Transcript
Page 1: ВЛИЯНИЕ ТЕРМИЧЕСКОЙ ОБРАБОТКИ НА МИКРОТВЕРДОСТЬ КВАРЦЕВЫХ СТЕКОЛ МАРКИ КУ-1

2013, 5, 2 143

666.1.001.5

-1 . . 1, . . 2

--1. , -

1100 °. -

– , . : -1, ,

, , .

, -, , , -

, , . -, -

, , -

[1]. ,

, . -1 -

SiCl4 - [2], 1710 °C : SiCl4+2H2O = SiO2+4HCl.

(~0,5 . %) OH, , [3, 4]. -

- , « » -.

, -.

40×30×3 , 0,1 . : 900 ° , 1000 °

1100 ° 5 . - ±1 ° .

9450-76 - –3 .

90 . 10 %. -3

Co K - . 18°–48° 1 / . ,

.

«Difwin». , ICSD.

1 – - , , , -

. E-mail: [email protected] 2 – , ,

. E-mail: [email protected]

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. « . . » 144

, .

100 . 9 . . 1 .

,

, ° H, / 2

1 900 1017 ± 95 2 1000 1028 ± 99 3 1100 1043 ± 83

4 – 1008 ± 81

:

−−=

nHH

HHR

ii

ii2

2

22 )(

1 ,

. 1. , ) 900 ° , ) 1000 ° , ) 1100 ° , )

a) )

) )

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. ., . . -1

2013, 5, 2 145

iH – , iH – , n – .

. , 900 ° ( . 2, ), R2 = 0,1103 ,

. 1000 ° ( . 1, ) ( . 1, ) R2 = 0,0177 R2 = 0,0552 . ,

1100 ° , R2 = 0,0025 ( . 1, ).

. , -.

[5]. . 2 . . 2, . . 2, , , -

, d = 3,34 Å. -, . ,

1100 ° ( . 2, ), , - SiO2 – . -

Si–O–H [6], . Si, , -

, Si–O–Si.

, -, ,

. . -, .

-1. , 1100 ° -

. . 1100 ° -

– , .

. 2.

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. « . . » 146

1. Br ckner, R. Silicon Dioxide / R. Br ckner // Encyclopedia of Applied Physics. – 1997. –Vol. 18. – P. 95–131

2. , . . / . . , . . . – .: , 1985. – 168 .

3. , . . : / . . // . – 2001. – . 7, 3. – . 95–102.

4. , . . -1 / . . , . . , . . // .

2 « ». – 2010. – . 51, 1. – . 43–47. 5. , . . . / . . . – .:

, 1976. – 328 . 6. -

41 / . . , . . , . . , . . // . « ». – 2008. – 4. – . 376–388.

INFLUENCE OF HEAT-TREATING ON MICROHARDNESS OF SILICA GLASS -1

A.N. Bryzgalov1, P.V. Volkov2

The influence of heat-treating on the microhardness of the silica glass K -1 is investigated. It is found out that the heat-treatment at 1100 °C increase in microhardness and the uniformity improves. This fact is explained by the change of the phase composition of the surface, namely by the appearance of re-flexes, related to the phase of cristobalite.

Keywords: silica glass K -1, microhardness, heat-treatment, X-ray analysis, cristobalite.

References 1. Br ckner R. Silicon Dioxide. Encyclopedia of Applied Physics. 1997. Vol. 18. pp. 95–131. 2. Leko V.K., Mazurin O.V. Svoystva kvartsevogo stekla (Properties of silica glass). Moscow:

Nauka, 1985. 168 p. (in Russ.). 3. Khonik V.A. Sorosovskiy obrazovatel'nyy zhurnal. 2001. Vol. 7, no. 3. pp. 95–102. (in Russ.). 4. Lunin B.S., Kharlanov A.N., Kozlov S.E. Vestnik Moskovskogo universiteta. Seriya 2 «Khimiya».

2010. Vol. 51, no. 1. pp. 43–47. (in Russ.). 5. Mirkin L.I. Rentgenostrukturnyy analiz. Spravochnoe posobie. (X-ray structural analysis. Study

guide). Moscow: Nauka, 1976. 328 p. (in Russ.). 6. Kozlova S.A., Parfenov V.A., Tarasova L.S., Kirik S.D. Zhurnal Sibirskogo Federal'nogo uni-

versiteta. Seriya «Khimiya». 2008. no. 4. p. 376–388. (in Russ.). 11 2013 .

1 Bryzgalov Aleksandr Nikolaevich is Dr.Sc. (Physics and Mathematics), Professor, General and Theoretical Physics Department, Chelyabinsk State Pedagogical University. E-mail: [email protected] 2 Volkov Petr Vyacheslavovich is Post-Graduate Student, General and Theoretical Physics Department, Chelyabinsk State Pedagogical Univer-sity. E-mail: [email protected]


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