Phun Xa Magnetron Rf

8/13/2019 Phun Xa Magnetron Rf

1/18

Thc mc xin a ln din n ti: www.myyagy.com/mientay

PHNG PHP PHN X MAGNETRON RF

TRONG CH TO MNG MNGHc Vin thc hin :Phm Vn Thnh

I. PHNG PHP PHN X

1 Phn x l g ?Phn x (Sputtering) hay Phn x catt (Cathode Sputtering) l k

thut ch to mng mng da trn nguyn l truyn ng nng bng cchdng cc in kh him c tng tc di in trng bn ph b mt vtliu t bia vt liu, truyn ng nng cho cc nguyn t ny bay v pha

v lng ng trn .

I.2

H

s

phn

Hnh 1 : M hnh phn x

2. Bn cht qu trnh phn x

Khc vi phng php bay bc nhit, phn x khng lm cho vtliu b bay hi do t nng m thc cht qu trnh phn x l qu trnhtruyn ng nng. Vt liu ngun c to thnh dng cc tm bia (target)v c t ti in cc (thng l catt), trong bung c ht chnkhng cao v np kh him vi p sut thp (c 10-2 mbar). Di tc dngca in trng, cc nguyn t kh him b in ha, tng tc v chuynng v pha bia vi tc ln v bn ph b mt bia, truyn ng nngcho cc nguyn t vt liu ti b mt bia. Cc nguy n t c truyn ng


2/18


nng s bay v pha v lng ng trn . Cc nguyn t ny c gil cc nguyn t b phn x. Nh vy, c ch ca qu trnh phn x l vachm v trao i xung lng, hon ton khc vi c ch caphng phpbay bc nhit trong chn khng.

II. CC LOI PHN X

1. Phn x phng in mt chiu (DC discharge sputtering)

L k thut phn x s dng hiu in th mt chiu gia tc chocc in kh him. Bia vt liu c t trn in cc m (catt) trongchung chn khng c ht chn khng cao, tu thuc vo thit b mdin tch ca bia nm trong khong t 10 n vi trm centimet vung sau np y bi kh him (thng l Ar hoc He...) vi p sut thp (c 10 -2 mbar). Ant c th l hoc ton b thnh chung chn khng.Khong cch catt-ant ngn hn rt nhiu khong cch ngun- trongbc bay chn khng v thng l di 10 cm. Trong cc kh tr, A rgonc s dng phn x nhiu hn c, p sut ca n c duy tr trong

chung c1 Torr. Plasma trong trng hp ny c hnh thnh v duytr nh ngun in cao p mt chiu. C ch hnh thnh plasma ging cch phng in lnh trong kh km. Ngi ta s dng mt hiu in thmt chiu cao th t gia bia (in cc m) v mu (in cc dng).in t th cp pht x t catt c gia tc trong in trng cao p,chng ion-ha cc nguyn t kh, do to ra lp plasma ( l trng thitrung ha in tch ca vt cht m trong phn ln l cc ion dng vin t). Cc ion kh Ar+ b ht v catt, bn ph l n vt liu lm bt ccnguyn t ra khi b mt catt. Qu trnh ny l qu trnh phng in ckm theo pht sng (s pht quang do in ha). V dng in l dng inmt chiu nn cc in cc phi dn in duy tr dng in, do kthut ny thng ch dng cho cc bia dn in (bia kim loi, hp kim...).Tuy nhin, hiu sut phn x trong trng hp ny l rt thp. Ngy nayphng php phn x cao p mt chiu m khng s dng magnetron hunh khng c s dng trong cng ngh ch to mng.


3/18


Hnh 2. S h phng in cao p mt chiu (DC-sputter)

2. Phn x phng in xoay chiu (RF discharge sputtering)

L k thut s dng hiu in th xoay chiu gia tc cho in khhim. N vn c cu to chung ca cc h phn x, tuy nhi n my pht lmt my pht cao tn s dng dng in tn s sng v tuyn (thng l13,56 MHz). in p t trn in cc ca h chn khng l ngun xoaychiu tn s t 0,1 MHz tr ln, bin trong khong 0,5 n 1 kV. Mt dng ion tng hp ti bia trong khong 1 mA/cm2, trong khi bi n ca

dng cao tn tng hp cao hn rt nhiu (c khi ln gp mt bc hoc h nna). V dng in l xoay chiu, nn n c th s dng cho cc bia vt liukhng dn in. My pht cao tn s to ra cc hiu in th xoay chiudng xung vung. V h s dng dng in xoay chiu nn phi i qua mtb phi hp tr khng v h t in c tc dng tng cng sut phng inv bo v my pht. Qu trnh phn x c hi khc so vi phn x mtchiu ch bia va b bn ph bi cc in c nng l ng cao na chu km ca hiu in th v b bn ph bi cc in t na chu k dng.

