITO NPB C60 Au PbI2
Thickness of MAI (nm) 72 76 85 86 184
Table 4.1. Thickness of deposited MAI on different substrates. All
the substrates are exposed to MAI for 60 min under 7 10-6 torr. The
thicknesses of the NPB, C60, Au and PbI2 are 20 nm on
ITO(150nm)/glass substrate
90
Figure 4.1 (a) The thickness of MAI/PbI2 films on different initial PbI2 thicknesses (b) X-ray diffraction patterns of the MAI deposited on PbI2 films with different thicknesses
91
4.3.2 Study of deposition kinetics using QCM
The two QCM sensors were calibrated earlier to indicate a same
thickness when MAI is deposited on the bare QCMs (Au-coated) to
exclude influences from geometrical differences between the two
sensors. Then, one of the surface for the sensors was covered by the
PbI2 by thermal evaporation with different thicknesses before exposure
to MAI. Fig. 4.2(b) exhibits the monitored adsorbed weight with time
on the PbI2 (x nm) /QCM. Fig.4.2(b) shows that the final adsorbed
weights increase from 19.6 to 34.9, 48.3, 68.3 and 70.5 μg/cm2 as the
thickness of the PbI2 layer increases. For comparison, the ∆t of the
deposited films by a surface profilometer and adsorbed weight
measured from the QCMs are plot in Fig.4. 2(c). If we assume that the
same amounts of MAI are adsorbed on the QCMs and the substrates,
the average density of the MAI/PbI2(x-nm) films can be calculated and
the results are summarized in Table S1. The calculated density of MAI
intrinsic film deposited on ITO is 2.33 g/cm3, reasonably close to the
reported value, 2.31 g/cm3[96]. In contrast, the average density of the
film increased as the initial PbI2 thickness increases, reaching to 3.96
g/cm3 close to the density of perovskite (4.16 g/cm3) [97] when the
initial PbI2 thickness was 200 nm.
Fig. 4.2(d) shows the deposition rates of MAI on QCM/PbI2(x nm).
The deposition rates increase as the working pressure of MAI increases
92
at the early stage of deposition, reaches the peak values when the
working pressure reaches the desired value (7×10-5 torr). As the
thicknesses of initial PbI2 layer increases, the deposition rates increase
rapidly. At the constant working pressure, the deposition rates decrease
and the rates decrease relatively quickly in as the thickness of PbI2 layer
decrease. Eventually the deposition rates becomes the same value after
different times for different PbI2 thicknesses. The reason why the
overall rates decrease under the constant working pressure is not clear
yet. The increase of the working pressure could be attributed from the
low sticking coefficient of MAI [24, 25, 30-33, 43-46].
93
Fig. 4.2. (a) Schematic figure for comparative adsorption experiment
on QCMs (b) monitored adsorbed weight of MAI on QCM/PbI2(x nm)
94
Fig. 4.2. (c) The measured thickness change and adsorbed weight
and (d) monitored deposition rates and working pressure
95
4.3.4 Hypothesis
The results shown in the deposition rates can be summarized as
follows. 1) As the working pressure increases, the deposition rate
increase. 2) On PbI2, the deposition rate increase rapidly. 3) As the
thickness of PbI2 layer increase, the deposition rate increase rapidly. 4)
The deposition rates decrease under the constant working pressure. 5)
After certain times, all of the deposition rates reach a same value
regardless the thickness of PbI2 layers. Based on these results, it can be
hypothesized or speculated as follows. 1) As the working pressure
increase, the impingement rate of MAI would be increased which
means the number of striking MAI molecules per unit area is increased.
This explains reasonably why the deposition rates increase under
increasing working pressure since the deposition rate is proportional to
the impingement rate. 2) On PbI2, the reaction between MAI and PbI2
would occur. It can be speculated that this reaction enhances the
adsorption property since once the bonding (e.g. ionic bonding for the
perovskite) formed, the desorption would not be easily happened. This
reaction of MAI and PbI2 could be the reason why deposition rate of
MAI is faster on PbI2 layer. 3) As the thickness of PbI2 increase, the
diffusion length of MAI would can be increased. It can be speculated
that if the diffusion occurs quickly, the thicker PbI2 would induce a
faster deposition rates than the thinner one. 4) Once the perovskite
96
formed on the PbI2 surface, the surface become ferroelectric due to the
perovskite layer. Since the MAI molecule is polar composed of
positively charged MA+ cation and I- anion, the adsorption can be
enhanced by dipole interaction. If this effect is decreased as the
thickness increase this could be the reason for the decreased deposition
rates under constant working pressure. 5) When the dipole effect
diminishes, the deposition rates reach same value regardless the
thickness and with or without PbI2 layers. Fig. 4.3 shows the
summarized hypothesis with schematic figures.
