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530 Polymer Science and Technology Vol. 19, No. 6, December 2008
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Technology for Hyper-Structure Control of Organic/Inorganic Hybrid (Soonho Lim and Soon Man Hong, Polymer Hybrid Research Center, KoreaInstitute of Science and Technology, P.O. Box 131 Cheongryang, Seoul 130-650, Korea) e-mail: [email protected] (Ji Young Chang, Department of Materials Science and Engineering, Seoul National University,Seoul 151-744, Korea) (Mijeong Han, Device Materials Research Center, Korea Research Institute of ChemicalTechnology, 100 Jang-dong, Yuseong-gu, Daejeon 305-600, Korea) (Seok-Ho Hwang, Korea Institute of Industrial Technology, 35-3, Hongcheon-Ri, Ipchang-Myun,Seobuk-gu, Cheonan-Si, Chungnam 331-825, Korea) (Moon-Kwang Um, Composite Materials Group, Korea Institute of Materials Science,66 Sangnamdong, Changwon, Gyungnam 641-010, Korea)
1980 1983 1991 1992
1992 1992
() KAIST () () (Post Doc)
1979 1981 1988
1989 1989
19921992
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() () Dept. of Chemistry, University of Michigan() Dept. of Chemistry, Pennsylvania State University (Postdoc.) ()
1990 2000 1990
1995 2001 2002
() () 4 (Post-doc)
1980 1982 1992 1993
1994 1996 1982
() () KAIST () Univ. of Illinois at Urbana- Champaign (Post-Doc.) IBM Almaden () KIST
1988 1990 1995 1998
19991995
() () () Northwestern (Post Doc)
1992 1994 2006 1994
2000 2006
() () University of Akron, Dept. of PolymerScience()
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, , Dainippon Chemical(), Nippon Oil & Fats(), Nisshin Steel(), Oha-shi Chemical(), Shikibo(), Showa Technocoat(, ) .
, Virginia Polytech - Drexel University electroactive , UCLA , Sandia National Lab. , State University of New York , University of Massachusettes .
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534 Polymer Science and Technology Vol. 19, No. 6, December 2008
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, . , Cardiff Neil B. Mckeown, Manchester Peter M. Budd, Birmingham David Book PIM(polymer with intrinsic micropo-rosity) . Mckeown ( 5), (7501466 m2g-1) (0.7 nm) . , PIM ( 6).
Cambridge Matthew J. Rosseinsky Andrew I. Cooper California Jonathan Germain hypercrosslinked polymer . . - .
- 1960 Tomic 2 sheet (coordination polymer) . 1970 1980 2 , 1980 Hoskins 3 . .
2000 - . Berne N.-R. Behrnd . . Stellenbosch Barbour .
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Nihon Solder() Lead-free
solder NH-070A
(, ,)NH-HP10
, Ag nano paste
(Harima ()) Ag Ag 3-7 nm Ag Sn-Ag-Cu Epoxy Epoxy - 180 /1+
255 /60 reflow 110 /40+
190 /5 185 /20+ 200 /10
180-220 /60
cm 15 1000 40 8-50 W/mk 50 1.5 10-20 -
kgf 4.0 5.6 2.2 1-4
5. Molecular model of PIM.
19 6 2008 12 535
. 2000 UCLA Yaghi organic dicarboxylate , - . Yaghi ZnO4 core stone benzene dicarboxylate MOF-5 78 K 4 wt%, 1 wt% .
UC Berkeley Long Mn metal center . 77 K 6.9 wt% , open metal site . , .
Ferey Cr . Zn (6.1 wt%, 77 K) .
. MIT Swager , . , .
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6. Molecular structures of PIMs and simplified structure of ahypercrosslinked polymer.
536 Polymer Science and Technology Vol. 19, No. 6, December 2008
. , ,
- . // , 3 (, 2007. 11. 11).
Virginia Polytechnic Institute & State University - 2 nm . POSS(polyhedral oligometric silses-quinoxanes) .
UCLA , State University of New York , University of Massachusettes . , Carne-gie Mellon University atom transfer radical polymerization (ATRP) ( 7).
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7. ATRP .
19 6 2008 12 537
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, BASF Oppanol Glissopal , Kuraray , --(PS-PI-PS) , .
, (1990 ) , , , , , , , , , , Dupont Performance Coating , . , Ciba Specialty Chemicals , . Kaneka ATRP telechelic . ,
nitroxide-mediated (NMRP) , Arkema BlocBulider Controller , . 6 .
multi-phase , , , , , , , MEMS NASA , ( 7 ).
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PS-PI Star Polymer(Solprene) Philips PS-PI-PMMA(Nanostrength) Arkema
PS-PEP-PS(Septon) Kuraray Polyisobutene(Oppanol, Glissopal) BASF
PS-PI-PS(PI: polyisobutene) Kuraray BlocBulider Controller( ) Arkema
ATRP Kaneka
7.
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HYBAS NASA
Auckland
538 Polymer Science and Technology Vol. 19, No. 6, December 2008
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2000 (: Orgacon) Agfa
pilot Panipol
2004 PEDOT PEG ClO4 (: Aedotron, Oligotron), : 0.3 S/cm TDA
Nanoshield SWNT (: Inviscon), : 200/sq Eikos
Hollingsworth & Vose
graphite filament or metal-coated graphite filament+resin Martin Marietta -
(: Denatron), : 600 /sq Nagase Chemtex Koshibe
( , 0.08 /sq) Mitsubishi Mat. & Dainippon
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a-carbon ( 8). a-Carbon strip , a-Carbon BARC CVD SiON a- carbon/SiON/BARC . , Spin-On carbon polymer Si BARC /Si-BARC/PR pattern transferring , NISSAN .
Rohm & Hass Electric Materials Dow Corning 65 nm , DRAM (Si-BARC) .
JSR(Japan Synthetic Rubber, Co., Ltd) , ArF , , .
( 10).
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2007 10 21 DPT(double pat-terning technology) 30 nm flash ( 9). , substrate DPT 9 . , sin-gle-layer .
carbon polymer BARC /Si-BARC/PR pattern transferring
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-16, 280 , 25,000 - 3 CMOS - 2010 32 nm
540 Polymer Science and Technology Vol. 19, No. 6, December 2008
, Si-BARC .
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.
Hard mask
BARC
ResistTARC
SiONa-carbon
Sub.wafer
BARC etchSiON etcha-carbon etchHard mask etchcleaning
a-carbon depositionSiON depositionBARC coatingResist coatingTARC coatingBARC etch
SiON etchA-carbon etchSOC etchHardmask etchCleaning
Sub etchingSub cleaning
Photo mask
Hard mask
BARC
ResistTARC
SiONa-carbon
Sub.wafer
BARC etchSiON etcha-carbon etchHard mask etchcleaning
a-carbon depositionSiON depositionBARC coatingResist coatingTARC coatingBARC etch
SiON etchA-carbon etchSOC etchHardmask etchCleaning
Sub etchingSub cleaning
Photo mask
9. DPT(Double Patterning Technology) .
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