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  • 530 Polymer Science and Technology Vol. 19, No. 6, December 2008

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    Technology for Hyper-Structure Control of Organic/Inorganic Hybrid (Soonho Lim and Soon Man Hong, Polymer Hybrid Research Center, KoreaInstitute of Science and Technology, P.O. Box 131 Cheongryang, Seoul 130-650, Korea) e-mail: [email protected] (Ji Young Chang, Department of Materials Science and Engineering, Seoul National University,Seoul 151-744, Korea) (Mijeong Han, Device Materials Research Center, Korea Research Institute of ChemicalTechnology, 100 Jang-dong, Yuseong-gu, Daejeon 305-600, Korea) (Seok-Ho Hwang, Korea Institute of Industrial Technology, 35-3, Hongcheon-Ri, Ipchang-Myun,Seobuk-gu, Cheonan-Si, Chungnam 331-825, Korea) (Moon-Kwang Um, Composite Materials Group, Korea Institute of Materials Science,66 Sangnamdong, Changwon, Gyungnam 641-010, Korea)

    1980 1983 1991 1992

    1992 1992

    () KAIST () () (Post Doc)

    1979 1981 1988

    1989 1989

    19921992

    19981998

    () () Dept. of Chemistry, University of Michigan() Dept. of Chemistry, Pennsylvania State University (Postdoc.) ()

    1990 2000 1990

    1995 2001 2002

    () () 4 (Post-doc)

    1980 1982 1992 1993

    1994 1996 1982

    () () KAIST () Univ. of Illinois at Urbana- Champaign (Post-Doc.) IBM Almaden () KIST

    1988 1990 1995 1998

    19991995

    () () () Northwestern (Post Doc)

    1992 1994 2006 1994

    2000 2006

    () () University of Akron, Dept. of PolymerScience()

  • 19 6 2008 12 531

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  • 532 Polymer Science and Technology Vol. 19, No. 6, December 2008

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    , , Dainippon Chemical(), Nippon Oil & Fats(), Nisshin Steel(), Oha-shi Chemical(), Shikibo(), Showa Technocoat(, ) .

    , Virginia Polytech - Drexel University electroactive , UCLA , Sandia National Lab. , State University of New York , University of Massachusettes .

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    3. (Material Stage, Vol.13, No.11, 1-6 (2004))

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  • 534 Polymer Science and Technology Vol. 19, No. 6, December 2008

    ( nm nm) (0,1 ) () ( ) ( 4).

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    , . , Cardiff Neil B. Mckeown, Manchester Peter M. Budd, Birmingham David Book PIM(polymer with intrinsic micropo-rosity) . Mckeown ( 5), (7501466 m2g-1) (0.7 nm) . , PIM ( 6).

    Cambridge Matthew J. Rosseinsky Andrew I. Cooper California Jonathan Germain hypercrosslinked polymer . . - .

    - 1960 Tomic 2 sheet (coordination polymer) . 1970 1980 2 , 1980 Hoskins 3 . .

    2000 - . Berne N.-R. Behrnd . . Stellenbosch Barbour .

    4. - .

    4. IT solder

    Nihon Solder() Lead-free

    solder NH-070A

    (, ,)NH-HP10

    , Ag nano paste

    (Harima ()) Ag Ag 3-7 nm Ag Sn-Ag-Cu Epoxy Epoxy - 180 /1+

    255 /60 reflow 110 /40+

    190 /5 185 /20+ 200 /10

    180-220 /60

    cm 15 1000 40 8-50 W/mk 50 1.5 10-20 -

    kgf 4.0 5.6 2.2 1-4

    5. Molecular model of PIM.

  • 19 6 2008 12 535

    . 2000 UCLA Yaghi organic dicarboxylate , - . Yaghi ZnO4 core stone benzene dicarboxylate MOF-5 78 K 4 wt%, 1 wt% .

    UC Berkeley Long Mn metal center . 77 K 6.9 wt% , open metal site . , .

    Ferey Cr . Zn (6.1 wt%, 77 K) .

    . MIT Swager , . , .

    .

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    . (II) , pyridine-2,4-dicarboxy acid - . (N2, O2, CO2, CH4) . - .

    , - . Zn Mn 77 K 2.8 wt% .