Phn x cao tn c nhiu u im hn so vi phn x cao p mtchiu, th d in p thp, phn x trong p sut kh thp hn, tc phnx ln hn v c bit phn x c tt c cc loi vt liu t kim loi noxit hay cht cch in. Plasma trong phn x cao tn c hnh thnh vduy tr nhngun cao tn, cng ging nh qu trnh ion ha xy ra trongphn x cao p. Tuy nhin, ngy nay phn x cao tn ring bit cng khngcn c s dng bi hiu sut phn x vn cn cha cao. Ngi ta sdng magnetron khc phc nhc im ny.


4/18


Hnh 3: S h phng in cao tn c t chn lm tng hiu sut bn

ph ion.

3. Phn x magnetronL k thut phn x (s dng c vi xoay chiu v mt chiu) ci tin

t cc h phn x thng dng bng cch t b n di bia cc nam chm.Nh m t phn trn, vi cu hnh ca in cc trong c hai

phng php phn x u c in trng vung gc vi b mt bia. Nhngvi magnetron chng ta c n thy t trng ca cc nam chm to ra ngsc vung gc vi in trng (c ngha l song song vi mt phng cabia). V th, t trng c tp trung v tng cng plasma vng gn bia.

T trng ca nam chm c tc dng by cc in t v in li gn bia

v tng hiu ng in ha, tng s ln va chm gia cc in, in t vi ccnguyn t kh ti b mt bia do lm tng tc lng ng, gim s bnph ca in t v in trn b mt mng, gim nhit v c th to ras phng in p sut thp h n.

By gi chng ta xem by in t l m vic nh th no? Cu hnh nhm t trn hnh 4 (a, b) to ra hiu ng cun in t trong h ng Chng tac mt hiu ng Hall, chng l n dng cun ny v c hng chuyn ngquanh bia nh nhng con quay


5/18


Hnh 4 : S nguyn l by in t bng t trng trong h phn xmagnetron.

Bn knh qu o () ca con quay c xc nh bng cng thc:m

qB

trong :m

- l khi lng ca in t,v l thnh phn vung gc ca tc in t i vi ng sc,B l cm ng t.

Nhn chung, trong cc h phn x thc, bn knh qu o c gi trnh, ch khong mt n vi milimt. V vy, s giam hm in t gn b

mt bia l rt hiu qu. Cc in t chuyn ng quanh ng sc cho nkhi chngb tn x bi nguyn t. Trn thc t, magnetron cn tn ti mtkhong thi gian ngn sau khi lc khng c n, v cc in t vn cn b bysau mt s lt chuyn ng vng quanh. hiu tt hn vn magnetron, chng ta xem xt v d di y.

Thng thng bn ph cc target l kim loi hay cht dn inc th ta dng dng 1 chiu (Direct Current) to plasma (DC -magnetron sputtering). Nu cc target l cc cht cch in nh cc oxid...th bt buc ta phi dng dng RF to plasma.4. Cc cu hnh phn x khc

Ngoi ba kiu phn x nu trn, trong thc tin ngi ta cn ch to

cc thit b phn x vi cu hnh khc (cc b phn chnh vn da trn cuhnh ca hai loi trc). Trong c loi cu hnh s dng n phn thtrn kch thch bn ph ion v qu trnh ph mng, c loi phng inbng h tr ion nhit, trong in t th cp c tng cng t sivonfram t nng. Phn x chm ion cng l mt cu hnh t ra hu hiutrong cng ngh ch to mng mng. Trong cu hnh ny, ngun ion cthit k tch hn ra khi catt, lm vic vi in th phng in thp h n.


6/18


T ngun ny chm ion bn thng vo bia vi ng nng ln nht t ctng ng nng lng trong cao p mt chiu.