97
Fig. 4.3. Schematic figure of the hypothesis to explain the deposition
parameter changes shown in Fig. 4.2(d).
98
4.3.5 AFM study
The hypothesis discussed in 4.3.4 is involved with adsorption, reaction,
diffusion and thickness change, which is closely related to the surface
of the films. Therefore, we selected the five different MAI deposition
time, 0, 10, 20, 30 and 60 minutes with the 5 different initial PbI2 layers,
0, 2, 20, 100 and 200 nm and investigated the surface using AFM to
prove the hypothesis. Fig. 4.4(a) shows the morphology of the films
with different deposition time depending on the thickness of PbI2 layers
and Fig. 4.4(b) displays the corresponding RMS roughness values for
each film. As shown, roughness on ITO increase gradually from 1.7 nm
to 20 nm until 30 minutes and then maintained similar. For the 2 nm
PbI2 substrate, the initial roughness value is as same as the value of ITO,
1.7 nm. As shown in Fig. 4.7, the film shows uniformly covering the
entire ITO surface from magnified image (0.5μm × 0.5 μm). The
roughness increased rapidly at the MAI deposition time of 10 min, and
it increases to 35 nm until 30 min, showing similar value at 60 min. For
the 20 nm PbI2 substrate, the roughness values are increased from 1.7,
2.5, 24.3, 36.0 and 39.2 nm as the deposition time. For the 100 nm PbI2
substrate, the roughness changes from 4.5(value between 0, 2 nm and
200 nm of PbI2), 6.5, 15.8, 41 and 45 nm. For the 200 nm PbI2 substrate,
the roughness changes from 23, 10, 12, 22, and 30 nm.
99
Fig. 4.4. (a) 3D-topology (5μm × 5μm) of the MAI exposure films
with different times and initial PbI2 thickness and (b) RMS roughness
values extracted from 5μm × 5μm images
100
The value decrease at 10 min, then increases slowly until 20 min. At
30 min, it increased rapidly. If we assume that, the surface of MAI
grown on MAI is rougher than the perovskite it can be deduced that at
the certain times, the MAI growth of MAI would occur and the time
would be shorter as the thickness of PbI2 thinner. In this case, the times
when MAI on MAI growth occur are 0, 10, 20, 30 and 30 mins for 0, 2,
20, 100 and 200 nm of PbI2 layers. Fig. 4.5, 4.6 and 4.7 show that the
topology, phase image and surface potentials of the films with different
scales. The phase images correspond to the topology, without showing
clearly distinctive area inferring the surface is chemically homogeneous.
The changes of the surface potentials will be discussed later.
