Symposium on Direct Write, Optical, Ion and Electron Beam Lithography July 14th, 2017 Stanford University Paul G. Allen 101 Auditorium This symposium features technical experts from Heidelberg Instruments, Nanoscribe, Zeiss and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. SNF and SNSF are part of NSF’s NNCI@Stanford and make modern nanofabrication capabilities available to Stanford’s community; we also welcome researchers from industry and other universities. 9:00 9:15 Welcome and Introductions Stanford University, Prof. Roger Howe 9:15 9:45 Write Strategies for Optical Direct write Lithography Heidelberg Instruments, Niels Wijnaendts van Resandt 9:45 10:15 Gallium Focused Ion Beam Applications Carl Zeiss Microscopy, KD Derr 10:15 10:45 Latest advances in Electron an Ion Beam Lithography Raith America, Andre Linden 10:45 11:00 Coffee Break 11:00 11:30 3D printing by two-photon polymerization sets new standards in micro- and nanofabrication Nanoscribe, Dr. Benjamin Richter 11:30 12:00 Reversing EBL technology for large area imaging and nano metrology Raith America, Andre Linden 12:00 12:30 Direct-Write Nanofabrication using Inert Ions Carl Zeiss Microscopy, Soeren Eyhusen 12:30 13:30 Lunch Break 13:30 14:00 Light-induced quantitative patterning of biomolecules Alvéole, Hélène Delobel 14:00 14:30 High precision and High resolution: Requirements and Solutions for high end optical lithography applications Heidelberg Instruments, Steffen Diez 14:30 15:00 Functional resins for 3D printing – mechanism, application and outlook Nanoscribe, Dr. Benjamin Richter 15:00 16:30 Process Clinic (open discussion about process related challenges) Lunch will be provided. During the Process Clinic we will serve free beer and are looking forward to have fruitful discussions with you about your actual challenges. Please preregister at http://bit.ly/2sXaSD2.

Symposium on Direct Write, Optical, Ion and Electron … on Direct Write, Optical, Ion and Electron Beam Lithography July 14th, 2017 Stanford University Paul G. Allen 101 Auditorium

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SymposiumonDirectWrite,Optical,IonandElectronBeamLithography

July14th,2017

StanfordUniversity

PaulG.Allen101AuditoriumThissymposiumfeaturestechnicalexpertsfromHeidelbergInstruments,Nanoscribe,ZeissandRaithwhowilldescribethespectrumoflatest,state-of-the-artdirect-writecapabilities.SNFandSNSFarepartofNSF’sNNCI@StanfordandmakemodernnanofabricationcapabilitiesavailabletoStanford’scommunity;wealsowelcomeresearchersfromindustryandotheruniversities.

9:00 9:15

WelcomeandIntroductions

StanfordUniversity,Prof.RogerHowe

9:15 9:45

WriteStrategiesforOpticalDirectwriteLithography

HeidelbergInstruments,NielsWijnaendtsvanResandt

9:45 10:15

GalliumFocusedIonBeamApplications

CarlZeissMicroscopy,KDDerr

10:15 10:45

LatestadvancesinElectronanIonBeamLithography

RaithAmerica,AndreLinden

10:45 11:00

CoffeeBreak

11:00 11:30

3Dprintingbytwo-photonpolymerizationsetsnewstandardsinmicro-andnanofabrication

Nanoscribe,Dr.BenjaminRichter

11:30 12:00

ReversingEBLtechnologyforlargeareaimagingandnanometrology

RaithAmerica,AndreLinden

12:00 12:30

Direct-WriteNanofabricationusingInertIons

CarlZeissMicroscopy,SoerenEyhusen

12:30 13:30

LunchBreak

13:30 14:00

Light-inducedquantitativepatterningofbiomolecules

Alvéole,HélèneDelobel

14:00 14:30

HighprecisionandHighresolution:RequirementsandSolutionsforhighendopticallithographyapplications

HeidelbergInstruments,SteffenDiez

14:30 15:00

Functionalresinsfor3Dprinting–mechanism,applicationandoutlook

Nanoscribe,Dr.BenjaminRichter

15:00 16:30

ProcessClinic(opendiscussionaboutprocessrelatedchallenges)Lunchwillbeprovided.DuringtheProcessClinicwewillservefreebeerandarelookingforwardtohavefruitfuldiscussionswithyouaboutyouractualchallenges.Pleasepreregisterathttp://bit.ly/2sXaSD2.