Hnh 5 : nh chp thit b sputtering Univex 450 ti tr ngi hcKhoa hc T nhin,i hc Quc gia H Ni

III. PHNG PHP PHN X MAGNETRON RF TRONGCH TO MNG MNG

1. Gii thiuRF-Magnetron Sputter l mt k thut to mng mng (Thin films)

hiu qu nht trong cc k thut phn x . T trng to ra bi Magnetrons nh hng dng plasma to thnh thnh cc loops (vng trn) do mt ion trong plasma cao hn v ng u hn do plasma mt caoc th to thnh trong p sut thp. Hn na, Magnetron s by cc int tp trung trn b mt ca target v trong qu trnh di tc dng cain trng RF s s ion cc tiu phn kh v chnh cc tiu phn kh tothnh ny s bn ph b mt ca target. RF y l vit tt ca ch RadioFrequency nhng ngha ca n y l nng lng ca qu trnh toplasma c cung cp bi cc d ng in xoay chiu cao tn ( tn s sngradio t 2 - 20 MHz). Thng thng kh Ar, Nit hay hn hp cc kh nyvi Oxy ng vai quan trng trong bc bay vt liu target ngo i nghal kh to ion n cn tham gia vo qu trnh t o mng na. Ni chung lmng mng (thin films) to bi k thut ny c th bao gm nhiu vt liu


7/18


khc nhau v mng rt ng u.

2. Nguyn l hot ng

Hnh 6 :Nguyn l hot ngchung

Dng kh (thng l argon hoc argon+O2, argon+N2) c bm vobung chn khng to plasma hnh thnh cc ion Ar+. Cc ion ny hngv target (kim loi cn to mng mng) c p th m. Cc ion ny dichuyn vi vn tc cao, bn ph target v nh bt cc nguyn t ca targetra khi target. Cc nguyn t ny "bc hi" v i n substrate (thu tinhhay silicon wafer), tch t trn substrate v hnh thnh mng m ng khi slng nguyn t ln.

Trong qu trnh bn ph ca ion Ar+ v o target, ngoi qu trnh nh

bt cc nguyn t ca target, cn c cc qu trnh khc x y ra nh hnhthnh cc electron th cp, hp ph, hnh thnh hp cht...

Trong qu trnh sputtering, ta c th li dng cc ion th cp hnhthnh tng tc to mng hoc gim th p vo target hoc gim psut dng Ar. K thut ny gi l magnetron sputtering. Trong k thut nyta p 1 t trng vo target. T trng ny s gi cc electron th cp daong trn cc ng sc t quanh target. Cc electron dao ng gn b mttarget s gp phn ion ho nhiu nguy n t Argon hn. Chnh iu ny tngtc qu trnh to mng mng.


8/18


Hnh 7 :Nguyn l hot ng ca phn x Magnetron RF

Qu trnh hnh thnh mng m ng : cc nguyn t tp hp li thnhtng cm trn substrate. khi cc cm ln s lin kt li hnh thnh mng(gm mt s lp nguyn t). T cc lp ban u n y mng s tip tc phttrin, nhng ko phi pht trin ng u cho c b mt, m pht trin theocc hng c nng lng t do thp nht. C th hnh thnh cc ct hay cccm v c th pht trin, hnh thi v tnh cht ca mng s khc nhau.

Hnh thi (morphology) ca mng mng : tu theo nhit casubstrate, nng lng ca ion Ar (hay p sut), m ng mng hnh thnh ccc hnh thi khc nhau. V d : Nu ta thay i dng kh Argon bng hn

hp Argon + O2 hoc Argon + N2 th ta thu c mng oxid hoc nitridtng ng.

2.1. H s phn x :

i

ns

n

, Trong :

s : h s phn x

n : s nguyn t b phn x

ni : s ion p vo b mt cathode

H s phn x s ph thuc vo :

- Bn cht ca vt liu phn x

- Loi ion v nng lng ca ion bn ph ln bia

- Gc p ca ion ln b mt cathode

- Ph thuc vo p sut kh lm vic


9/18


2.2. S ph thuc vo gc ti ca s phn x

Hnh 8 :H s phn x t gi tr cao nht v o khong gc ti

c gi tr 720

3. Cu to My phn x magnetron RFN vn c cu to chung ca cc h phn x, tuy nhi n my pht l

mt my pht cao tn s dng d ng in tn s sng v tuyn (thng l13,56 MHz). V dng in l xoay chiu, nn n c th s dng cho cc b iavt liu khng dn in. My pht cao tn s to ra cc hiu in th xoaychiu dng xung vung.

Do h s dng dng in xoay chiu nn phi i qua mt b phi hptr khng v h t in c tc dng tng cng sut phng in v bo vmy pht. Qu trnh phn x c hi khc so vi phn x mt chiu ch


10/18


bia va b bn ph bi cc in c nng lng cao na chu k m ca hiuin th v b bn ph bi cc in t na chu k d ng.

