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CHAPTER ONECHAPTER ONE
SEMICONDUCTORSSEMICONDUCTORS
Copyright, 2006 © Ahmed S. Bouazzi
2e A G.I. Module Energie Solaire
المدرسة الوطنية
للمهندسين بتونس
The Crystal Lattice of The Crystal Lattice of SiliconSilicon
Each silicon atom is situated at the center of a tetrahedron and connected to four other atoms occupying the summit of the tetrahedron.
A two dimension A two dimension representation of the silicon representation of the silicon
crystal structurecrystal structure
Intrinsic silicon
Si Si
SiSi
Si Si
Si
Si
Si Si
Si Si
SiSi
Si
Si
Each silicon atom is situated at the center of four other atoms.
N-type SemiconductorsN-type Semiconductors
n-doped silicon
P
P
P
P Si
Si
Si
Si
Si
Si
Si
Si
Si
Si
Si
SiSi
Si
Si
Si
P-type SemiconductorsP-type Semiconductors
p-doped silicon
Si Si
SiSi
Si Si
Si
Si
Si Si
Si Si
Si
B
B
B
Energy
Interatomic distance
Eg
Permitted levels
(a)
(b)
The GapThe Gap
Fermi LevelFermi Level
1exp
1)(
kTEE
EFF
[ F(E) is the probability for an electron to be in the E energy level]
In intrinsic silicon, EF is situated in the middle of the gap. In doped silicon, the Fermi level goes up or down depending on the electron concentration.
Semiconductor DopingSemiconductor Doping
E ia
E id E
F
E c
E g
E v
E F
n doped silicon p doped silicon
The doping atoms create localized levels inside the band gap.
Energy
vEEF
cE
cE
vE
SemiconductorMetal
Electron-hole PairsElectron-hole Pairs
Intrinsic Carrier Intrinsic Carrier ConcentrationConcentration
= 42in
3
2
2
h
kT
kT
Eg
for silicon at 300 K, ni2 = 2x1020 cm-6
np =2in
(memh)3/2 exp
• In n-type silicon:
Minority and Majority Minority and Majority CarriersCarriers
n = ND
pno ND = ni2
pno = ni2/ ND
• In p-type silicon:
p = NA
npo NA = ni2
npo = ni2/ NA
• In n-type silicon:
Minority and Majority Minority and Majority Carriers in Excess Carriers in Excess
nn0 = ND ≈ 1016 – 1018 cm-3
pn0 ND = ni2; pno = ni
2/ ND ≈ 2×104 – 2×102 cm-3
Creating n = p (≈ 1011 – 1014 cm-3) electron-hole pairs will give:
nn = nn0 + n ≈ ND
and pn = pn0 + p ≈ p
Minority and Majority Carriers in Minority and Majority Carriers in Excess Excess
• In p-type silicon:
pp0 = NA ≈ 1016 – 1018 cm-3
np0 NA = ni2; npo = ni
2/ NA ≈ 2×104 – 2×102 cm-3
Creating n = p (≈ 1011 – 1014 cm-3) electron-hole pairs will give:
pp = pp0 + p ≈ NA
and np = np0 + n ≈ n
Lifetime and Lifetime and RecombinationRecombination
N = Noexp
t•In the bulk:
•At the surface:
Jsur = q(np - npo)S
is the lifetime of the minority carriers.
S is the surface recombination velocity of minority carriers.
Diffusion LengthDiffusion Length
L = D
•The diffusion length is the free path of the minority carriers before recombination.
is the lifetime of the minority carriers.
D is the diffusion constant of minority carriers.
Absorption CoefficientAbsorption Coefficient
xo e 1
The absorbed quantity of photonsat the depth x is:
0 is the flux of photons arriving at the surface of the semiconductor and x is the depth.
x
0
0
xoe
Drift Minority Carriers Drift Minority Carriers Current in a Current in a
SemiconductorSemiconductor
• Electrons:
Jn = qnpµnE and n = qnpµn
Drift Minority Carriers Drift Minority Carriers Current in a Current in a
SemiconductorSemiconductor
•Holes:
Jp = qpnµpE and p = qpnµp
Jn = qDnnp(x,y,z)
Jp = – qDppn(x,y,z)
Diffusion Minority Carriers Diffusion Minority Carriers Current in a Current in a
SemiconductorSemiconductor
J = Jn + Jp
• Electrons:
Jn = qnpµnE + qDnnp(x,y,z)
• Holes:
Jp = qpnµpE – qDppn(x,y,z)
Total Minority Carriers Total Minority Carriers CurrentCurrent
Ec
Ev
EF
Eg p
n
Junction plane
p-n Junctionp-n Junction
Depletion region
PHOTOVOLTAIC EFFFECT PHOTOVOLTAIC EFFFECT (1)(1)
The p-n Junction
E c
E v
E F
p
n
Electrons Light HHHooollleeesss
E c
E v
E f
Electrons current
Holes current
The photocurrent under illumination
PHOTOVOLTAIC EFFFECT PHOTOVOLTAIC EFFFECT (2)(2)
PHOTOVOLTAIC EFFFECT PHOTOVOLTAIC EFFFECT (3)(3)
The photovoltage under illumination
E c
E v
E F
p
n The
photovoltage
2
1
2
1
112
DA
B
NNq
Vw
Depletion RegionDepletion Region
Where the built-in voltage is defined by:
2Log
i
DAB n
NN
q
kTV
E c
E v
EF
p
nEc
Ev
EF
p
n
Polarization of a p-n Polarization of a p-n JunctionJunction
direct inverse
J (A/cm2)
U (V)
0.5 1.0
1exp
kT
qUJJ o
I-V CharacteristicI-V Characteristic
n
np
p
pno L
Dn
L
DpqJ
n
np
p
pno L
Dn
L
DpqJ
Saturation CurrentSaturation Current
np = ; pn =A
i
N
n2
D
i
N
n2
Dp
p
An
ni NL
D
NL
Dqn2
; Lk= kkD
Jo =
Metal/semiconductor junction
Ec
Ev
SemiconductorEF
metal
Ec
EF
Ev
(a)
(b)
(c)
Schottky Diode and Ohmic Schottky Diode and Ohmic ContactsContacts