    4.3

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    , , . 2 (, 2001. 9. 8).

    Kansai Research Institute(KRI) , LCD , ,

    6. Molecular structures of PIMs and simplified structure of ahypercrosslinked polymer.

  • 536 Polymer Science and Technology Vol. 19, No. 6, December 2008

    . , ,

    - . // , 3 (, 2007. 11. 11).

    Virginia Polytechnic Institute & State University - 2 nm . POSS(polyhedral oligometric silses-quinoxanes) .

    UCLA , State University of New York , University of Massachusettes . , Carne-gie Mellon University atom transfer radical polymerization (ATRP) ( 7).

    , , PMMA-Si-ZrO2 , .

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    1950 1980 250 , - (-2001,300 ) Oak Ridge National La-boratory phosphor thermometry . 5 .

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    Toray PVAc, PVA Central Glass PEG Dainippon Ink PMMA DuPont PVAc, PVA Eastman Kodak PMMA, PVAc, PVA KRI PA, PI, PMMA Ohashi Chemical PMMA Nisshin Steel PA Sagami Chemical PEG Shikibo Epoxy resin Toyo Ink Manuf. PVAc, PVA Nippon Oil & Fats PMMA Nippon Sheet Glass PEG Ube Intercalation compounds

    7. ATRP .

  • 19 6 2008 12 537

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    4.4 Multi-phase , , ,

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    , , , , - (SBR) , BASF , , , . , Krapton , --(PS-PI-PS) --(PS-PB-PS) Shell( Kraton Co.) , , , , , BASF , , Styrolux, Styroflex . , Philips Solprene . Arkema --(SBM) Nanostrength , , , .

    , BASF Oppanol Glissopal , Kuraray , --(PS-PI-PS) , .

    , (1990 ) , , , , , , , , , , Dupont Performance Coating , . , Ciba Specialty Chemicals , . Kaneka ATRP telechelic . ,

    nitroxide-mediated (NMRP) , Arkema BlocBulider Controller , . 6 .

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    Retardation living anionic polymerization BASF

    PS-PI-PS PS-PB-PI (Krapton)

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    PS-PI Star Polymer(Solprene) Philips PS-PI-PMMA(Nanostrength) Arkema

    PS-PEP-PS(Septon) Kuraray Polyisobutene(Oppanol, Glissopal) BASF

    PS-PI-PS(PI: polyisobutene) Kuraray BlocBulider Controller( ) Arkema

    ATRP Kaneka

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    BlocBulider Controller

    ( ) Arkema ATRP Kaneka

    HYBAS NASA

    Auckland

  • 538 Polymer Science and Technology Vol. 19, No. 6, December 2008

    , (, , , , , , ...) .

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    , , / . 10 m . ACF/ACP , COF (Chip on Film) 35 m 30 m , , . ACF (15 ), , () .

    , (lightning strike) , . . Hollingsworth & Vose , Martin Marietta Radar . Hage , .

    ITO ( Baytron P, TDA Aedotron/Oligotron) .

    , 90 LG, , SK, Telephus ACF

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    : Ormecon, :15~25 S/cm, :< 100nm Ormecon

    PEDOT (: Baytron P) : 1S/cm, : < ~ 10nm

    2000 (: Orgacon) Agfa

    pilot Panipol

    2004 PEDOT PEG ClO4 (: Aedotron, Oligotron), : 0.3 S/cm TDA

    Nanoshield SWNT (: Inviscon), : 200/sq Eikos

    Hollingsworth & Vose

    graphite filament or metal-coated graphite filament+resin Martin Marietta -

    (: Denatron), : 600 /sq Nagase Chemtex Koshibe

    ( , 0.08 /sq) Mitsubishi Mat. & Dainippon

    9.

    (ACF) (ACF/ACP) Telephus (ACF/ACP) LG

    (PriMet) : 200/sq

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  • 19 6 2008 12 539

    180 , 20, 130 m , , ( 9). , , , ()DPI PriMetTM ( ) , TFT .

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    . 0.13 m 248 nm KrF 60 nm (Design Rule) ArF (193 nm) immersion lithography .