Gm cc b phn chnh sau :- Bung chn khng.- Bia : c gn vo mt bn gii nhit. Bn gii nhit c gn vocathode

- B phn Magnetron : T trng do mt vng nam chm bn ngoi baoquanh v khc cc vi nam chm gia. Chng c ni vi nhau bngmt tm st, c tc dng khp k n ng sc t pha di- : c p vo in cc anode- Ngun xoay chiu cao tn

3.1. Bung phn x

Hnh : Bung phn x

3.2. Mt s loi dng trong h phn x


11/18


Ceramic (gm)

Silicon

3.3. Bia- Bia phn x kch thc c 2 hoc 3.

a) Bia kim loiC th ni trong cc loi vt liu phn x th vt liu kim loi n

cht l d gia cng bia hn c. Th d, bia vng, ng, tantan, platin, v.v ...c th ch to bng cch khun ng kch th c ca catt. Do kim loidn in v dn nhit rt tt cho nn dng magnetron cao p mt chiu phn x cc loi bia kim loi ny s cho hiu sut phn x cao. Th d,trong phng php hin vi in t (SEM v TEM) ngi ta thng ph lp

vng hay platin rt mng ln b mt mu cch in ( dn in t xungcatt). Lp vng ny c lng ng trong bung phn x m chn khngc htbng h bm ca thit b knh hin vi. Cc bia v ng hay platin sdng c rt lu, bi v mi ln phn x chng ch b ty i mt lp d yvi chc nanmt. Mng mng kim loi vng cn c ph ln thy tinh lm gng bn phn x s dng trong cc th it b quang hc v laze.Mng platin hay palai phn tn b ng phn x to ra lp hot ha tr n bmt cc vt liu silic xp hay SnO2 cu trc nan tinh th. Nh m nhy ca cc sens kh ch to t vt liu k trn tng ln ng k.

b) Bia hp kimCc vt liu hp kim nh CoCrTa, CoNiCrTa, CoCrPt, CoFeTb v

CoCrNiPt ( y khng a cc ch s thnh phn vo trong cng thc)cng c phn x. Do mng mng ca cc hp kim i hi kht khe vthnh phn, hn na, chng c t t nh lm nh hng n hiu sutmagnetron, cho nn vic gia cng b mt bia cn phi p ng: (i) ngnht cao v thnh phn, (ii) hp thc trong cu to ca bia cn c tnhn kh nng ha hi khc nhau ca cc thnh phn sao cho khi phn x cth nhn c mng ng hp thc mong mun.

thy tinh


12/18


c) Bia hp cht cha xyCc loi mng c cu trc nhiu thnh phn nh mng st t BaTiO3,

LiNbO3, SrTiO3 hay mng siu d n nhit cao YBa2Cu3O7 cng cch to bng phn x magnetron. Vic gia cng b ia cho cc vt liu tr nquyt nh s thnh cng ca cng ngh. C th ch to bia gm ccthnh phn cu to k trn, nhng hm lng ca tng nguyn t th cniu chnh sao cho hp thc trong m ng ph hp vi cu trc ca tng cht.Cch th hai l ch to hai hoc ba bia l cc oxit, s dng phng phpng phn x t hai hoc ba bia nh n mng c hp thc v cu trcmong mun. Cui cng, c th nhn thy rng, phng php phn xmagnetron cn c ng dng ch to nhiu chng lo i vt liu khc mphng php bc bay khng thc hin c. Cc vt liu mng mng oxithay nitrua c ch to d dng bng cch phn x kim loi tng ng

trong kh argon trn xy hoc nit- gi l phn x phn ng. Thit b phnx hin i c t ng ha cao, cho nn qu trnh lng ng mng mngc th khng ch chnh xc hn. Hu ht cc thit b u c t hai n bangun phn x (hain ba bia), nh c th thc hin phn x ng thinhiu loi vt liu khc nhau, to ra cc mng mng hp cht, vt liu phatp, vt liu cu trc nan phc tp khc, ... Vit Nam hin nay cng c nhiu c s nghin cu v o to c trang b cc thit b phn x hini c cc chc nng k trn.