101
Fig. 4.5. (a) Topology (b) Surface potential and (c) phase images of potentials of
the MAI films (5 𝜇𝜇𝑚𝑚×5 𝜇𝜇𝑚𝑚)
102
Fig. 4.6. (a)Topology (b) Surface potential and (c) phase images of
potentials of the MAI films (1𝜇𝜇𝑚𝑚×1𝜇𝜇𝑚𝑚)
103
Fig. 4.7. (a) Topology (b) Surface potential and (c) phase images of
potentials of the MAI films (0.5 𝜇𝜇𝑚𝑚×0.5 𝜇𝜇𝑚𝑚)
104
4.3.6. Density and thickness analysis
Density of deposited films
Fig. 4.8(a) shows the thickness change measured by surface profiler
and Fig. 4.8(b) shows the density change of the deposited film. The
densities are calculated by the adsorbed mass from QCMs divided by
thickness changes measured by the surface profiler. It is noted that the
amount of deposited of MAI on the substrates and QCMs are same
since substrate holder and QCMs are located at the same approximately
heights, ~40 cm above the MAI source. Since the density of MAI is
lower than the perovskite and PbI2, the thickness change would be
smaller if the adsorbed MAI forms the perovskite. Once the diffusion is
restricted after a certain time, the MAI growth on MAI would occur as
speculated in 4.3.5. Therefore, until certain times, MAI would diffuse
into the PbI2 forming high density and after the certain times the MAI
would grow on MAI forming low-density films. As shown in Fig. 4.8,
the measured density of 0 and 2 nm of PbI2 substrates show similar
value for the reported MAI density, inferring the MAI growth on MAI
occur already at 10 min. This corresponds to the RMS roughness
rapidly increased at 10 min in the case of 2 nm of PbI2. For 20 nm
PbI2substrate, the density is roughly similar to the perovskite at 10 min,
105
then decrease reaching MAI density at 20 min and this also corresponds
to the RMS roughness rapidly increased at 20 min for 20 nm PbI2
substrate. Similarly, for the 100 and 200 nm PbI2 substrates, the
densities show values between PbI2 and perovskite, decreasing within
this range until 20 min. The densities reach similar value to MAI at 30
min, corresponding to the time when rapid RMS roughness increased
discussed in above section, 4.3.5. From these regards, we can define tc,
as the time when the diffusion of MAI is restricted on the surface. The
tc for each substrate is 0, 10, 20, 30 and 30 min for 0, 2, 20, 100 and
200 nm PbI2 respectively.
106
Fig. 4.8 (a) Thickness change and (b) density change of the deposited
films on PbI2 (x nm) films with MAI deposition time
107
Thickness change analysis
As shown in Fig. 4.9, the thickness change of deposited MAI on PbI2
layer in vacuum can be expressed as
. . 2( ) { ( ) ( .)}dep diffd d MAI d MAI d PbI Perov∆ = + − + →
,where Δd is thickness change, d(MAIdep.) is total thickness of
deposited MAI assuming the diffusion is not occurred, d(MAIdiff.) is the
distance of MAI diffusion length and d(PbI2→Perov.) is thickness
change due to forming perovskite from PbI2. As discussed, before tc,
the thickness increase due to forming the perovskite would be dominant.
On the other hand, after tc, the thickness increase due to MAI growth
would be dominant. Hence, the thickness change can be expressed
depending on the time considering tc as follows.
. . 2
. . 2
1) : ( ) { ( ) ( .)}
2) : ( ) { ( ) ( .)}c dep diff
c dep diff
t t d MAI d MAI d PbI Perovt t d MAI d MAI d PbI Perov< < − + →
> > − + →
108
Fig. 4.9. Schematic figure for the thickness change on PbI2 layer in
vacuum process
109
4.3.8 Surface potential analysis
Theory of SKPM
Using the pt-coated conductive tip, the surface potential can be
measured by SKPM. The DC and AC voltages are applied to the tip
resulting in
AC( ) sin( )DC CPDV V V V tω= − + ⋅
where VCPD is contact potential difference between the tip and sample.
The DC voltage nullifying VCPD is tracked by feed-back loop which
means the VCPD , contact potential. The electrostatic force generated by
the voltage inducing the capacitance is
2 2
22
22
1 1( ) 2 4
[ ] sin( )
1 cos(2 )4
12 DC
DC DC CPD AC
DC CPD AC
AC
F F F
dCF V V Vdz
dCF V V V td
d
zdCF
CF Vd
V
z
tdz
ω ω
ω
ω
ω
ω
+ +
= − +
= −
= −
= =
, where the second term with the frequency of ω is extracted by lock-
in amplifier, measuring the VCPD, surface potential.
110
Surface potential analysis
The surface potentials before MAI exposure correspond to the work
function values of ITO and PbI2 As discussed above, 2 nm of PbI2
substrate shows MAI-MAI growth showing rapid increase in roughness
and thickness compared to the thick-PbI2 substrates. In addition, as
shown in Fig. 4.5, 4.6 and 4.7, the phase images are corresponding to
the topology without notably distinctive area in phase image inferring
the surface of the films are homogeneous. Therefore, it can be inferred
that surface potential ~-0.3 eV in 10 min. on 2 nm of PbI2 layer
correspond to the MAI-MAI adsorption regime. The surface potential
of 100 and 200 nm substrates in 10 to 30 minutes of the exposure show
negative value than the 2 and 20 nm of PbI2 substrate and then the
values reach to similar, ~0.3 eV amorously to fact that the deposition
rate reached the similar value.
