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CÁC PHƯƠNG PHÁP CHẾ TẠO MÀNG HÓA HỌC HV : Trần Thị Thanh Thủy CHK18

các phương pháp chế tạo màng hóa học

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bài giảng các phương pháp chế tạo màng hóa học ĐHBKHN

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  • CC PHNG PHP CH TO MNG HA HCHV: Trn Th Thanh Thy CHK18

  • CC LOI MNG HAMng nhy kh/lng: Al2O3,Ta2O5, Si3N4-> mng nhy pH ZnO:Ga, SnO2:Sb -> nhy hi cn..Mng chng n mn: Tb-Fe-Co hay Tb/Fe-Co Al-SiO2, Al2O3:MgMng ngn khuch tn: Ta-Si-N, ZnO, Ni (Al/Si trong bn dn loi n) ZnAl3 (Al/Au) TiN, TiO2 dng tinh th hay v nh hnh (PbTiO3/Si)

  • PHNG PHP SOLGELSol (solution), Gel(gelation)y l phng php ha hc t tng hp cc phn t huyn ph dng keo rn (precursor:SnCl4.5H2O, SbCl3.2H2O) trong cht lng sau d to thnh nguyn liu lng pha ca b khung cht rn,c cha y dung mi cho n khi xy ra qu trnh chuyn tip Sol-gel.Cc alkoxide M(RO) l la chn ban u to ra dung dch solgel vi cc xc tc thch hp.

  • C CH TO DUNG DCH SOLGEL T ALKOXIDEM(OR)+H2O -> M(OH) + R(OH) (thy phn)M(OH)+M(OH)-> MOM + H20 (ngng t)M(OH)+M(OR)-> MOM +ROH (ngng t)V D: to mng SiO2Thy phn:(C2H5O)3-Si-OC2H5 + H2O -> (C2H5O)3-Si-OH + C2H5OH Ngng t:(C2H5O)3-Si-OH + OH-Si- (OC2H5)3 -> (C2H5O)3-Si-O-Si-(OC2H5)3alkoxidesol

  • CC K THUT TO MNG T DUNG DCH SOLGELK thut ph nhng (dip coating)K thut ph quay (spin coating)K thut ph dng chy (flow coating)K thut phun (spray coating)..Capillary coating

  • DIP COATINGPh nhng vt liu c mt cong nh mt knh, thu knh.C th ph nhng vt liu c dy t 20nm n 50micromet bng cch chn nht ca cht lng sao cho ph hp.

  • CC THNG S K THUT CA MY

    Deposition system:Deposition speed0.1 to 85 mm/minSpeed adjustment0.1 mm/min (ly lm n v)Arm stroke145 mm Deposition cyclesUnlimitedDelay timesAdjustable from 1 to 9999 secondsDipper motorServo controlled DC motorMaximum size of substrate100x100x10 mm (100 % immersion)Drive Belt system:Linear range of movement of dipper unit0 to 600 mmSpeed of linear movement0.01 to 400 mm/minBarrier motorHigh precision micro Stepp driven stepper motor

  • FLOW COATING- dy ca mng ph thuc: nghing ca , nht cht lng,tc bay hi dung dch-S dng i vi khng bng phng v ph trn din tch ln- C th thc hin quay mu sau khi ph tng dng u ca dy mng mng.

  • K THUT PH QUAY MU Phng php ny s dng lc quay li tm ph mng, mng c ng u cao nh lc li tm cn bng vi lc o nht ca dung dchCc bc tin hnh:

  • DY LP PH KHNG PH THUC LNG DUNG DCH CHO LN :khi lng ring ban u ca cht lng: khi lng ring: vn tc gc ca : nht ca cht lng: tc bay hi ca cht lng

  • Capillary coating - Tit kim vt liu- Ph c nhiu lp- iu chnh dy mng bng cch iu chnh tc slot-tube

  • X L NHIT CHO MNG-Trong qu trnh to mng khu x l nhit rt quan trng v n nh hng trc tip n vi cu trc ca mng. Giai on ny c tc dng lm bay hi ht dung mi cn li trong mng, vt cht kt ni vi nhau chc ch hn hnh thnh nn bin ht lm nh hng n vi cu trc ca mng. i vi mng nhy kh cu trc xp ca mng rt c quan tm -Sau khi x l nhit ta c th tin hnh ph in cc d dng cho vic phn tch mu.

  • K THUT PH C IN

  • PHNG PHP CCVD( Combustion Chemical Vapor Deposition)

  • HNH NH THC T Left: One of nGimat's small pilot facilities for production of nanopowders Right: nanopowder-producing CCVC flame.