3.4. B phn to chn khng : Thng dng 2 loi bm:

-Bm s cp (bm rote hoc bm quay du)Tc : 30 m3/h.

p sut ti hn: 10-2 torr

- Bm khuch tn:Tc : 200 l/sec

p sut ti hn : 10-10 torr


13/18


- Chn khng phn x:

Chn khng ti hn : 10-7 torr

Chn khng lm vic : 10-2 10-3 torr

3.5. B phn Magnetron

- T trng do mt vng nam chm bn ngoi bao quanh v khc c cvi nam chm gia. Chng c ni vi nhau bng mt tm st, c tcdng khp kn ng sc t pha di

Hnh 14 : Cu trc ca mt s h Magnetron thng th ng


14/18


3.6. Plasma:c to ra do c ch sau : Khi ta bm kh tr vo bung chn khng,

trong bung vn c sn mt s t electron t do, cc e n y va chm vi ccnguyn t kh tr trung ha lm ion ha cc nguyn t ny thnh cc iondng ( V d Ar +). Cc ion ny di tc dng ca in trng gia tc bayn p vo catot, y l bia lm cc nguyn t bia vng ra, ng thi

cc e th cp cung hnh thnh bay ra, cc e th cp tip tc ion ha ccnguyn t kh to thnh khi plasma pht sng gia hai in cc.

Hnh 15 : Vng plasma gia 2 in cc

Hnh 16 :nh chp Plasma trong bung phn x

4. Cc yu t nh hng ln tc lng ng mng

4.1. Dng v thTrong hu ht cc trng hp phn x th vic tng cng sut phn x

cng khng nh hng nhiu n tc lng ng. Mt khc nh chng ta thy s ion bn ln catt t l thun vi mt dng. Cho nn, yu t

Khi Plasma


15/18


nh hng ln ln tc lng ng chnh l dng, hn l in th t trncatt. Trn hnh l s liu thc nghim nhn c v s ph thuc chiudy mng mng vo in th catt vi thi gian phn x l 1 gi, bia sdng l tantan ng knh 76 mm. Chng ta thy sau g i tr 1500 V, inth c tip tc tng hn na th tc lng ng cng ch tng khng ngk (chiu dy ca mng nhn c khng tng). Nh vy trong trng hp

cng sut ca thit b hn ch th chng ta nn tng dng phn x v gimin th trn catt. Vic tng dng phn x c th thc hin c bng cchgim p sut, tng pht x in t, dng t trng (magnetron), hay tngdin tch bia, gim kch thc bia-,

4.2. p sutChng ta cng bit, trong k thut phng in phn x th khi

tng p sut, mt ion tc l mt dng s tng ln. Khi cng sut phnx c gi khng i th tc lng ng cng tng theo mt d ng, cngha l tng theo p su t phn x.

Trong khong p sut khng ln lm, tc lng ng tng tuyn tnh

theo p sut. Trn hnh trnh by kt qu thc nghim kho st s phthuc vo p sut ca tc lng ng m ng mng molipen. Trn hnhcn c c ng ph thuc vo p sut ca dng phn x. C hai ng phthuc u l tuyn tnh, nhng dng tng vi tc nhanh hn tc lngng. iu ny cng chng t s lng ion / nguyn t c thot ra khibia m c th quay tr li catt do hiu n g khuc h tn ngc cng cgim. Tuy nhin, hiu ng khuch tn ngc ch quan st thy khi p sutvt mt gi tr ngng nht nh. Thc nghim cho thy, d ng catt vtc lng ng mng khng cn tng theo p sut khi chn khng gimxung, p sut vt gi tr 1,3.10-1Torr. Tc lng ng ti u trongtrng hp phn x bng kh argon nhn c khi p sut phn x bng 5

6.10

-2

Torr.

Hnh 17. Tc lng ng ph thuc v o dngnhiu hn l vo in thtrn bia trong phn x magnetron.

4.3. Nhit Khc vi p sut, nhit l yu t phc tp, trong mt s trng

hp, tc lng ng ph thu c rt mnh v o nhit . Th d, khi hp


16/18


phn x SiO2, AsGa, Ge ti nhit thp, tc lng ng nh. C n as cc trng hp khc th tc lng ng tng ng k khi nhit gim t cao xung thp. Trn hnh 7.16 l th ph thuc vo nhit ca tc lng ng i vi mt s gi tr phn p tr n .

Hnh 18 : Vai tr ca nhit i vi tc lng ng th hin khngr rt trong phn x.

5. u im v hn ch ca phn x

5.1. u im:- Tt c cc loi vt l iu u c th phn x, ngha l t nguyn t, hp kim

hay hp cht.