Validation of the surface potential values
The average surface potential values are summarized in Fig. 4.5. The
surface potentials before the MAI exposure, 0 min should be
correspond to the work function of ITO and PbI2. It is known that the
work function measured by SKPM gives higher value than UPS since
UPS measures the fermi-level edge and low energy cut-off secondary
electrons resulting in minimum value of work function [98]. The
work function of pt-coated tip is -5.0 eV [99], therefore the
111
corresponding work function can be calculated by
CPDWork functionof tip Work functionof sampleV
e−
=−
The calculated work function of ITO and PbI2 is -4.9 and ~ -5.6 eV
and these values are higher than the reported value by UPS [56, 57].
Also if we assume that the surface potential of the films at 60 minutes
correspond to the intrinsic work function of MAI films than the work
function is -4.6 eV which similar level higher value than reported by
UPS [100]. In addition, the surface potentials are measured at least 3
times with different scales then averaged without significant
differences during the measurement. Therefore, it is thought to be the
values are approximately correct and reproducible.
112
Fig. 4.10. (a) Surface potential images (5 𝜇𝜇𝑚𝑚 × 5 𝜇𝜇𝑚𝑚) and (b)
Average surface potential values measured from various scales
113
4.3.9. Growth mechanism of MAI in vacuum
Potential change of MAI
As discussed in the previous section, the surface potential shifted from
-0.3 V to + 0.3 V. As discussed in the AFM study and density/thickness
change analysis part, section 4.3.5 and 4.3.6, the surfaces of the
samples are PbI2, MAxPbI2+x and MAI depending on time or tc. For the
case of 20, 100 and 200 nm, the surface potential at 10 min would be
originated from the work function of the perovskite. However, in the
case of 2 nm of PbI2 layer, the diffusion would be limited as discussed
previously. Therefore, it can be deduced that the surface potential of
MAI is shifted from -0.3 V to + 0.3 V. Fig. 4.11(a) shows why the MAI
potential is changed with thickness. Since the perovskite is ferroelectric,
this effect may order the orientation of polar MAI facing positive
charge out of the surface. As the thickness increase, this dipole effects
would be decreased and diminished after certain time reaching similar
potentials as well as the similar deposition rates shown in Fig. 4.2(d).
Fig. 4.2(b) demonstrates how this change can be measured by SKPM.
As discussed, the ordered MAI molecules on the perovskite shows
positive change facing to the surface, which lowers the surface
potential. Therefore, the contact potential difference, VCPD shift to
negative value and as the thickness increase the surface potential
become close to its intrinsic value showing the VCPD shift to positive
114
value as shown in Fig. 4.2(b). From these results, we suggest dipole
induced adsorption as the mechanism for MAI growth in vacuum
process.
115
Fig. 4.11. (a) Schematic figure for why the MAI potential is
changed with thickness and (b) illustration how the orientation change
of MAI appear in SKPM measurement
116
Schematic figure for growth of MAI on PbI2 in vacuum
Fig. 4.12 shows the schematic illustration for the growth of MAI on the
PbI2 films based on the results discussed above. As explained, MAI
adsorbs faster on PbI2 than on without PbI2 (bare QCM or ITO) and the
adsorption rates gradually decrease. The fast and slow adsorption
regions are denoted by green and gray in Fig. 4.12. As the initial PbI2
thickness increases, the fast-adsorbed MAI region increased as shown
in Fig. 4.2(d), forming perovskite under MAI diffusion as shown in Fig.
4.1(b). The ∆d of MAI/PbI2 films increased as the initial PbI2 thickness
increases until 100 nm, and it decrease when PbI2 is 200 nm. This is
because the diffusion of MAI is not limited on the thick (200 nm) PbI2
forming larger amount of perovskite resulting in ∆ d decreases with
residual PbI2 as shown in Fig. 4.1(b).
