2013. 2. 26.2013. 2. 26.
XRF XRF XRF XRF XRF source X- -
Sample Crystal Detector K lines & L lines Intensity Ratio
Data FP (Fundamental Parameter Method) FP Mapping (Max 250 μm)
Qualitative analysis Quantitative analysis
XRF XRF XRF XRF XRF source X- -
1. XRF ?
X-ray fluorescence
is the emission of characteristic "secondary" (or fluorescent)
X-rays from a material that has been excited by bombarding with
high-energy X-rays or gamma rays. The phenomenon is widely used for
elemental analysis and chemical analysis, particularly in the
investigation of metals, glass, ceramics and building materials,
and for research in geochemistry, forensic science and archaeology.
( Wikipedia)
Electron transitions
Sequential typeSequential typeSimultaneous Simultaneous
typetype
Energy dispersive spectrometry
3. XRF
KS D 1654 KS D 1655 X KS D 1686 X KS D 1898 X KS D 1898 X KS D 2597
X KS D 2597 X KS D 2710 X KS D ISO 4503 X KS D ISO 4883 X KS E 3045
KS E 3075 KS E 3076 KS E ISO 9516-1 X1 KS L 3316 X KS L 5222 X KS M
0017 X
KS D ISO 14706 X-(TXRF)
KS M ISO 14596 ---X
KS M ISO 14597 X
KS M ISO 15597 X
KS M ISO 20847 X
KS M ISO 20884 X
KS M ISO 5938 (Na3AlF6)
X-ray
KS M ISO 12980 X
4. XRF
thin Beryllium window 75m or 125m
+Voltage
+Voltage
Tube head cooling
Ring shaped cathode
- Filament filament target X
- = 0.2 %( )
Rh target Rh - Cd
Cr target Cl - Ti Cr, Mn
X-ray
50 kV-75 mA 26Fe - 92U
30 kV-130 mA 4Be - 8O
X-ray
50 kV-55 mA 26Fe - 92U
30 kV-95 mA 4Be - 8O
Targrt
5. XRF source 2 - Rh, Cr, W, Mo, Pt, Au , Ag, Cu
X
Energie-range [keV] Wavelenghts Description < 10-7 cm to km
Radio-waves < 10-3 mm to cm Microwaves < 10-3 mm to mm
Infrared
0.0017 - 0.0033 380 to 750 nm Visible light 0.0033 - 0.1 10 to 380
nm Ultraviolett light 0.11 0.11 -- 100100 0.01 to 11.3 nm0.01 to
11.3 nm XX--raysrays 10 - 5000 0.0002 to 0.12 nm gamma
radiation
Electromagnetic radiationElectromagnetic radiation
- - (ZnS, CdS, NaI ) - - = 1 - - (, ) - ,
6. X-
-
-
- -
0 )
Aperture : 1 mm ~ 30 mm
Filter : Al, Ti, Ni, Cu, Zr
Primary X-ray Filter
Al Cl, Rh, Cd
Ti Cr – Fe
Ni Zn, As, Hf, Pb, Bi ,
Cu As, Hf, Pb, Bi
Zr Ru – Cd (Rh-target) ,
8. Sample
Standard
High Resolution ClKα RhLα, MnKα CrKβ
X-, crystal ,
Bragg
, () ()
Slit
LiF(420) Lithiumfluoride / from Co 0.1801 LiF(220) Lithiumfluoride
/ from V 0.2848 LiF(200) Lithiumfluoride / from K 0.4028
Ge Germanium / P, S, Cl 0.653 InSb Indiumantimonide / Si 0.7481 PET
Pentaerythrit / Al - Ti 0.874 AdP Ammonium dihydrogen phosphate /
Mg 1.0648 TlAP Thalliumhydrogenphtalate / F, Na 2.5760
OVO-55 Multilayer (W/Si) / (C) O - Si 5.5 OVO-160 Multilayer (Ni/C)
/ B, C, N 16 OVO-N Multilayer (Ni/BN) / N 11 OVO-C Multilayer (V/C)
/ C 12 OVO-B Multilayer (Mo/B4C) / B (Be) 20
EDX & WDX
10. Detector
12. Intensity Ratio
Data FP (Fundamental Parameter Method) FP Mapping (Max 250 μm)
Qualitative analysis Quantitative analysis
Qualitative/quantitative analysis, FP , Mapping
- Qualitative/Quantitative (Empirical Correction Method) analysis ,
, /
- FP (Fundamental Parameter Method)
- FP (Film Thickness Measurement and Thin Film Analysis) Film
thickness measurement and inorganic component analysis for
high-polymer thin films with background FP method
- Mapping : Max 250 µm point analysis
13. Data
- ( ) , - , Fundamental Parameter - , .
- FP –
. .
→ (Fixed), Balance Net .
Background , , Balance
14. FP (Fundamental Parameter Method)