  • U IMC kh nng sn xut vt liu a thnh phn mt cch n gin v nhanh chng nh iu chnh dung dch ha hc-> m rng phm vi ng dngiu chnh c kch thc, hnh dng v hnh thi hc ca cc ht nano.My hot ng mi trng khng kh bnh thngNHC IMTin cht phi ha tan c v d bt laDng c t tin

  • K THUT PLD (pulse laser deposition)Phng php PLD c ch trong vi nm va qua v phng php ny ph c thnh cng nhng hp cht phc tp. K thut PLD ln u tin s dng ph mng siu dn YBa2Cu3O7. K t nhiu vt liu kh ph bng nhng phng php bnh thng , c bit l nhng hp cht gm nhiu loi oxit khc nhau c ph thnh cng bi phng php ny. Phng php ny dng ph nhng mng nhy PH nh Al2O3, Ta2O5, cc loi mng chng oxi ha hoc n mn

  • Loi Sensor pHpHpH Mng Sensor Al2O3Si3N4Ta2O5

    Khong o (pH)2-122-122-12Cng (mV/pH)54-5653-5556-58Thi gian hng ng(pht)111 bn 3 nm6 thng1 nm

  • LCH S PHT TRIN CA PLD1916 Albert Einstein gi nh qu trnh pht x kch thch.

    1960 Theodore H. Maiman xy dng my maser (microwave amplification by stimulated emission radiation)-my khuch i vi sng bng bc x cm ng s dng thanh ruby nh l mi trng tc dng laser.

    1962 Breech v Cross s dng laser ruby lm bay hi v kch thch nguyn t t b mt cht rn

    1965 Smith v Turner s dng laser ruby ph mng . Dnh du s khi u ca k thut PLD

  • u thp nin 80- nh du s to ra thit b ph mng bng laser v k thut epitaxy . Mt vi nhm nghin cu t c nhng kt qu ng ch trong vic sn xut ra nhng mng mng bng cch s dng k thut ny

    1987 PLD thnh cng trong vic ch to nhng mng mng siu dn nhit

    Cui thp nin 80 PLD l mt k thut kh ni ting trong vic ch to mng mng v c ch n rt nhiu. 1990s s pht trin nhanh chng ca laser ko theo s pht trin ca k thut PLD.

    2000s- Drs. Koinuma and Kawasaki nghin cu ci tin h thng PLD to ra nhng mu c cht lng cao v gim thi gian ph mng

  • Nguyn tc hot ng

  • VT LIU PH

    MetalsCeramicsOthersAg, Au, Cu, Ir, Ni, Rh, Pt, Ru, ZnAl2O3, Al2O3MgO, 3Al2O32SiO2, BaCeO3, BaCO3, BaTiO3, BST, doped-CeO2, Cr2O3, CuxO, [La.95Ca.05]CrO3, Fe2O3, In2O3, ITO, LaAlO3, LaPO4, LSC, LSM, MgO, Mn2O3, MoO3, Nb2O5, NiO, NSM, PbSO4, PbTiO3, PdO, PLZT, PMN, PMT, PNZT, PZT, RbOx, RhOx, RuO2, SiO2, Spinels (e.g. NiAl2O4, NiCr2O4), Silica Glasses, SnO2, SrLaAlO4, SrRuO3, SrTiO3, Ta2O5, TiO2, V2O5, WO3, YBa2Cu3Ox, YbBa2Cu3Ox, YIG, YSZ, YSZAl2O3, YSZ-Ni, ZrO2, ZnO (+ dopants in many cases)Over 10 polymers (polyimides, NafionTM, epoxies), numerous composites of metals, ceramics and polymersSubstrates UsedAl, Brass, Ag, Cu, Pt, Ni, Stainless and C-Steel, Al2O3, Fiber Tows, Glass, Graphite, LaAlO3, MgO, NafionTM, NiCr, Optical fibers, OPP, PET, Polycarbonate, Silica, Si, Si-Ti/Pt wafers, SiC, Si3N4, Superalloys, TeflonTM, Ti, TiAl alloy, YSZ, powdersSome ApplicationsAdhesion, capacitors, catalytic applications, corrosion resistance, gas diffusion barriers, electronics, engines, ferroelectric materials, flat panel displays, fuel cells, interface layers, optics, piezoelectrics, resistors, RF and millimeter wave components solar cells, superconductors, thermal barrier, thermal control, and wear resistance

  • PLD-3000

  • Bia

  • Thit b gi