117
Fig. 4.12. Schematic illustration for growth of MAI on various PbI2 thickness
with time
118
4.4. Summary
In summary, we have investigated the growth mechanism of MAI in
vacuum. As the thickness of PbI2 layer increase, the deposition rates of
MAI increased rapidly and at the constant working pressure, all of the
deposition rates started to decrease reaching to a same value after
certain times with different initial PbI2 thicknesses. This phenomena
was analysed by atomic force microscopy (AFM) discussing on the
topology, surface potential, thickness and density changes. The PbI2
layer enhances the deposition rates by surface reaction forming
perovskite. This effect last longer as the thickness of PbI2 layer increase
due to the diffusion length of MAI into the PbI2 would longer in the
thicker PbI2 layer. When the diffusion is finished, the MAI growth on
MAI regime starts where roughness and thickness changes rapidly
reaching the density of the deposited film to the MAI density. However,
the surface potential in this regime, MAI growth, is shifted -0.3 V to
+0.3 V especially for the 2 nm PbI2 case. Conclusively, we suggest that
a mechanism for the adosprtion of MAI as follows. Once the
ferroelectric perovskite, MAPbI3 is formed on the surface, the polar
MAI adsorption via dipole attraction resulting in the faster adsorption
rate on MAI surface. As the thickess of MAI increase, this effect
decrease resulting in the similar slow deposition rates.
We believe that this study will be of great interest to those working
119
on the vacuum processed perovskite to enhance the controllability of
MAI behavior in vacuum
Chapter 5
Summary and conclusion
In this thesis, the vacuum processed perovskite solar cells are
reported and as well as the efficient method to control the MAI in
vacuum process for improving the quality of the films. Moreover, the
growth mechanism of MAI was investigated; consequently, we suggest
dipole induced adsorption for MAI on PbI2 (perovskite) in vacuum.
Firstly, in chapter 2, full vacuum processed perovskite solar cell
employing MoO3/NPB, which are typically used in vacuum processed
OLEDs, will be discussed. . The best performing device showed PCE =
13.7%, JSC = 18.1 mA/cm2, VOC = 1.12 V, FF = 0.67 and the
reproducibility is higher than the normal solution processed perovskite
solar cells. Importantly the considerably high VOC value was obtained
by employing the MoO3/NPB layer as the hole extraction layer. This
high VOC is attributed to the alignment of HOMO level of the NPB to
the VB edge of MAPbI3. The fact that the MoO3/NPB layer is widely
120
used in OPVs/OLEDs implies that technologies developed for vacuum
processed OLEDs/OPVs can be successfully applied in perovskite solar
cells to accelerate the development of the perovskite solar cells.
In chapter 3, an effective method for controlling the compositions of
the perovskite films in using the working pressures will be discussed.
The compositions of the perovskite were able to be adjusted with the
working pressures of MAI. Using this method, the properties of the
films with various compositions were revealed; they showed significant
differences under the different working pressures. Furthermore, we
show the application of the fabricated perovskite films to solar cell
devices. Optimum pressure of MAI resulted in, the maximum power
conversion efficiency of 14.5% with good reproducibility.
In chapter 4, the growth mechanism of MAI in vacuum process is
discussed. MAI shows surface dependent growth characteristics. On
PbI2, the deposition rate of MAI increased. Since the diffusion of MAI
increase depending on the thickness of PbI2, this enhanced deposition
rate lasted longer. However, on MAI growth MAI regime, the
deposition rate is still faster than on the surface without PbI2, notably
showed on very thin (2 nm of PbI2) layer. From the surface analysis, we
suggest that the ferroelectricity of perovskite formed by reacting with
adsorbed MAI triggers the adsorption of polar molecules such as MAI
to increase the adsorption rate, which is proposed as the mechanism for
the MAI adsorption in vacuum.
121
The fact that the MoO3/NPB layer is widely used materials in
OPVs/OLEDs implies that a lots of technologies developed for vacuum
processed OLEDs/OPVs can be successfully applied in perovskite solar
cells to accelerate the development of the perovskite solar cells.
Additionally, effective methods to control the MAI is reported with
various physical properties of the perovskite films with controlled
compositions. This will be a good guide line for finding an optimum
condition in vacuum process. Lastly, the detail study on behaviour of
MAI in vacuum process would be of great interest to those working on
the vacuum processed perovskite to enhance the controllability of MAI
behaviour in vacuum.