- Bia phn x thng dng c lu, bi v lp phn x rt mng.

- C th t bia theo nhiu hng, trong nhiu trng hp c th dngbia din tch ln, do bia l ngun bc bay rt ln .- Trong magnetron c th ch to mng mng t bia c cu hnh a dng,ph thuc vo cch lp t nam chm, bia c th thit k theo hnh dng cab mt (hnh cn hoc hnh cu).- Quy trnh phn x n nh, d lp li v d t ng ha.

- bm dnh ca mng vi rt tt do cc nguyn t n lng ng trnmng c ng nng kh cao so vi phng php bay bc nhit.

- D dng ch to cc mng a lp nh to ra nhiu bia ri ng bit. ngthi, y l phng php r tin, v d thc hin nn d dng trin khai quy m cng nghip.


17/18


- Mng to ra c mp m b mt thp v c hp thc gn vi ca bia, c dy chnh xc hn nhiu so vi phng php bay bc nhit trong chnkhng.

5.2. Nhc im- Phn ln nng lng phn x tp t rung ln bia, lm nng bia, cho nn phi

c b lm lnh bia.- Tc phn x nh hn nhiu so vi tc bc bay chn khng.- Hiu sut v nng lng thp, cho nn phn x khng phi l phngphp tit kim nng lng.- Bia thng l rt kh ch to v t tin.- Hiu sut s dng bia thp (khng s dng c ht, nhiu khi do biagin, cho nn d b nt dn n hng sau s ln phn x ch a nhiu.- Trong nhiu trng hp, khng cn n nhit , nhng n lun b tnng.- Cc tp cht nhim t thnh chung, trong chung hay t ant c th bln vo trong mng.

- Do cc cht c hiu sut phn x khc nhau n n vic khng ch thnhphn vi bia t hp tr nn phc tp. Kh nng to ra cc m ng rt mngvi chnh xc cao ca phng php phn x l khng cao. Hn na,khng th to ra mng n tinh th.

- p sut thp,khong t 5-15 mTorr. iu ny i hi phi ht chn khngcao- S electron theo thi gian tch t nhiu trn bn cc lm hy s ti phnx- Ion dng p vo ph hy mng


18/18


TI LIU THAM KHO

[1] Trn nh Tng, Mng mng quang hc,NXBKHKT H Ni,2004[2] V Th Kim Chung,Lun vn Thc s Khoa Hc T Nhi n, Tng

hp mng mng TiO2 Bng pp phn x Magnetron -m ion,Trng HKHTN TPHCM,1999[3] ThS V Th Hnh Thu,cc bi ging v Vt L Mng Mng,TrngH KHTN TPHCM[4] L Phng Ngc,Nguyn Th Thu Tho,Kha Lun Tt Nghip[5] Nguyn Ngc Thy Trang,Kha Lun tt nghip[6] L V Tun Hng,Nguyn Vn n,Hunh Thnh t,Nghin cuch to mng mng TiO2 bng phng php phn x MagnetronRF,Tp ch pht trin KH&CN ,tp 9,s 6/2006

[7] Nguyn Hu c (2003). Vt liu t lin kim loi. Nh xut bn ihc Quc gia H Ni. 1K-02044-01403.

Mt s trang web tham kho :http://vi.wikipedia.org/wiki/M%C3%A0ng_m%E1%BB%8Fnghttp://vi.wikipedia.org/wiki/Ph%C3%BAn_x%E1%BA%A1_cat%E 1%BB%91thttp://en.wikipedia.org/wiki/Sputteringhttp://en.wikipedia.org/wiki/Radio_frequencywww.freepatentsonline.comhttp://www.lermps.com/PHP/HTML/textes.php?ref=process_dep ot+phase+vapeur.xlshttp://www.ajaint.com/whatis.htm
http://vi.wikipedia.org/wiki/Ph%C3%BAn_x%E1%BA%A1_cat%E1%http://www.lermps.com/PHP/HTML/textes.phphttp://www.ajaint.com/whatis.htmhttp://www.lermps.com/PHP/HTML/textes.phphttp://www.freepatentsonline.com/http://en.wikipedia.org/wiki/Radio_frequencyhttp://en.wikipedia.org/wiki/Sputteringhttp://vi.wikipedia.org/wiki/Ph%C3%BAn_x%E1%BA%A1_cat%E1%http://vi.wikipedia.org/wiki/M%C3%A0ng_m%E1%BB%8Fng

Documents

Phun Xa Magnetron Rf