    100 nm . (EUV: extreme ultra-violet), (electron-beam), X-, (ion-beam) . EUV , 45 nm , EUV 32 nm EUV .

    a-carbon ( 8). a-Carbon strip , a-Carbon BARC CVD SiON a- carbon/SiON/BARC . , Spin-On carbon polymer Si BARC /Si-BARC/PR pattern transferring , NISSAN .

    Rohm & Hass Electric Materials Dow Corning 65 nm , DRAM (Si-BARC) .

    JSR(Japan Synthetic Rubber, Co., Ltd) , ArF , , .

    ( 10).

    EUV .

    KAIST , .

    2007 10 21 DPT(double pat-terning technology) 30 nm flash ( 9). , substrate DPT 9 . , sin-gle-layer .

    carbon polymer BARC /Si-BARC/PR pattern transferring

    8. a-carbon .

    10.

    - -4 37 -SIA - 60

    2001 7 (MIRAI) - R&D - () - IP

    SOC

    16 ( ) - 2008

    -16, 280 , 25,000 - 3 CMOS - 2010 32 nm

  • 540 Polymer Science and Technology Vol. 19, No. 6, December 2008

    , Si-BARC .

    a-Carbon () .

    1. L. Nicolais and G. Carotenuto, Metal-Polymer Nanocomposites, John Wiley & Sons, New Jersey, 2005.

    2. A. D. Pomogailo and V. N. Kestelman, Metallopolymer Nano-composites, Springer-Verlag Berlin Heidelberg, 2005.

    3. P. M. Budd, B. S. Ghanem, S. Makhseed, N. B. McKeown, K. J. Msayib, and C. E. Tattershall, Chem. Commun., 230 (2004).

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    5. N. B. McKeown, P. M. Budd, and D. Book, Macromol. Rapid Commun., 28, 995 (2007).

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    7. M. Dinca and J. R. J. Long, Am. Chem. Soc., 128, 16876, (2006). 8. G. Ferey, C. Mellot-Draznieks, C. Serre, F. Millange, J.

    Dutour, S. Surble, and I. Margiolaki, Science, 309, 2040 (2005). 9. T. M. Long and T. M. J. Swager, J. Am. Chem. Soc., 124, 3826,

    2002 10. J. W. Yoon, S. H. Jhung, Y. K. Hwang, S. M. Humphrey, P. T.

    Wood, and J.-S. Chang, Adv. Mater., 19, 1830 (2007). 11. H. R. Moon, N. Kobayashi, and M. Paik, Inorg. Chem., 45, 8672

    (2006). 12. , ,

    , . 13. D. Dong, S. Jiang, Y. Men, X. Ji, and B. Jiang, Adv. Mater., 12,

    646 (2000). 14. Antenna Effect, Material Research, 4 (2001) 15. B. S. Bae, Polymer Science and Technology, 12, 716 (2001). 16. , ,

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    (2001). 18. P. J. Miller, K. Matyjaszewski, Macromolecules, 32, 8760

    (1999). 19. J. Pyun, J. Xia, and K. Matyjaszewski, ACS Symposium Series,

    838, 273 (2003). 20. , KISTI (2005). 21 , ReSeat, , . 22. , (2003). 23. , KISTI, , . 24. www.compositesworld.com/.../2006/July. 25. , , p.55 (2006). 26. Fuji chimera, 2003 & 2004, DPI solutions, (2005). 27. J. H. Han, Polymer Science and Technology, 16, 162 (2005). 28. , COG

    .

    Hard mask

    BARC

    ResistTARC

    SiONa-carbon

    Sub.wafer

    BARC etchSiON etcha-carbon etchHard mask etchcleaning

    a-carbon depositionSiON depositionBARC coatingResist coatingTARC coatingBARC etch

    SiON etchA-carbon etchSOC etchHardmask etchCleaning

    Sub etchingSub cleaning

    Photo mask

    Hard mask

    BARC

    ResistTARC

    SiONa-carbon

    Sub.wafer

    BARC etchSiON etcha-carbon etchHard mask etchcleaning

    a-carbon depositionSiON depositionBARC coatingResist coatingTARC coatingBARC etch

    SiON etchA-carbon etchSOC etchHardmask etchCleaning

    Sub etchingSub cleaning

    Photo mask

    9. DPT(Double Patterning Technology) .

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