122
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초 록
유기물/무기물 혼합 페로브스카이트 태양전지는 최근 높은
전력변환 효율을 보이며 매우 많은 주목을 받고 있다. 현재
까지 대부분의 페로브스카이트 태양전지는 용액공정으로 제
작되어왔다. 용액공정을 이용한 페로브스카이트 태양전지의
중요한 주제 중 하나는, 박막의 균일도, 작은 구멍, 수분 및
대기에의 취약성 등을 제어하기 어려움에서 오는 재현성 문
제이다. 진공 증착은 박막 형성 인자들과 수분 및 용매가 없
는 깨끗한 환경에서 증착이 가능하기 때문에 재현성 문제를
해결할 수 있는 가능성이 큰 방법이다. 본 학위 논문에서는
모든 층을 진공으로 증착한 태양전지와, 페로브스카이트르
진공에서 고품질로 재현성 있게 만들 수 있는 방법론과 페
로브스카이트의 전구물질인 Methylammonium iodide (MAI) 의
진공공정에서의 거동을 이해 하기 위한 흡착 특성 및 기작
에 대해 논의하였다.
제 2장에서 전 층을 진공으로 제작한 페로브스카이트 태
양전지를 보고하였다. 기존 진공공정에서 안정적으로 사용되
던 Molybdenum oxide (MoO3)와 N,N′-Di(1-naphthyl)-N,N′-
diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB)를 이용하여 높은
132
개방 전압, 1.12 V, 과 함께 최고 13.7%의 효율을 갖는 태양전
지를 제작 보고하였다. 일반적인 기존 용액공정에 비해 높은
재현성을 보였으며 기존 진공공정에서 사용되던 전하수송층
을 페로브스카이트 소자에 성공적으로 적용한 의미가 있다.
제 3장에서는 진공공정에서 MAI를 효과적으로 제어하기
위한 방법을 제시하였다. 진공에서 MAI를 가열하게 되면 동
작압력이 증가하게 되고, 이것이 페로브스카이트의 조성을
제어 할 수 있는 지시계가 될 수 있었다. 다양한 동작 압력
에서 페로브스카이트의 물성은 크게 바뀌었으며, 압력에 따
른 물성 변화를 체계적으로 보고하였다. 최적화된 압력에서
페로브스카이트 태양전지는 최고 14.5%의 효율과 향상된 재
현성을 보여 진공도에 의한 제어가 성공적으로 이루어 졌음
을 알 수 있었다.
제 4장 에서는 진공에서 MAI의 성막 특성에 대해 논의하
였다. 페로브스카이트 진공공정에서 MAI의 거동을 제어하고
이해하는 것이 중요한데, 이는 성막 특성과 밀접한 관련이
있다. MAI는 표면에 의존적인 흡착 특성을 보였으며 PbI2 위
에서 특히 빠른 증착 속도를 보였다. PbI2와의 반응이 MAI
의 증착 속도를 증가시키며, PbI2안으로 확산을 하는 성질 때
문에 PbI2의 두께가 증가 할수록 이 효과가 오래 지속되었다.
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또한 AFM 분석을 통해 MAI-MAI 성막이 일어나고 있는 구
간에서도 표면 포텐셜이 지속적으로 변하는 현상을 통해 초
기의 PbI2 층이 MAI-MAI의 증착 속도를 빠르게 한다는 현상
을 발견 하였다. 이러한 결과를 토대로 페로브스카이트의 강
유전성이 MAI의 배향을 바꾸며 표면포텐셜의 변화로 인한
쌍극자 인력이 흡착 특성을 강화 시키는 다이폴 유도 흡착
을 MAI의 진공에서의 성막 기작으로 제시하였다.
