Transparent Conducting oxide
Materials Characterization lab
TCO (Transparent Conducting Oxide) (TCO) Electronical
Conductivity () ; 103 -1cm-2 Optical Transmittance ; 80 % Band gap
; 3.3 eV , display, display, , A-Si
Free carrier type Oxygen deficiency Electric charge carrier
density & Effective mass
TCO (Transparent Conducting Oxide) (TCO)ITO (In2O3:Sn, Sn~10%)
IZO (In2O3:Zn, Zn~5%) FTO (SnO2:F) ZnO A-IGZO (In2O3:Ga2O3:ZnO)
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide) N-type : P-type :
Dopant 1. N-type , ZnO ; - 4.35eV , Band gap 3.37eV
MgO ; 1.37eV, Band gap 7.8eV carrier 2. P-type Low work function
Metal-Oxygen ; , 16(S, Se, Te) (CuAlO2) 3.
TCO (Transparent Conducting Oxide)
TCO (Transparent Conducting Oxide)
Magnetron sputtering PVD(Physical vapor deposition) DC, RF,
reactive gas cathode Ar + e-(primary) = Ar+ + e-(primary) +
e-(secondary) - target , target
TCO (Transparent Conducting Oxide)
Sputtering
-. -. , step defect coverage -. (adhesion) -. , , , . -. Target
, target . -. sputter etching pre-cleaning . -. O2, N2 reactive
sputter , .
TCO (Transparent Conducting Oxide)
Sputtering
-. High energy deposition damage damage . -. , UV, (100150)
holder .
-. Ar , , bias , .
TCO (Transparent Conducting Oxide)
Sputtering
-.
-. -. target -. -. Background : 110-5110-6 Torr -. Ar : 215mTorr
-. Input power : 5001000W -. Reflected power "0" setting -. bias :
-50-100W
TCO (Transparent Conducting Oxide)Pulsed laser deposition
(PLD)
-. -. UV target -. Laser plume -. millitorr -. -. ~3 epitaxial
-. p-type TCO
TCO (Transparent Conducting Oxide)
(Chemical vapor deposition, CVD)
-. -. , , -. (APCVD), (LPCVD), (PECVD), (MOCVD) -. -. ,
TCO (Transparent Conducting Oxide)
(Solution deposition)
-. Sol-gel -. or
-. -. alkoxide -. - : , -. PVD PLD -. , -. , , -.
TCO (Transparent Conducting Oxide) (aerosol spray pyrolysis)
-. -.
-. -. , -. ,
TCO (Transparent Conducting Oxide)
Combination depositon methods
-. -. target -. NiCo2O4 sputter -.
TCO (Transparent Conducting Oxide)