주요어: 유기물/무기물 혼합 페로브스카이트 태양전지, 전
진공공정, MAI 압력, MAI 흡착
학 번: 2015 – 30180
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CURRICULUM VITAE
Beom-Soo Kim
Department of Materials Science and Engineering
Seoul National University, Seoul, 151-744, Korea
Education and Training
2015.3 ~ Current PH.D. in Materials Science and Engineering
Supervisor: Professor Jang-Joo Kim
Seoul National University, Seoul, Korea
2013.3 ~ 2015.2 M.S. in Materials Science and Engineering
Seoul National University, Seoul, Korea
2012.6 ~ 2013.3 Process Engineer in 3M company of Optical
Systems Division, Korea
2010.6 ~ 2011.6 Study abroad at University of Nottingham,
England
2005.3 ~ 2012.2 B.S. in Advanced Materials Science and
Engineering
Sungkyunkwan University, Seoul, Korea
135
Research Interests
- Metal-halide perovskite and optoelectronic devices physics
- Analysis, optimize and modification vacuum process system
- Kinetics and mechanisms for growth of perovskite films in
vacuum process
Professional Skills
- Design and fabrication of Perovskite and organic electronic
devices: thermal evaporator, sputtering system, glove-box, spin
coater
- Vacuum evaporator system set up, modification and maintenance
- The optoelectronic analysis on organic semiconductor: UV-vis-
NIR absorption spectroscopy, Photoluminescence spectroscopy,
Interpretation of current density-voltage characteristics and
incident photon-to-current efficiency, Impedance spectroscopy,
Photovoltaic parameters measurements, Transfer matrix methods
to calculate optoelectronic properties
- The structural characterization of organic films: Atomic forced
microscopy, Kelvin probe force microscopy, Alpha-step, X-ray
diffraction patterns, XPS, TOF-SIMS, SEM, EDX
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Honors and Awards
- 2014. 10: Best poster Awards
Asian Conference on Organic Electronics, 2014
- 2009. 03: Honorable Merit-based scholarship
Department of Advanced Materials Science and
Engineering, SKKU
List of Publications
1. Beom-Soo Kim, Min-Hyung Choi, Min-Soo Choi and
Jang-Joo Kim “Composition-controlled organometal halide
perovskite via MAI pressure in a vacuum co-deposition
process” * J. Mater. Chem. A, (2016) ,4, 5663-5668
2. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub
Shim and Jang-Joo Kim* “Fully vacuum–processed
perovskite solar cells with high open circuit voltage using
MoO3/NPB as hole extraction layers” Organic Electronics
(2015), 17, 102-106
3. Beom-Soo Kim and Jang-Joo Kim “Growth characteristics
of MAI on PbI2 in vacuum process” to be submitted
4. Min-Soo Choi, Tae-Min Kim, Hyun-Sub Shim, Beom-Soo
Kim, Hyo Jung Kim, and Jang-Joo Kim* “Enhancement of
137
the Fill Factor through an Increase of the Crystallinity in
Fullerene-Based Small-Molecule Organic Photovoltaic
Cells",
ACS Applied Materials & Interfaces, (2015) 7, 9134-9138
List of presentations
International Conference
1. Beom-Soo Kim, Min-Hyung Choi, Min-Soo Choi, Jang-Joo Kim,
"Composition-Controlled Organic/Inorganic Hybrid Perovskite via
Working Pressure of MAI in Vacuum Co-Deposition Process", The
8th International Workshop on Flexible & Printable Electronics
(2016 IWFPE), November 23-24 (November 23), 2016, Korea
(Poster)
2. Beom-Soo Kim, Min-Hyung Choi, Min-Soo Choi, Jang-Joo Kim,
"Composition-Controlled Perovskite Via MAI Pressure in Vacuum
Co-Deposition Process", International Conference on Hybrid and
Organic Photovoltaics (HOPV16), June 28-July 1 (June 29), 2016,
United Kingdom (Poster)
3. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim,
Jang-Joo Kim, "Fully vacuum-processed MAPbI3 perovskite solar
cells with high open circuit voltage using MoO3/NPB layer", The
138
International Symposium on Recent Advances and Future Issues in
Organic Electroluminescence (ISOEL2016), February 17-19
(February 18), 2016, Korea (Poster)
4. Min-Soo Choi, Tae-Min Kim, Hyun-Sub Shim, Beom-Soo Kim,
Hyo Jung Kim, Jang-Joo Kim, "Enhancement of the Fill Factor
through an Increment of the Crystallinity in Fullerene-Based
Small-Molecule Organic Photovoltaic Cells", The International
Symposium on Recent Advances and Future Issues in Organic
Electroluminescence (ISOEL2016), February 17-19 (February 18),
2016, Korea (Poster)
5. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim,
Jang-Joo Kim, "Fully vacuum co-deposited MAPbI3 perovskite
solar cell with 1.12 V of circuit voltage employing MoO3/NPB
layers as a hole transport layers", The 7th International Workshop
on Flexible & Printable Electronics 2015 (IWFPE 2015),
November 4-6 (November 5), 2015, Korea (Poster)
6. Min-Soo Choi, Tae-Min Kim, Hyun-Sub Shim, Beom-Soo Kim,
Hyo Jung Kim, and Jang-Joo Kim, "Enhancement of The Fill
Factor through An Increase of The Crystallinity in Fullerene-based
Small-Molecule Organic Photovoltaic Devices", KJF-ICOMEP
2015, September 6-9 (September 7), 2015, Korea (Poster)
139
7. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim,
and Jang-Joo Kim, "Fully Vacuum Deposited MAPbI3 Perovskite
Solar Cells with High Open Circuit Voltage Using MoO3/NPB
Layers", KJF-ICOMEP 2015, September 6-9 (September 7), 2015,
Korea (Poster)
8. Min-Soo Choi, Tae-Min Kim, Hyun-Sub Shim, Beom-Soo Kim,
Hyo Jung Kim, and Jang-Joo Kim, "Enhancement of fill factor
through increase of crystallinity in fullerene based small molecule
organic photovoltaic cells", 26th International Conference on
Molecular Electronics and Devices (IC ME&D 2015), May 21-22
(May 22), 2015, Korea (Poster)
9. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim
and Jang-Joo Kim, "Fully vacuum-processed MAPbI3 perovskite
solar cells with high open circuit voltage using MoO3/NPB layer",
International Conference on Hybrid and Organic Photovoltaics
2015 (HOPV15), May 10-13 (May 12), 2015, Italy (Poster)
10. Min-Soo Choi, Tae-Min Kim, Hyun-Sub Shim, Beom-Soo Kim
and Jang-Joo Kim, "Enhancement of Fill Factor via Increase of
Crystallinity in Fullerene Based Small Molecule Organic
Photovoltaic Cells Using Copper Iodide as a Templating Layer",
The 6th Asian Conference on Organic Electronics (A-COE 2014),
November 12-14 (November 13), 2014, Taiwan (Poster)
140
11. Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim
and Jang-Joo Kim, "Fully-Vacuum Processed Perovskite Solar
Cells with High Open Circuit Voltage Using MoO3/NPB Layers",
The 6th Asian Conference on Organic Electronics (A-COE 2014),
November 12-14 (November 13), 2014, Taiwan (Poster)
Domestic Conference
1. 김범수, 최민형, 최민수, 김장주, "Composition-controlled
organic/inorganic hybrid perovskite via MAI pressure in vacuum
co-deposition process", 2016 한국고분자학회 춘계학술대회,
April 6-8 (April 7), 2016, Korea (Poster)
2. 김범수, 김태민, 최민수, 심현섭, 김장주, "Fully vacuum-
processed perovskite solar cells with VOC of 1.12 V employing
MoO3/NPB layer", 2015 한국고분자학회 춘계학술대회, April
8-10 (April 9), 2015, Korea (Poster)
3. 최민수, 김태민, 심현섭, 김범수, 김효정, 김장주,
"Enhancement of fill factor via increase of crystallinity in fullerene
based small molecule organic photovoltaic cells using copper
iodide as a templating layer", 2015 한국고분자학회 춘계학술대
회, April 8-10 (April 9), 2015, Korea
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Invited talks
1. Beom-Soo Kim and Jang-Joo Kim "Vacuum Processed Perovskite
Solar Cells", 페로브스카이트 포토닉스 학술대회 (PPC 2017),
November 20-21 (November 20), 2017, Korea, Keynote
2. Hyun-Sub Shim, Beom-Soo Kim, Jang-Joo Kim, "Vacuum
deposited organic and perovskite solar cells", 2016년 한국유기태
양전지학회 동계 학술대회, February 23-24 (February 23), 2016,
Korea
Awards
- Beom-Soo Kim, Tae-Min Kim, Min-Soo Choi, Hyun-Sub Shim
and Jang-Joo Kim, “Best Poster Award”, The 6th Asian
Conference on Organic Electronics, Nov. 12-14, 2014